Graphite heater with tailored resistance characteristics for hpht presses and products made therein

US2016129504A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016129504-A1
Application numberUS-201514936682-A
CountryUS
Kind codeA1
Filing dateNov 10, 2015
Priority dateNov 10, 2014
Publication dateMay 12, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method for sintering includes loading a tool material into a resistance heating element within a HPHT press and heating the resistance heating element at a first axial portion to a control temperature, where a temperature difference is measured between the control temperature and a second temperature measured at a distal axial portion along the resistance heating element, wherein a difference between the control temperature and the second temperature ranges between about 5 percent to about 11 percent of the control temperature.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method for sintering, comprising: loading a tool material into a resistance heating element within a HPHT press; and heating the resistance heating element at a first axial portion to a control temperature, where a temperature difference is measured between the control temperature and a second temperature measured at a distal axial portion along the resistance heating element, wherein a difference between the control temperature and the second temperature ranges between about 5 percent to about 11 percent of the control temperature. 2 . The method of claim 1 , further comprising: designing a reaction cell of the HPHT press to have a varied distribution of heat along an axial dimension, the reaction cell comprising the resistance heating element. 3 . The method of claim 2 , wherein the reaction cell further comprises at least one end disk disposed at an axial end of the resistance heating element. 4 . The method of claim 1 , wherein the standard deviation of the second temperature at the distal axial portion is within 10 degrees Celsius. 5 . The method of claim 1 , wherein the HPHT press further comprises pressure transmitting material disposed between the resistance heating element and the tool material. 6 . The method of claim 1 , wherein the temperature difference is greater than 100 degrees. 7 . The method of claim 1 , wherein the resistance heating element comprises graphite having a fine grain size ranging from about 5 micrometers to about 30 micrometers. 8 . The method of claim 7 , wherein the graphite has a substantially monomodal grain size distribution. 9 . The method of claim 1 , wherein the resistance heating element comprises a material with a resistivity of greater than 8 microohm·m. 10 . The method of claim 1 , wherein the tool material comprises at least one layer of carbide material and at least one layer of diamond powder disposed on the at least one layer of carbide material, and wherein after the heating, at least one cutting element is formed from the tool material, each cutting element having a polycrystalline diamond layer attached to a carbide substrate. 11 . The method of claim 10 , wherein the polycrystalline diamond layer comprises a binder phase substantially uniformly distributed among a plurality of diamond grains, such that the volume percent of the binder phase measured around the perimeter of the polycrystalline diamond layer varies within 15 percent of the average volume percent of the binder phase around the perimeter. 12 . The method of claim 1 , wherein during heating, material from a refractory can enclosing the tool material migrates into the tool material substantially uniformly around the perimeter of the tool material. 13 . The method of claim 1 , wherein at the control temperature, a maximum voltage drop along an axial dimension of the resistance heating element varies by less than 5 percent around the perimeter of the resistance heating element. 14 . A method for sintering, comprising: loading a tool material into a resistance heating element within a HPHT press; and heating the resistance heating element at a first axial portion to a control temperature, where a temperature difference is measured between the control temperature and a second temperature measured at a distal axial portion along the resistance heating element, the second temperature having a standard deviation of less than about 15 percent between runs. 15 . A cutting element, comprising: an ultra hard material body comprising: a plurality of hard grains; and a binder phase substantially uniformly distributed among the plurality of hard grains, such that the volume percent of the binder phase measured around a perimeter of the ultra hard material body varies within 15 percent of the average volume percent of the binder phase around the perimeter. 16 . The cutting element of claim 15 , wherein the average volume percent of the binder phase ranges between about 10 and 13 percent. 17 . The cutting element of claim 15 , further comprising a residual material substantially uniformly distributed around an outer perimeter of the ultra hard material body. 18 . The cutting element of claim 17 , wherein the residual material is selected from the group consisting of a refractory metal and a refractory metal carbide. 19 . The cutting element of claim 17 , wherein the residual material extends a depth into the ultra hard material body from the outer perimeter. 20 . The cutting element of claim 15 , wherein the plurality of hard grains comprises diamond. 21 . An HPHT cell assembly, comprising: a substantially tubular resistance heating element having a fine grain size ranging from about 5 micrometers to about 30 micrometers. 22 . The HPHT cell assembly of claim 21 , further comprising: an end disk fitted at each axial end of the substantially tubular resistance heating element; a tool material between the axial ends of the substantially tubular resistance heating element; and a pressure transmitting material between the substantially tubular resistance heating element and the tool material.

Assignees

Inventors

Classifications

  • Cutting tools, earth boring or grinding tool other than table ware · CPC title

  • Alloys containing diamond {or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes} · CPC title

  • Aspects linked to processes or compositions used in powder metallurgy · CPC title

  • B23B27/148Primary

    Composition of the cutting inserts · CPC title

  • with additional metal compounds being carbides · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016129504A1 cover?
A method for sintering includes loading a tool material into a resistance heating element within a HPHT press and heating the resistance heating element at a first axial portion to a control temperature, where a temperature difference is measured between the control temperature and a second temperature measured at a distal axial portion along the resistance heating element, wherein a difference…
Who is the assignee on this patent?
Smith International
What technology area does this patent fall under?
Primary CPC classification B23B27/148. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu May 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).