Disinfectant peracetic acid solutions

Patent metadata

Field	Value
Publication number	US-2016174553-A1
Application number	US-201414578379-A
Country	US
Kind code	A1
Filing date	Dec 20, 2014
Priority date	Dec 20, 2014
Publication date	Jun 23, 2016
Grant date	—

Abstract

Various embodiments disclosed relate to a composition that includes (or is formed from): (a) hydrogen peroxide; (b) an organic acid; (c) chelator; and (d) surfactant, wherein the composition includes less than about 0.1 wt. % of an anticorrosive agent. Kits that include the composition, as well as methods of using the composition (e.g., as a disinfectant) are provided.

First claim

1 . A composition comprising:
a. hydrogen peroxide; b. organic acid; c. chelator; and d. surfactant, wherein the composition comprises less than about 0.1 wt. % of an anticorrosive agent.

2 . The composition of claim 1 , wherein the composition further comprises peracetic acid.

3 . The composition of claim 1 , wherein the composition further comprises peracetic acid formed by the reaction of acetic acid with hydrogen peroxide.

4 . The composition of claim 1 , wherein the composition further comprises peracetic acid, present in about 5.0 wt. % to about 10.0 wt. % of the composition.

5 . The composition of claim 1 , wherein the balance (q.s.) of the composition is water.

6 . The composition of claim 1 , which is a liquid disinfectant.

7 . The composition of claim 1 , comprising less than about 0.1 wt. % buffer.

8 . The composition of claim 1 , wherein the hydrogen peroxide is present in about 10 wt. % to about 50 wt. % of the composition.

9 . The composition of claim 1 , wherein the organic acid comprises acetic acid.

10 . The composition of claim 1 , wherein the organic acid comprises acetic acid, present in at least about 3 wt. % of the composition.

11 . The composition of claim 1 , wherein the chelator comprises Dequest® 2010 (1-hydroxyethylidene-1,1,-diphosphonic acid, HEDP).

12 . The composition of claim 1 , wherein the chelator comprises Dequest® 2010 (1-hydroxyethylidene-1,1,-diphosphonic acid, HEDP), present in at least about 0.1 wt. % of the composition.

13 . The composition of claim 1 , wherein the surfactant comprises Pluronic® 10R5 surfactant block copolymer.

14 . The composition of claim 1 , wherein the surfactant comprises Pluronic® 10R5 surfactant block copolymer, present in at least about 0.1 wt. % of the composition.

15 . A composition comprising:
a. hydrogen peroxide, present in a concentration of about 28 wt. %; b. acetic acid, present in a concentration of about 16 wt. %; c. Dequest® 2010, present in a concentration of about 1.0 wt. %; and d. Pluronic® 10R5 surfactant block copolymer, present in a concentration of about 2.0 wt. %; wherein the composition comprises less than about 0.1 wt % of an anticorrosive agent.

16 . The composition of claim 15 , wherein the balance (q.s.) of the composition is water.

17 . The composition of claim 15 , wherein the balance (q.s.) of the composition is deionized water.

18 . The composition of claim 15 , wherein the composition further comprises peracetic acid, present in about 6.8 wt. % to about 7.5 wt. % of the composition.

19 . A composition comprising:
a. hydrogen peroxide, present in a concentration of about 20 wt. % to about 26.0 wt. %; b. acetic acid, present in a concentration of about 9.0 to about 11.0 wt. %; c. peracetic acid, present in about 6.8 wt. % to about 7.5 wt. % of the composition; d. Dequest® 2010, present in a concentration of about 1.0 wt. %; and e. Pluronic® 10R5 surfactant block copolymer, present in a concentration of about 2.0 wt. %;
wherein the composition comprises less than about 0.1 wt. % of an anticorrosive agent.

20 . The composition of claim 19 , wherein the balance (q.s.) of the composition is deionized water.

21 . A method of reducing the number of microbes located upon a substrate, the method comprising contacting the substrate with an effective amount of a composition comprising:
a. hydrogen peroxide; b. organic acid; c. chelator; and d. surfactant wherein the composition comprises less than about 0.1 wt. % of an anticorrosive agent, for a sufficient period of time, effective to reduce the number of microbes located upon the substrate.

22 . The method of claim 21 , wherein the microbe or microorganism comprises at least one of a virus, fungus, mold, slime mold, algae, yeast, mushroom and bacterium.

23 . The method of claim 21 , wherein the substrate is a medical device.

24 . The method of claim 21 , wherein the substrate is an endoscope.

25 . The method of claim 21 , wherein up to about 7.12 logs of desired microorganism is inactivated in about 5 minutes, or less.

26 . The method of claim 21 , wherein up about 7.12 logs of Mycobacterium terrae is inactivated in about 5 minutes, or less.

27 . The method of claim 21 , wherein about 1 wt. % of the composition is employed, in combination with about 99 wt. % carrier.

28 . The method of claim 21 , wherein about 1 wt. % of the composition is employed, in combination with about 99 wt. % water.

Assignees

• Medivators Inc

Inventors

• Matta John J
• Nguyen Tuan

Classifications

• A01N37/16 Primary

  containing the group [IMAGE cpc-sch-A01N-0934.gif]; Thio analogues thereof · CPC title

• A01N59/00

  Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds · CPC title