Formaldehyde-free electroless metal plating compositions and methods

Patent metadata

Field	Value
Publication number	US-2016145745-A1
Application number	US-201414552478-A
Country	US
Kind code	A1
Filing date	Nov 24, 2014
Priority date	Nov 24, 2014
Publication date	May 26, 2016
Grant date	—

Abstract

Formaldehyde-free electroless metal plating solutions include glyoxylic acid or salts thereof in combination with tertiary amines which stabilize the glyoxylic acid and salts. The electroless metal plating solutions are environmentally friendly, stable and deposit bright metal deposits on substrates.

First claim

What is claimed is:

1 . A composition comprising one or more sources of metal ions, one or more sources of glyoxylic acid, salts or mixtures thereof and one or more tertiary amine compounds, salts, halides or mixtures thereof having a formula:

wherein R 1 , R 2 and R 3 may be the same or different and are linear or branched, substituted or unsubstituted hydroxy(C 1 -C 10 )alkyl, linear or branched, substituted or unsubstituted carboxy(C 1 -C 10 )alkyl, linear or branched, substituted or unsubstituted (C 1 -C 10 )alkylamine, linear or branched, substituted or unsubstituted (C 1 -C 10 )alkyl phosphonic acid, a moiety having a formula:

wherein R 4 and R 5 may be the same or different and are linear or branched, substituted or unsubstituted hydroxy(C 1 -C 10 )alkyl, linear or branched, substituted or unsubstituted carboxy(C 1 -C 10 )alkyl, linear or branched, substituted or unsubstituted (C 1 -C 10 )alkylamine, linear or branched, substituted or unsubstituted (C 1 -C 10 )alkyl phosphonic acid, or moiety —(CH 2 ) a —N—((CH 2 ) b ) 2 —(P(O)(OH) 2 ) (IIa) where a and b may be the same or different and are integers of 1 to 6, m is an integer from 1 to 6, B is a moiety having a formula:

wherein R 6 and R 7 may be the same or different and are hydrogen, hydroxyl, carboxyl, hydroxy(C 1 -C 3 )alkyl, carboxy(C 1 -C 3 )alkyl, (C 1 -C 3 )alkyl, or B may be a substituted or unsubstituted (C 5 -C 6 )cycloalkyl ring and m=1, A is a chemical bond with the nitrogen of formula (I) or a moiety having a formula:

wherein R 8 , R 9 , R 10 and R 11 are the same or different and are hydrogen, hydroxyl, (C 1 -C 3 )alkyl, n, p, q may be the same or different and are integers of 1 to 6, with the proviso that when any two of R 1 , R 2 and R 3 are carboxymethyl moieties or salts thereof the third cannot be formula (II) where A is a chemical bond, m is 2, R 6 and R 7 are hydrogen and R 4 and R 5 are carboxymethyl moieties or salts thereof; and a molar ratio of the one or more tertiary amine compounds to the glyoxylic acid or salts thereof is 0.05:1 to 15:1, the compositions are formaldehyde-free.

2 . The composition of claim 1 , wherein the one or more sources of glyoxylic acid is chosen from non-dissociated glyoxylic acid, dihydroxy acetic acid, a dihaloacetic acid and the bisulphite adduct of glyoxylic acid.

3 . The composition of claim 1 , wherein the salts of glyoxylic acid are chosen from alkali metal salts and ammonium salt of glyoxylic acid.

4 . The composition of claim 1 , wherein the one or more tertiary amines are chosen from triethanolamine, 2-[bis(2-hydroxyethyl)amino]acetic acid and its salts, N-(2-hydroxyethyl)iminodiacetic acid and its salts, nitrilotriacetic acid, nitrilo(3-propionic)diacetic acid and its salts, nitrilotripropionic acid and its salts, N,N-bis(2-hydroxypropyl)ethanolamine, 1-[bis(2-hydroxyethyl)amino]-2-propanol, 2-[bis(2-hydroxyethyl)amino]-2-(hydroxymethyl)-1,3-propanediol, N,N-Bis(carboxymethyl)-DL-alanine and its salts, triisopropanolamine, L-glutamic acid N,N′-diacetic acid and its salts, N,N,N′,N′-tetrakis(2-hydroxypropyl)ethylenediamine, N,N,N′,N′-tetrakis(2-hydroxyethyl)ethylenediamine, 1,3-Diamino-2-hydroxypropane-N,N,N′,N′-tetraacetic acid and its salts, ethylenediaminetetrapropionic acid and its salts, propylenediaminetetraacetic acid and its salts, N-(2-hydroxyethyl)ethylenediamine-N,N′,N′-triacetic acid and its salts, diethylenetriamine pentaacetic acid and its salts, triethylenetetramine-N,N,N′,N″,N′″,N′″-hexaacetic acid and its salts, methyl diethanolamine, methyliminodiacetic acid and its salts, tris(carboxymethyl)ethylenediamine, 1,2-diaminocyclohexanetetraacetic acid and its salts, N-(2-aminoethyl)-trans-1,2-diaminocyclohexane-N,N,N-pentaacetic acid and its salts, ethylene glycol tetraacetic acid and its salts, diethylene triamine pentamethylene phosphonic acid and its salts, (ethylenedinitrilo)-tetramethylenephosphonic acid and its salts, (nitrilotrimethylene)triphosphonic acid and its salts.

5 . The composition of claim 1 , wherein metal ions are chosen from copper ions, tin ions, nickel ions, silver ions, gold ions and mixtures thereof.

6 . The composition of claim 1 , further comprising accelerators, uniformity enhancers, stabilizers, grain-refiners, complexing agents, chelating agents, additional reducing agents, pH adjusting agents, antioxidants and surfactants.

7 . A method comprising:
a) providing a substrate; b) applying the composition of claim 1 to the substrate; and c) electroless plating metal on the substrate.

8 . The method of claim 7 , wherein the substrate comprises a plurality of through-holes and further comprising:
d) desmearing the through-holes; and e) plating metal on walls of the through-holes.

Assignees

• Rohm & Haas Elect Mat

Inventors

• Wu Weigang
• Li Crystal P L
• Liang Zhixiong

Classifications

• C23C18/34

  using reducing agents · CPC title

• C23C18/40

  using reducing agents · CPC title

• C23C18/44

  using reducing agents · CPC title

• C23C18/31 Primary

  Coating with metals · CPC title

• C23C30/00

  Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process (C23C26/00, C23C28/00 take precedence) · CPC title