Polishing pads produced by an additive manufacturing process

US2016107295A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016107295-A1
Application numberUS-201514885950-A
CountryUS
Kind codeA1
Filing dateOct 16, 2015
Priority dateOct 17, 2014
Publication dateApr 21, 2016
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

First claim

Opening claim text (preview).

1 .- 18 . (canceled) 19 . A method of forming a polishing article, comprising: dispensing a first droplet of a first liquid on a surface of a portion of a polishing body, wherein the surface comprises a first material formed by curing an amount of the first liquid; and exposing the dispensed first droplet of the first liquid to electromagnetic radiation for a first period of time to only partially cure the material within the first droplet, wherein exposing the dispensed first droplet of the first liquid occurs after a second period of time has elapsed, and the second time starts when the dispensed first droplet is placed in contact with the surface. 20 . The method of claim 19 , wherein the second period of time is less than or equal to 1 second. 21 . The method of claim 19 , wherein the partially cured first droplet has a contact angle relative to the surface of greater than or equal to 55 degrees. 22 . The method of claim 19 , wherein a contact angle of the dispensed first droplet on the surface after being partially cured is greater than a contact angle of a dispensed droplet of the first liquid that is disposed on the surface and has not been exposed to the electromagnetic radiation. 23 . The method of claim 19 , wherein the first material comprises a polymeric material selected from the group consisting of: polyamides, polycarbonates, polyesters, polyether ketones, polyethers, polyoxymethylenes, polyether sulfones, polyetherimides, polyimides, polyolefins, polysiloxanes, polysulfones, polyphenylenes, polyphenylene sulfides, polyurethanes, polystyrene, polyacrylonitriles, polyacrylates, polymethylmethacrylates, polyurethane acrylates, polyester acrylates, polyether acrylates, epoxy acrylates, polycarbonates, polyesters, melamines, polysulfones, polyvinyl materials, acrylonitrile butadiene styrene (ABS), halogenated polymers, block copolymers and copolymers thereof. 24 . The method of claim 19 , wherein the first droplet comprises a urethane acrylate, a surface cure photoinitiator and a bulk cure photoinitiator. 25 . The method of claim 24 , wherein the bulk cure photoinitiator comprises a material selected from a group consisting of benzoin ethers, benzyl ketals, acetyl phenones, alkyl phenones, and phosphine oxides, and the surface cure photoinitiator comprises a material selected from a group consisting of benzophenone compounds and thioxanthone compounds. 26 . The method of claim 24 , wherein the first material comprises a polymeric material selected from the group consisting of: polyamides, polycarbonates, polyesters, polyether ketones, polyethers, polyoxymethylenes, polyether sulfone, polyetherimides, polyimides, polyolefins, polysiloxanes, polysulfones, polyphenylenes, polyphenylene sulfides, polyurethanes, polystyrene, polyacrylonitriles, polyacrylates, polymethylmethacrylates, polyurethane acrylates, polyester acrylates, polyether acrylates, epoxy acrylates, polycarbonates, polyesters, melamines, polysulfones, polyvinyl materials, acrylonitrile butadiene styrene (ABS), halogenated polymers, block copolymers and copolymers thereof. 27 . A method of forming a polishing article, comprising: dispensing a plurality of first droplets of a first liquid on a surface of a portion of a polishing body, where the surface comprises a first material formed by curing an amount of the first liquid; exposing each of the dispensed plurality of first droplets of the first liquid to electromagnetic radiation generated from a source for a first period of time to partially cure each of the first droplets, and the exposure of each of the dispensed first droplets occurs after a second period of time has elapsed; dispensing a plurality of second droplets of a second liquid on the surface of the portion of the polishing body, wherein each of the plurality of second droplets are positioned adjacent to one or more of the first droplets; and exposing each of the dispensed second droplets to electromagnetic radiation generated from the source for a third period of time to partially cure each of the second droplets, and the exposure of each of the dispensed second droplets occurs after a fourth period of time has elapsed, wherein at least a portion of the first period of time and the third period of time overlap in time. 28 . The method of claim 27 , wherein the second period of time and the fourth period of time are less than or equal to 1 second. 29 . The method of claim 27 , wherein the partially cured first droplets each have a contact angle relative to the surface of greater than or equal to 55 degrees after the first time has elapsed, and the partially cured second droplets each have a contact angle relative to the surface of greater than or equal to 55 degrees after the third time has elapsed. 30 . The method of claim 27 , wherein a contact angle of the dispensed first droplets on the surface after being partially cured is greater than a contact angle of a dispensed droplet of the first liquid that is disposed on the surface and has not been exposed to the electromagnetic radiation. 31 . The method of claim 27 , wherein the partially cured first droplets and the partially cured second droplets each have a contact angle relative to the surface of greater than or equal to 55 degrees. 32 . The method of claim 27 , wherein the first material comprises a polymeric material selected from the group consisting of: polyamides, polycarbonates, polyesters, polyether ketones, polyethers, polyoxymethylenes, polyether sulfones, polyetherimides, polyimides, polyolefins, polysiloxanes, polysulfones, polyphenylenes, polyphenylene sulfides, polyurethanes, polystyrene, polyacrylonitriles, polyacrylates, polymethylmethacrylates, polyurethane acrylates, polyester acrylates, polyether acrylates, epoxy acrylates, polycarbonates, polyesters, melamines, polysulfones, polyvinyl materials, acrylonitrile butadiene styrene (ABS), halogenated polymers, block copolymers and copolymers thereof. 33 . The method of claim 27 , wherein the first droplets and the second droplets each comprise a urethane acrylate, a surface cure photoinitiator and a bulk cure photoinitiator, wherein the bulk cure photoinitiator comprises a material selected from a group consisting of benzoin ethers, benzyl ketals, acetyl phenones, alkyl phenones, and phosphine oxides, and the surface cure photoinitiator comprises a material selected from a group consisting of benzophenone compounds and thioxanthone compounds. 34 . A method of forming a polishing pad, comprising: forming a layer over a surface of a previously formed layer, wherein forming the layer comprises: depositing a plurality of first droplets of a first composition in a first pattern over one or more regions of a surface; depositing a plurality of second droplets of a second composition in a second pattern over the one or more regions of the surface; exposing each of the plurality of the first droplets to electromagnetic radiation generated from a source for a first period of time to partially cure a portion of each of the dispensed first droplets, wherein exposing the dispensed first droplets occurs after a second period of time has elapsed, and the second period of time starts when the dispensed first droplet is placed in contact with the surface; and exposing each of the plurality of the second droplets to electromagnetic radiation generated from the source for a third period of time to partially cure a portion of each of the dispensed second droplets, wherein exposing the dispensed second droplets occurs after a fourth period of time has elapsed, and the fourth

Assignees

Inventors

Classifications

  • Processes of additive manufacturing · CPC title

  • Products made by additive manufacturing · CPC title

  • B24D18/00Primary

    Manufacture of grinding tools {or other grinding devices}, e.g. wheels, not otherwise provided for · CPC title

  • Resins {or natural or synthetic macromolecular compounds (B24D3/22 takes precedence)} · CPC title

  • by stacking sheets of abrasive material · CPC title

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What does patent US2016107295A1 cover?
Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing pr…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification B24D18/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Apr 21 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).