Microneedle Manufacturing Process with Hats

US2016129232A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016129232-A1
Application numberUS-201614988769-A
CountryUS
Kind codeA1
Filing dateJan 6, 2016
Priority dateDec 17, 2007
Publication dateMay 12, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Out-of-plane microneedle manufacturing process comprising the simultaneous creation of a network of microneedles and the creation of a polygonal shaped hat ( 2 ) above each microneedle ( 1 ) under formation, said process comprising the following steps: providing bridges ( 3 ) between the hats ( 3 ), maintaining the bridges ( 3 ) during the remaining microneedle manufacturing steps, removing the bridges ( 3 ), together with the hats ( 2 ), when the microneedles ( 1 ) are formed.

First claim

Opening claim text (preview).

1 - 12 . (canceled) 13 . A method of manufacturing a microneedle comprising the steps of: (i) patterning a protective mask to form an etch opening in the protective mask for etching a wafer, the wafer serving as material for the microneedle; (ii) first isotropic etching of an exposed area of the wafer at the etch opening to form a first cavity in the wafer; (iii) first anisotropic etching of the first cavity to define a head of the microneedle; (iv) second isotropic…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016129232A1 cover?
Out-of-plane microneedle manufacturing process comprising the simultaneous creation of a network of microneedles and the creation of a polygonal shaped hat ( 2 ) above each microneedle ( 1 ) under formation, said process comprising the following steps: providing bridges ( 3 ) between the hats ( 3 ), maintaining the bridges ( 3 ) during the remaining microneedle manufacturing steps, removing the…
Who is the assignee on this patent?
Debiotech Sa
What technology area does this patent fall under?
Primary CPC classification A61M37/0015. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Thu May 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).