Resist composition and patterning process using the same
US-2017029547-A1 · Feb 2, 2017 · US
US2016170302A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016170302-A1 |
| Application number | US-201615053246-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 25, 2016 |
| Priority date | Jun 24, 2011 |
| Publication date | Jun 16, 2016 |
| Grant date | — |
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A novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound is represented by the following formula (1). In the formula, R 1 and R 2 each independently represents a hydrogen atom or an organic group, but at least one represents an organic group. R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond. R 3 represents a single bond or an organic group. R 4 to R 9 each independently represents a hydrogen atom, an organic group, etc., but R 6 and R 7 are not hydroxyl groups. R 10 represents a hydrogen atom or an organic group.
Opening claim text (preview).
What is claimed is: 1 . A method for generating a base by irradiating with an electromagnetic wave, or by heating, a compound represented by the following formula (1): wherein R 1 and R 2 each independently represents a hydrogen atom or an organic group, provided that at least one of R 1 and R 2 represents an organic group; R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond; R 3 represents a single bond or an organic group; R 4 and R 5 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, or an organic group; R 6 , R 2 , R 8 , and R 9 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group, provided that R 6 and R 2 are not hydroxyl groups; two or more of R 6 , R 7 , R 8 , and R 9 may be bonded to form a ring structure and may contain a hetero atom bond; and R 10 represents a hydrogen atom or an organic group. 2 . A method for enhancing adhesion between a negative-type photosensitive resin composition and a substrate using a compound represented by the following formula (1): wherein R 1 and R 2 each independently represents a hydrogen atom or an organic group, provided that at least one of R 1 and R 2 represents an organic group; R 1 and R 2 may be bonded to form a ring structure and may contain a hetero atom bond; R 3 represents a single bond or an organic group; R 4 and R 5 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, or an organic group; R 6 , R 7 , R 8 , and R 9 each independently represents a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group, provided that R 6 and R 7 are not hydroxyl groups; two or more of R 6 , R 7 , R 8 , and R 9 may be bonded to form a ring structure and may contain a hetero atom bond; and R 10 represents a hydrogen atom or an organic group.
Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G03F7/075 takes precedence) · CPC title
with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title
having the nitrogen atom of at least one of the carboxamide groups bound to a carbon atom of a six-membered aromatic ring · CPC title
from carboxylic acids or from esters, anhydrides, or halides thereof by reaction with ammonia or amines · CPC title
Organic compounds not covered by group G03F7/029 · CPC title
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