Touch sensing unit and display device including the same
US-12164734-B2 · Dec 10, 2024 · US
US2016124548A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016124548-A1 |
| Application number | US-201514931209-A |
| Country | US |
| Kind code | A1 |
| Filing date | Nov 3, 2015 |
| Priority date | Nov 3, 2014 |
| Publication date | May 5, 2016 |
| Grant date | — |
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A haptic interface device, said device comprising a substrate, a first conducting layer deposited on the substrate, with the first conducting layer being patterned to provide a first axis of individually-addressable conductive electrodes, a first insulating layer deposited on the first conducting layer, with the insulating layer having a uniform thickness, a second conducting layer deposited on the first insulating layer, with the second conducting layer being patterned to provide a second axis of individually-addressable conductive electrodes, and a dielectric layer deposited on the second conducting layer, with the dielectric layer having a uniform thickness and hardness and being scratch resistant.
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1 . A haptic interface device, said device comprising: a substrate; a first conducting layer deposited on the substrate, with the first conducting layer being patterned to provide a first axis of individually-addressable conductive electrodes; a first insulating layer deposited on the first conducting layer, with the insulating layer having a uniform thickness; a second conducting layer deposited on the first insulating layer, with the second conducting layer being patterned to provide a second axis of individually-addressable conductive electrodes; and a dielectric layer deposited on the second conducting layer, with the dielectric layer having a uniform thickness and hardness and being scratch resistant. 2 . The device of claim 1 , wherein the insulating layer is deposited across the entire surface of the first conductive layer such that the surface of the insulating layer is planar with no protrusions. 3 . The device of claim 1 , wherein the dielectric coating layer is deposited at a temperature of at least 170 C, and the substrate, the conductive layers and the insulating layer are capable of withstanding a temperature of at least 170 C without degradation. 4 . The device of claim 1 , wherein the dielectric layer further comprises alternating layers of organic and inorganic materials. 5 . The method of claim 1 , wherein the insulating layer is made of silica (SiO2). 6 . The device of claim 1 , wherein the dielectric layer is at least 1 micron thick. 7 . The device of claim 1 , wherein the dielectric layer is no more than 50 microns thick. 8 . The device of claim 1 , wherein the substrate, the conductive layers, the insulating layer, and the dielectric layer are transparent. 9 . The device of claim 1 , wherein signals for touch sensing are obtained from capacitance of each electrode, and wherein haptic effects are produced by generating an electric field between an electrode and an appendage of a user that touches a touch surface of the device. 10 . The device of claim 1 , wherein an index matching layer is provided underneath the first conductive layer. 11 . A method of forming a haptic device, the method including the steps of: forming a substrate; depositing a first conductive layer on the substrate; patterning electrodes into the first conductive layer; depositing an insulation layer on the first conductive layer; depositing a second conductive layer on the insulation layer; patterning electrodes into the second conductive layers; and depositing a dielectric layer on the second conductive layer. 12 . The method of claim 11 , wherein the insulating layer is deposited across the entire surface of the first conductive layer such that the surface of the insulating layer is planar with no protrusions. 13 . The method of claim 11 , wherein the insulating layer is made of silica (SiO2). 14 . The method of claim 11 , wherein the dielectric layer is deposited at a temperature of at least 170 C, and the substrate, the conductive layers and the insulating layer are capable of withstanding a temperature of at least 170 C without degradation. 15 . The method of claim 11 , wherein the dielectric layer further comprises alternating layers of organic and inorganic materials. 16 . The method of claim 11 , wherein the dielectric layer is at least 1 micron thick. 17 . The method of claim 11 , wherein the dielectric layer is no more than 50 microns thick. 18 . The method of claim 11 , wherein the substrate, the conductive layers, the insulating layer, and the dielectric layer are transparent. 19 . The method of claim 11 , wherein signals for touch sensing are obtained from capacitance of each electrode, and wherein haptic effects are produced by generating an electric field between an electrode and an appendage of a user that touches a touch surface of the device. 20 . The method of claim 11 , wherein an index matching layer is provided underneath the first conductive layer.
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