Voltage-controlled magnetic device operating over a wide temperature range

US2016172579A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016172579-A1
Application numberUS-201414906770-A
CountryUS
Kind codeA1
Filing dateJul 18, 2014
Priority dateJul 22, 2013
Publication dateJun 16, 2016
Grant date

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  5. First independent claim

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Abstract

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A voltage-controlled spintronic device includes a magnetic layer having an effective anisotropy Keff; a non-magnetic insulating layer; a contact layer; the magnetic layer having an anisotropy switching threshold such that application of a polarisation voltage Vmax allows switching of the effective anisotropy K eff from a direction perpendicular to the reference plane to a direction in the reference plane or vice versa, the magnetic layer including a first layer, with thickness t B , having a volume anisotropy K VB ; a second layer, with thickness t A , having a surface anisotropy K SA and a volume anisotropy K VA ; the surface anisotropy K SA and the volume anisotropies K VA and K VB respecting, over a given operating temperature range: Min(K SA (V=0), K SA (V=Vmax))<−{K VB t B +K VA t A )<Max(K SA (V=0), K SA (V=Vmax)). K SA (V=0) is the surface anisotropy when no polarisation voltage is applied. K SA (V=Vmax) is the surface anisotropy when a polarisation voltage V max is applied.

First claim

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1 . A voltage-controlled magnetic device comprising: a magnetic layer extending along a reference plane and having a variable direction magnetisation and an effective anisotropy K eff ; a non-magnetic insulating layer extending onto the magnetic layer; a contact layer extending onto the non-magnetic insulating layer; a polarisation voltage device configured to apply a polarisation voltage between the contact layer and the magnetic layer, through the non-magnetic insulating layer; said magnetic layer having an anisotropy switching threshold such that the application of a polarisation voltage V max through the non-magnetic insulating layer enables switching of the effective anisotropy K eff from a direction perpendicular to the reference plane to a direction in the reference plane or vice versa, wherein the magnetic layer comprises: a first layer with thickness t B , having a first volume anisotropy K VB ; a second layer with thickness t A , having a surface anisotropy K SA and a second volume anisotropy K VA , the second layer being situated between the first layer and the non-magnetic insulating layer; a composition and a thickness of the second and first layers being chosen in order that the surface a nisotropy K SA and the first and second volume anisotropies K VB and K VA respect, over a given operating temperature range, the following inequality: Min( K SA ( V= 0), K SA ( V=V max ))<−( K VB t B +K VA t A )<Max( K SA ( V= 0), K SA ( V=V max )) where K SA is the surface anisotropy when no polarisation voltage is applied; K SA (V=V max ) is the surface anisotropy when the polarisation voltage V max is applied. 2 . The magnetic device according to claim 1 , wherein the non-magnetic insulating layer is made of MgO, AlOx, AlN, SrTiO 3 , HfO x or any other insulating oxide or nitride having a dielectric polarisability greater than or equal to 6. 3 . The magnetic device according to claim 1 , wherein the effective anisotropy K eff is in a direction perpendicular to the reference plane when no polarisation voltage is applied; the effective anisotropy K eff is in a direction in the reference plane when the polarisation voltage V max is applied. 4 . The magnetic device according to claim 3 , wherein the surface anisotropy K SA of the second layer is in a direction perpendicular to the reference plane and the surface anisotropy K SA decreases when the polarisation voltage V max is applied; the total volume anisotropy K VB t B +K VA t A is in a direction in the reference plane. 5 . The magnetic device according to claim 3 , wherein the surface anisotropy K SA of the second layer is in a direction in the reference plane and the surface anisotropy K SA increases when the polarisation voltage V max is applied. the total volume anisotropy K VB t B +K VA t A is in a direction perpendicular to the reference plane. 6 . The magnetic device according to claim 1 the effective anisotropy K eff is in a direction in the reference plane when no polarisation voltage is applied; the effective anisotropy K eff is in a direction perpendicular to the reference plane when the polarisation voltage V max is applied. 7 . The magnetic device according to claim 6 , wherein the surface anisotropy K SA of the second layer is in a direction perpendicular to the reference plane and the surface anisotropy K SA increases when the polarisation voltage V max is applied. the total volume anisotropy K VB t B +K VA t A is in a direction in the reference plane. 8 . The magnetic device according to claim 6 , wherein the surface anisotropy K SA of the second layer is in a direction in the reference plane and the surface anisotropy K SA decreases when the polarisation voltage V max is applied; the total volume anisotropy K VB t B +K VA t A is in a direction perpendicular to the reference plane. 9 . The magnetic device according to claim 1 , wherein the second layer is made of an alloy based on Co, Fe, Ni or any other material leading, in combination with the insulating layer, to a surface anisotropy K SA perpendicular to the reference plane and having a variation greater than 5% as a function of the application or not of the polarisation voltage V max . 10 . The magnetic device according to claim 1 , wherein the first layer having the first volume anisotropy K VB is a multilayer stack of n elementary patterns of type F1/N1 or F1/N1/F2/N2 or F1/F2, with F1 and F2 two different ferromagnetic materials and N1 and N2 two different non-magnetic materials. 11 . The magnetic device according to claim 1 , wherein the first layer having the first volume anisotropy K VB is an alloy having a tetragonal structure L1 0 . 12 . The magnetic device according to claim 1 , wherein the first layer having the first volume anisotropy K VB is a monolayer of an alloy of type F1F2F3N1N2, with F1, F2 and F3 three different ferromagnetic materials and N1 and N2 two different non-magnetic materials. 13 . The magnetic device according to claim 1 , wherein the contact layer comprises, in contact with the non-magnetic insulating layer, a magnetic layer having a fixed magnetisation direction serving as reference direction for the magnetisation; the non-magnetic insulating layer is a tunnel barrier enabling a current to circulate by tunnel effect between the contact layer and the magnetic layer; the device then behaving like a magnetic tunnel junction. 14 . The magnetic device according to claim 13 , wherein the magnetic layer of the contact layer is an alloy of CoFeB; the non-magnetic insulating layer is made of MgO; the second layer of the magnetic layer is an alloy of CoFeB.

Assignees

Inventors

Classifications

  • Spin resolved measurements; Influencing spins during measurements, e.g. in spintronics devices · CPC title

  • using multilayer structures, e.g. giant magnetoresistance sensors (thin magnetic films H01F10/00) · CPC title

  • G11C11/15Primary

    using multiple magnetic layers (G11C11/155 takes precedence) · CPC title

  • Spin-exchange coupled multilayers wherein the magnetisation of the free layer is switched by a spin-polarised current, e.g. spin torque effect · CPC title

  • details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell · CPC title

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What does patent US2016172579A1 cover?
A voltage-controlled spintronic device includes a magnetic layer having an effective anisotropy Keff; a non-magnetic insulating layer; a contact layer; the magnetic layer having an anisotropy switching threshold such that application of a polarisation voltage Vmax allows switching of the effective anisotropy K eff from a direction perpendicular to the reference plane to a direction in the refe…
Who is the assignee on this patent?
Commissariat Energie Atomique, Centre Nat Rech Scient, Univ Grenoble 1
What technology area does this patent fall under?
Primary CPC classification G11C11/15. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jun 16 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).