Tin/tic coating and method for manufacturing the tin/tic coating and articles so coated

Patent metadata

Field	Value
Publication number	US-2016130694-A1
Application number	US-201514589815-A
Country	US
Kind code	A1
Filing date	Jan 5, 2015
Priority date	Nov 11, 2014
Publication date	May 12, 2016
Grant date	—

Abstract

An article includes a substrate, a Ti-bottom layer deposited on the substrate and a TiN/TiC coating deposited on the Ti-bottom layer. The TiN/TiC coating includes a plurality of TiN-nano layers and a plurality of TiC-nano layers. Each TiN-nano layer and each TiC-nano layers are alternately deposited on the Ti-bottom layer. The TiN/TiC coating has good toughness and high hardness. A method for manufacturing the TiN/TiC coating is also provided.

First claim

What is claimed is:

1 . A TiN/TiC coating comprising:
a plurality of TiN-nano layers; and a plurality of TiC-nano layers; wherein the TiN/TiC coating is a multi-layer composite coating formed by alternate deposition of TiN-nano layers and TiC-nano layers.

2 . The TiN/TiC coating as claimed in claim 1 , wherein the adjacent TiN-nano layer and TiC-nano layer form a two-layer unit, and the thickness of the TiN-nano layer ranges from 10 nm to 60 nm and the thickness of the TiC-nano layer ranges from 10 nm to 80 nm in each two-layer unit.

3 . The TiN/TiC coating as claimed in claim 2 , wherein the thickness of the TiN-nano layer and the thickness of the TiC-nano layer is 50 nm in each two-layer unit.

4 . The TiN/TiC coating as claimed in claim 1 , wherein the TiN/TiC coating can be total 20 layers of coating each layer being made up of the TiN-nano layer and the TiC-nano layer.

5 . The TiN/TiC coating as claimed in claim 1 , wherein the total thickness of the TiN/TiC coating is 1 μm.

6 . The TiN/TiC coating as claimed in claim 1 , wherein the microhardness of the TiN/TiC coating is more than 40 GPa.

7 . A method for manufacturing a TiN/TiC coating, the method comprising:
providing a substrate in a coating device; and forming a multi-layer composite coating by alternately sputtering a TiN-nano layer and a TiC-nano layer on the substrate; wherein the TiN-nano layer is formed by sputtering Ti targets in the argon gas and the nitrogen gas; and the TiC-nano layer is formed by sputtering TiC targets in the argon gas.

8 . The method as claimed in claim 7 , wherein the sputtering conditions for forming the TiN-nano layers are as follows: a power of Ti targets is adjusted to 5000-14000 W, a nitrogen flow rate is 200-300 mln/min, an argon flow rate is 300-500 mln/min, a pressure in the coating device is 400-600 MPa, a temperature of the coating device is 400-600° C., a voltage of the ion source is 50-100V, a biased voltage of the substrate can be 50-1000V, and a sputtering time is 100-500 seconds.

9 . The method as claimed in claim 7 , wherein the sputtering conditions for forming the TiC-nano layers are as follows: a power of TiC targets is adjusted to 5000-14000 W, an argon flow rate is 300-500 mln/min, a pressure in the coating device is 300-500 MPa, a temperature of the coating device is 400-600° C., a voltage of the ion source is 50-100V, a biased voltage of the substrate can be 50-100V, and a sputtering time is 300-1000 seconds.

10 . The method as claimed in claim 7 , wherein a Ti-bottom layer is sputtered on the substrate before forming the multi-layer composite coating.

11 . The method as claimed in claim 10 , wherein the sputtering conditions for forming the Ti-bottom layer are as follows: a power of Ti targets is 500-1000 W, an argon flow rate and an krypton flow rate are 200-300 mln/min, a pressure in the coating device is 200-500 MPa, a temperature of the coating device is 400-600° C., a voltage of the ion source is 50-100V, and a biased voltage of the substrate can be 50-1000V, and a sputtering time is 200-1000 seconds.

12 . An article comprising:
a substrate; and a TiN/TiC coating deposited on the substrate; wherein the TiN/TiC coating is a multi-layer composite coating formed by alternate deposition of a plurality of TiN-nano layers and a plurality of TiC-nano layers.

13 . The article as claimed in claim 12 , wherein a Ti-bottom layer is formed between the TiN/TiC coating and the substrate.

14 . The article as claimed in claim 12 , wherein the adjacent TiN-nano layer and TiC-nano layer form a two-layer unit, and the thickness of the TiN-nano layer ranges from 10 nm to 60 nm and the thickness of the TiC-nano layer ranges from 10 nm to 80 nm in each two-layer unit.

15 . The article as claimed in claim 12 , wherein the thickness of the TiN-nano layer and the thickness of the TiC-nano layer is 50 nm in each two-layer unit.

16 . The article as claimed in claim 12 , wherein the TiN/TiC coating can be total 20 layers of coating each layer being made up of the TiN-nano layer and the TiC-nano layer, and the total thickness of the TiN/TiC coating is 1 μm.

17 . The article as claimed in claim 12 , wherein the microhardness of the TiN/TiC coating is more than 40 GPa.

Assignees

• Hongfujin Prec Ind Shenzhen
• Hon Hai Prec Ind Co Ltd

Inventors

• Fang Jun-Fei
• Wang wen-bao

Classifications

• C23C14/3464 Primary

  using more than one target (C23C14/56 takes precedence) · CPC title

• C23C14/3492

  Variation of parameters during sputtering · CPC title

• C23C14/0641

  Nitrides (C23C14/0617 takes precedence) · CPC title

• C23C14/0635

  Carbides · CPC title

• C23C14/0036

  Reactive sputtering · CPC title