Display panel, display device and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-2016124262-A1
Application number	US-201514803293-A
Country	US
Kind code	A1
Filing date	Jul 20, 2015
Priority date	Oct 30, 2014
Publication date	May 5, 2016
Grant date	—

Abstract

The embodiments of the present invention provide a display panel, a method for manufacturing the display panel, a display device, and a method for manufacturing the display device, relating to the technical field of display, thereby solving the problem that the anti-reflection effect of AR film is poor, since attaching an AR film can only achieve a zero reflection within a narrow wavelength range. The method for manufacturing a display panel comprises forming a black matrix on a first surface of a base substrate, and defining a plurality of display units with the criss-cross black matrix; forming a photoresist on a second surface of the base substrate; performing a curing process for the photoresist corresponding to the position of the display units; removing the photoresist corresponding to the position of the black matrix; and performing a texturing process for a portion of the second surface of the base substrate corresponding to the position of the black matrix.

First claim

1 . A method for manufacturing a display panel comprising:
forming a black matrix on a first surface of a base substrate that defines a plurality of display units; forming a photoresist on a second surface of the base substrate, the first surface being arranged opposite to the second surface; performing a curing process for the photoresist corresponding to the position of the display units; removing the photoresist corresponding to the position of the black matrix; and performing a texturing process for a portion of the second surface of the base substrate corresponding to the position of the black matrix.

2 . The method according to claim 1 , wherein performing a curing process for the photoresist corresponding to the position of the display units comprises:
providing a mask plate on the surface of the photoresist, a transparent area of the mask plate corresponding to the position of the display units, and an opaque area of the mask plate corresponding to the position of the black matrix; and exposing the photoresist such that the photoresist corresponding to the transparent area of the mask plate is cured.

3 . The method according to claim 1 , wherein performing a curing process for the photoresist corresponding to the position of the display units comprises:
employing the black matrix as a mask plate; and exposing the photoresist from a side of the first surface of the base substrate, such that the photoresist corresponding to the position of the display units is cured.

4 . The method according to claim 1 , wherein performing a texturing process for a portion of the second surface of the base substrate corresponding to the position of the black matrix comprises:
removing the photoresist corresponding to the position of the black matrix; and spraying an etching solution on the second surface of the base substrate, thereby etching the area of the second surface that is not covered by the photoresist.

5 . The method according to claim 4 , wherein the etching solution comprises bubbles.

6 . The method according to claim 4 , wherein the etching solution comprises hydrofluoric acid solution and the base substrate is a glass substrate.

7 . The method according to claim 5 , wherein the etching solution comprises hydrofluoric acid solution and the base substrate is a glass substrate.

8 . The method according to claim 1 , comprising peeling off the photoresist corresponding to the position of the display units after the step of performing a texturing process has been performed.

9 . A display substrate comprising:
a base substrate; and a black matrix on a first surface of the base substrate; and a plurality of display units defined by the black matrix; wherein a portion of a second surface of the base substrate corresponding to the position of the black matrix is coarse; and wherein the first surface is arranged opposite to the second surface.

10 . A display device comprising:
a frame; and a display substrate:
a base substrate; and
a black matrix on a first surface of a base substrate; and
a plurality of display units defined by the black matrix;
wherein a portion of a second surface of the base substrate corresponding to the position of the black matrix is coarse; and
wherein the first surface is arranged opposite to the second surface.

11 . A method for manufacturing a display device comprising:
forming a display panel comprising:
a base substrate;
a black matrix on a first surface of the base substrate; and
a plurality of display units defined by the black matrix;
forming a photoresist on a second surface of the base substrate, the first surface being arranged opposite to the second surface; performing a curing process for the photoresist corresponding to the position of the display units; removing the photoresist corresponding to the position of the black matrix; and performing a texturing process for a portion of the second surface of the base substrate corresponding to the position of the black matrix.

12 . The method according to claim 11 , wherein performing a curing process for the photoresist corresponding to the position of the display units comprises:
providing a mask plate on the surface of the photoresist, a transparent area of the mask plate corresponding to the position of the display units, and an opaque area of the mask plate corresponding to the position of the black matrix; exposing the photoresist such that the photoresist corresponding to the transparent area of the mask plate is cured.

13 . The method according to claim 11 , wherein performing a curing process for the photoresist corresponding to the position of the display units comprises:
employing the black matrix as a mask plate; and exposing the photoresist from a side of the first surface of the base substrate, such that the photoresist corresponding to the position of the display units is cured.

14 . The method according to claim 11 , wherein performing a texturing process for a portion of the second surface of the base substrate corresponding to the position of the black matrix comprises:
removing the photoresist corresponding to the position of the black matrix; and spraying an etching solution on the second surface of the base substrate, thereby etching the area of the second surface that is not covered by the photoresist.

15 . The method according to claim 11 , comprising peeling off the photoresist corresponding to the position of the display units after the step of performing a texturing process has been performed.

Assignees

• Boe Technology Group Co Ltd

Inventors

• Wu Yanbing

Classifications

• G02F1/133512

  Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

• G02F1/133502 Primary

  Antiglare, refractive index matching layers · CPC title