Printed chemical mechanical polishing pad

US2016107288A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016107288-A1
Application numberUS-201514885955-A
CountryUS
Kind codeA1
Filing dateOct 16, 2015
Priority dateOct 17, 2014
Publication dateApr 21, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a base material from a first nozzle and an additive material from a second nozzle and solidifying the base and additive material to form a solidified pad material.

First claim

Opening claim text (preview).

1 . A method of fabricating a polishing pad comprising: depositing a plurality of layers with a 3D printer, at least a first layer of the plurality of polishing layers comprises a base material and an additive material; and solidifying the plurality of layers to form a solidified polishing layer. 2 . The method of claim 1 , wherein the additive material has a non-homogenous distribution across the solidified polishing layer. 3 . The method of claim 1 , wherein the additive material modifies a thermal conductivity of the polishing pad. 4 . The method of claim 1 , wherein the additive material modifies a porosity of the polishing layer. 5 . The method of claim 4 , wherein the additive material include nanoparticles having a diameter between about 5 nm to about 50 μm. 6 . The method of claim 1 , wherein the additive material is a piezoelectric material. 7 . The method of claim 1 , further comprising: successively depositing a plurality of layers on the polishing layers to integrally form a backing layer with the polishing layers. 8 . The method of claim 7 , wherein forming the backing layer comprises: depositing a material different than that used to form the base material of the polishing layer. 9 . The method of claim 1 , wherein the polishing layer has a Shore D hardness of about 30 Shore D to about 90 Shore D. 10 . The method of claim 9 , wherein the polishing layer has a Shore D hardness of about 50 Shore D to about 65 Shore D. 11 . The method of claim 1 , wherein the polishing layer has a Shore A hardness between about 26 Shore A to about 95 Shore A. 12 . The method of claim 1 , wherein at least one of the plurality of layers comprising the polishing layer further comprises: one or more zones, wherein the zones are discrete areas having different characteristics. 13 . The method of claim 12 , wherein additive material and/or base material may be different in one or more zones. 14 . The method of claim 12 , wherein the additive material modifies at least one property of the polishing layer selected from the group consisting of porosity, stiffness, surface energy, abrasiveness, conductivity, and chemical functionality. 15 . A polishing pad comprising: a polishing layer comprising: a plurality of 3D printer deposited layers, wherein a first layer of the plurality of layers comprises: a base material; and one or more additive materials, the additive material modifying at least one property of the polishing layer selected from the group consisting of porosity, stiffness, surface energy, abrasiveness, conductivity, and chemical functionality. 16 . The polishing pad of claim 15 , wherein the additive material has a non-homogenous distribution across the polishing pad. 17 . The polishing pad of claim 15 , wherein the material additive comprises: nanoparticles having a diameter between about 5 nm to about 50 μm. 18 . The polishing pad of claim 1 , further comprising: a backing layer formed from a different material than the base material of the polishing layer. 19 . The polishing pad of claim 1 , wherein at least one of the plurality of layers comprising the polishing layer further comprises: one or more zones, wherein the zones comprise discrete areas having different characteristics. 20 . The polishing pad of claim 19 , wherein the additive material and/or the base material may be different in one or more zones.

Assignees

Inventors

Classifications

  • by stacking sheets of abrasive material · CPC title

  • Products made by additive manufacturing · CPC title

  • characterised by the shape of the lapping pad surface, e.g. grooved · CPC title

  • Processes of additive manufacturing · CPC title

  • B24B37/22Primary

    characterised by a multi-layered structure · CPC title

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What does patent US2016107288A1 cover?
A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a base material from a first nozzle and an additive material from a second nozzle and solidifying the base and additive material to form a solidified pad material.
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification B24D18/0045. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Apr 21 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).