Yttria based conductive plasma-resistant member and methods thereof

Patent metadata

Field	Value
Publication number	US-2016104551-A1
Application number	US-201514879789-A
Country	US
Kind code	A1
Filing date	Oct 9, 2015
Priority date	Oct 10, 2014
Publication date	Apr 14, 2016
Grant date	—

Abstract

The present invention discloses a conductive plasma-resistant member including an yttrium oxide. The plasma-resistant member of the present invention includes an yttrium compound which includes a matrix phase consisting of yttrium oxides, and a conductive dispersed phase. According to the present invention, the present invention provides a semiconductor-grade yttria composite which may be used as a plasma-resistant member requiring conductivity like a focus ring.

First claim

What is claimed is:

1 . A plasma-resistant member comprising an yttrium compound, comprising:
a matrix phase consisting of yttrium oxides; and a conductive dispersed phase.

2 . The plasma-resistant member of claim 1 , wherein the conductive dispersed phase comprises a carbide or nitride of at least one metal selected from a group consisting of Ti, Zr and Hf.

3 . The plasma-resistant member of claim 1 , wherein the conductive dispersed phase comprises at least one carbon-based additive selected from a group consisting of CNT, graphene and particulate carbon.

4 . The plasma-resistant member of claim 1 , comprising:
a body; and a coating layer surrounding the body, wherein the coating layer comprises a matrix phase consisting of yttrium oxides and a conductive dispersed phase.

5 . The plasma-resistant member of claim 1 , wherein the yttrium oxide comprises yttria (Y 2 O 3 ).

6 . The plasma-resistant member of claim 1 , wherein the yttrium oxide comprises yttrium aluminum garnet (YAG).

7 . The plasma-resistant member of claim 5 , wherein the matrix phase further comprises zirconia or alumina.

8 . The plasma-resistant member of claim 1 , wherein the plasma-resistant member comprises at least 5% by volume of the dispersed phase.

9 . The plasma-resistant member of claim 1 , wherein plasma-resistant member comprises 30% by volume or less of the dispersed phase.

10 . The plasma-resistant member of claim 1 , wherein the plasma-resistant member has a conductivity in the range of 10 −7 ˜10 −2 S/cm.

11 . The plasma-resistant member of claim 1 , wherein the plasma-resistant member has a relative density of at least 95%.

12 . A method of producing a plasma-resistant member comprising an yttrium compound, comprising:
providing a powder mixture of an yttrium oxide and a conductive material; molding the powder mixture to produce a molded product; and sintering the molded product under a nitrogen atmosphere.

13 . The method of claim 12 , wherein the conductive material comprises a carbide or nitride of at least one metal selected from a group consisting of Ti, Zr and Hf.

14 . The method of claim 12 , wherein the sintering is performed under atmospheric pressure or vacuum.

15 . The method of claim 12 , wherein the sintering is performed at a temperature of 1700˜1900° C.

16 . The method of claim 12 , wherein the sintering is performed by spark plasma sintering (SPS).

17 . A method of producing a plasma-resistant member comprising an yttrium compound, comprising:
molding a powder mixture of a yttrium oxide and a carbide or nitride of at least one metal selected from a group consisting of Ti, Zr and Hf to produce a molded product; calcining the molded product; and sintering the molded product under a nitrogen atmosphere.

18 . The plasma-resistant member of claim 6 , wherein the matrix phase further comprises zirconia or alumina.

Assignees

• Korea Mach & Materials Inst

Inventors

• Kim Hai Doo
• Lee Jae Wook
• Kim Ha Neul
• Kim Jin Myung
• Park Young Jo
• Ko Jae Woong

Classifications

• C04B35/5611

  based on titanium carbides · CPC title

• H01B1/16 Primary

  the conductive material comprising metals or alloys · CPC title

• C04B35/5622

  based on zirconium or hafnium carbides · CPC title

• C04B2235/3886

  Refractory metal nitrides, e.g. vanadium nitride, tungsten nitride · CPC title

• C04B2235/658

  Atmosphere during thermal treatment · CPC title