Near infrared radiation-absorbing composition, near infrared radiation cut-off filter and production method therefor, and camera module and production method therefor

Patent metadata

Field	Value
Publication number	US-2016103247-A1
Application number	US-201514972321-A
Country	US
Kind code	A1
Filing date	Dec 17, 2015
Priority date	Jul 1, 2013
Publication date	Apr 14, 2016
Grant date	—

Abstract

Provided are a near infrared radiation-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining high near infrared radiation-shielding properties, a near infrared radiation cut-off filter and a production method therefor, and a camera module and a production method therefor. The near infrared radiation-absorbing composition includes a copper compound obtained from a reaction between a siloxane (A1) having an acid group or a salt thereof and a copper component.

First claim

What is claimed is:

1 . A near infrared radiation-absorbing composition comprising:
a copper compound obtained from a reaction between a siloxane (A1) having an acid group or a salt thereof and a copper component.

2 . The near infrared radiation-absorbing composition according to claim 1 ,
wherein the acid group is at least one group selected from a group consisting of a phosphoric acid group, a carboxylic acid group, and a sulfonic acid group.

3 . The near infrared radiation-absorbing composition according to claim 1 ,
wherein the siloxane (A1) includes at least one of a polymer having a repeating unit represented by Formula (A1-1), a cyclic siloxane, a siloxane having a ladder-like structure, a siloxane having a basket-like structure, and a siloxane having a random structure:

in Formula (A1-1), R 1 represents an alkyl group or an alkoxy group, Y 1 represents a divalent linking group, and X 1 represents an acid group or a salt thereof.

4 . The near infrared radiation-absorbing composition according to claim 1 ,
wherein the acid group is a sulfonic acid group.

5 . The near infrared radiation-absorbing composition according to claim 3 ,
wherein the divalent linking group represents a linear, branched, or cyclic alkylene group, arylene group, —O—, —S—, —C(═O)—, —C(═O)O—, or a group made of a combination thereof.

6 . A near infrared radiation-absorbing composition comprising:
a copper complex in which an acid group ion site in a siloxane (A2) having an acid group ion is used as a ligand.

7 . A near infrared radiation cut-off filter obtained using the near infrared radiation-absorbing composition according to claim 1 .

8 . The near infrared radiation cut-off filter according to claim 7 ,
wherein, before and after heating at 200° C. or higher for five minutes, a percentage of change in absorbance at a wavelength of 400 nm and a percentage of change in absorbance at a wavelength of 800 nm are respectively 10% or lower.

9 . A production method for a near infrared radiation cut-off filter, comprising:
forming a near infrared radiation cut-off filter on a light-receiving side of a solid-state imaging element substrate by applying the near infrared radiation-absorbing composition according to claim 1 .

10 . A camera module comprising:
a solid-state imaging element substrate; and a near infrared radiation cut-off filter disposed on a light-receiving side of the solid-state imaging element substrate, wherein the near infrared radiation cut-off filter according to claim 8 is used.

11 . A production method for a camera module comprising a solid-state imaging element substrate and a near infrared radiation cut-off filter disposed on a light-receiving side of the solid-state imaging element substrate, comprising:
forming a near infrared radiation cut-off filter by applying the near infrared radiation-absorbing composition according to claim 1 to a light-receiving side of the solid-state imaging element substrate.

12 . A method for manufacturing a near infrared radiation-absorbing composition comprising:
reacting a siloxane (A1) having an acid group or a salt thereof with a copper component.

13 . The method for manufacturing a near infrared radiation-absorbing composition according to claim 12 ,
wherein the acid group is at least one group selected from a group consisting of a phosphoric acid group, a carboxylic acid group, and a sulfonic acid group.

14 . The method for manufacturing a near infrared radiation-absorbing composition according to claim 12 ,
wherein the siloxane (A1) includes at least one of a polymer having a repeating unit represented by Formula (A1-1), a cyclic siloxane, a siloxane having a ladder-like structure, a siloxane having a basket-like structure, and a siloxane having a random structure:

in Formula (A1-1), R 1 represents an alkyl group or an alkoxy group, Y′ represents a divalent linking group, and X 1 represents an acid group or a salt thereof.

15 . The method for manufacturing a near infrared radiation-absorbing composition according to claim 12 ,
wherein the acid group is a sulfonic acid group.

16 . The method for manufacturing a near infrared radiation-absorbing composition according to claim 14 ,
wherein the divalent linking group represents a linear, branched, or cyclic alkylene group, arylene group, —O—, —S—, —C(═O)—, —C(═O)O—, or a group made of a combination thereof.

17 . The method for manufacturing a near infrared radiation-absorbing composition according to claim 12 , further comprising adding a solvent.

Assignees

• Fujifilm Corp

Inventors

• Hitomi Seiichi
• Inasaki Takeshi

Classifications

• H04N25/00

  Circuitry of solid-state image sensors [SSIS]; Control thereof · CPC title

• H04N23/57

  Mechanical or electrical details of cameras or camera modules specially adapted for being embedded in other devices · CPC title

• H04N23/21

  from near infrared [NIR] radiation · CPC title

• H10F39/8053

  Colour filters · CPC title

• H10F39/811

  Interconnections · CPC title