METHODS TO IMPROVE THE CRYSTALLINITY OF PbZrTiO3 AND Pt FILMS FOR MEMS APPLICATIONS
US-2015380635-A1 · Dec 31, 2015 · US
US2016177434A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016177434-A1 |
| Application number | US-201514957050-A |
| Country | US |
| Kind code | A1 |
| Filing date | Dec 2, 2015 |
| Priority date | Dec 17, 2014 |
| Publication date | Jun 23, 2016 |
| Grant date | — |
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A method of forming a metal coated fibre ( 2 ). The method comprises: providing a sputter coating apparatus ( 10 ) comprising a deposition chamber ( 12 ) containing a target filament ( 6 ); applying a negative direct current biasing voltage to the filament ( 6 ); wherein the bias is alternately pulsed between a high power condition and a low power condition.
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1 . A method of forming a metal coated fibre, the method comprising: providing a sputter coating apparatus comprising a deposition chamber containing a target filament; applying a negative direct current biasing voltage to the filament; wherein the bias is alternately pulsed between a high power condition and a low power condition. 2 . A method according to claim 1 , wherein the biasing current is pulsed between the high and low voltage conditions at a cycle frequency of between 0.1 Hz and 10 Hz. 3 . A method according to claim 1 , wherein the method comprises applying the biasing current at a 50% duty cycle. 4 . A method according to claim 1 , wherein the high power condition comprises a voltage of between approximately − 30 and −100 Volts. 5 . A method according to claim 1 , wherein the low power condition comprises approximately 0 Volts. 6 . A method according to claim 1 , wherein the filament comprises any of silicon carbide, alumina, and glass fibre. 7 . A method according to claim 1 , wherein the metal coating comprises titanium or titanium alloy. 8 . A metal coated fibre forming apparatus comprising: a sputtering apparatus comprising a deposition chamber configured to contain a target filament; and a biasing apparatus, wherein the biasing apparatus is configured to provide a biasing voltage to the target filament, the biasing voltage being arranged to pulse between a high power condition and a low power condition. 9 . An apparatus according to claim 8 , wherein the apparatus comprises first and second fibre transport assemblies configured to pass a fibre between the first and second fibre transport assemblies to provide a plurality of fibre loops located within the hollow cathode, and to apply a biasing voltage to the fibre. 10 . An apparatus according to claim 9 , wherein each fibre transport arrangement comprises a plurality of pulleys, each pulley comprising a conductive material, and wherein the fibre biasing arrangement further comprises a power supply electrically connected to one or both of the first and second fibre transport assemblies. 11 . An apparatus according to claim 8 , wherein the first and second fibre transport assemblies are arranged such that the fibres are spaced a distance apart within the apparatus such that there is substantially no interference between the electrical fields caused by the biasing current. 12 . An apparatus according to claim 11 , wherein the distance is approximately 5 mm or more. 13 . An apparatus according to claim 8 , wherein the filament comprises any of silicon carbide, alumina, and glass fibre. 14 . An apparatus according to claim 13 , wherein the metal coating comprises titanium or titanium alloy.
characterised by the fibres or filaments · CPC title
by coating, e.g. with a protective or activated covering · CPC title
Hollow cathodes · CPC title
Aspects linked to processes or compositions used in powder metallurgy · CPC title
for coating elongated substrates · CPC title
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