Composition, resin mold, photo imprinting method, method for manufacturing optical element, and method for manufacturing electronic element

Patent metadata

Field	Value
Publication number	US-2016017074-A1
Application number	US-201414773268-A
Country	US
Kind code	A1
Filing date	Mar 3, 2014
Priority date	Mar 4, 2013
Publication date	Jan 21, 2016
Grant date	—

Abstract

Described is a composition comprising: a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

First claim

1 . A composition comprising:
a compound (A) having a substituent (a) being at least either one of an acryloyl group and a methacryloyl group, and a perfluoroalkylene group; and a compound (B) having a substituent (b) being either one of an acryloyl group and a methacryloyl group, and a substituent (c) being either one of an acryloyl group and a methacryloyl group.

2 . The composition according to claim 1 , having a curing property with light.

3 . The composition according to claim 1 , comprising at least either one compound of a compound represented by the following formula (1) and a compound represented by the following formula (2),

wherein, each of R 1 , R 2 , R 3 and R 4 in formula (1) represents a substituent containing at least one of a hydrogen atom, a carbon atom, a nitrogen atom and a sulfur atom, and
n in formula (1) represents an integer of 1 to 10,

wherein, each of R 5 , R 6 , R 7 and R 8 in formula (2) represents a substituent containing at least one of a hydrogen atom, a carbon atom, a nitrogen atom and a sulfur atom, and
each of m and r in formula (2) represents an integer of 1 to 30.

4 . The composition according to claim 3 , wherein each of R 1 and R 2 in the compound represented by formula (1) is either one of a hydrogen atom and a methyl group.

5 . The composition according to claim 4 , wherein each of R 5 and R 6 in the compound represented by formula (2) is either one of a hydrogen atom and a methyl group.

6 . The composition according to claim 3 , wherein at least one of parts represented by the following formula (3) and formula (4) of the compound represented by formula (1) contains any one of structures represented by the following formula (5), formula (6) and formula (7),

wherein, j in formula (5) represents 1 or 2, and
each of R 9 , R 10 , R 11 and R 12 in formula (6) is any one of a hydrogen atom, a methyl group and a substituent represented by the following formula (8),

wherein, in formula (4), R 13 each independently represents a hydrogen atom or a methyl group.

7 . The composition according to claim 3 , wherein at least one of parts represented by the following formula (9) and formula (10) of the compound represented by formula (2) contains any one of structures represented by the following formula (11), formula (12) and formula (13),

wherein, k in formula (11) represents 1 or 2, and
each of R 14 , R 15 , R 16 and R 17 in formula (12) is any one of a hydrogen atom, a methyl group and a substituent represented by the following formula (14),

wherein, R 18 in formula (14) represents a hydrogen atom or a methyl group.

8 . The composition according to claim 6 ,
wherein R 11 is either one of a hydrogen atom and a methyl group, and each of R 10 and R 12 is a hydrogen atom when R 9 is the substituent represented by formula (8), R 12 is either one of a hydrogen atom and a methyl group, and each of R 9 and R 11 is a hydrogen atom when R 10 is the substituent represented by formula (8), R 9 is either one of a hydrogen atom and a methyl group, and each of R 10 and R 12 is a hydrogen atom when R 11 is the substituent represented by formula (8), and R 10 is either one of a hydrogen atom and a methyl group, and each of R 9 and R 11 is a hydrogen atom when R 12 is the substituent represented by formula (8).

9 . The composition according to claim 7 ,
wherein R 16 is either one of a hydrogen atom and a methyl group, and each of R 15 and R 17 is a hydrogen atom when R 14 is the substituent represented by formula (14), R 17 is either one of a hydrogen atom and a methyl group, and each of R 14 and R 16 is a hydrogen atom when R 15 is the substituent represented by formula (14), R 14 is either one of a hydrogen atom and a methyl group, and each of R 15 and R 17 is a hydrogen atom when R 16 is the substituent represented by formula (14), and R 15 is either one of a hydrogen atom and a methyl group, and each of R 14 and R 16 is a hydrogen atom when R 17 is the substituent represented by formula (14).

10 . The composition according to claim 6 , wherein each of R 9 , R 10 , R 11 and R 12 is a hydrogen atom.

11 . The composition according to claim 7 , wherein each of R 14 , R 15 , R 16 and R 17 is a hydrogen atom.

12 . The composition according to claim 1 ,
wherein, compound (B) has a plurality of substituents with polymerization activity, each of the plurality of substituents is either one of an acryloyl group and a methacryloyl group, and a value being a molecular weight of compound (B) divided by a total number of the acryloyl group and the methacryloyl group contained in compound (B), is within the range of 85 to 230.

13 . A method for manufacturing a resin, comprising:
curing the composition according to claim 1 .

14 . A method for imprinting, comprising:
curing the composition according to claim 1 .

15 . A method for manufacturing an optical element, comprising:
curing the composition according to claim 1 .

16 . A method for manufacturing an electronic element, comprising:
curing the composition according to claim 1 .

17 . A light curable composition comprising:
a first compound comprising:
a first substituent of the first compound selected from the group consisting of an acryloyl group, a methacryloyl group, and a perfluoroalkylene group; and
a second compound comprising:
a first substituent of the second compound selected from the group consisting of an acryloyl group and a methacryloyl group, and
a second substituent of the second compound selected from the group consisting of an acryloyl group and a methacryloyl group,
wherein at least one compound is represented by Formula I:

and wherein:
each of R 1 and R 2 is independently selected from the group consisting of a hydrogen atom and a methyl group,
each of R 3 and R 4 is a substituent containing at least one of a hydrogen atom, a carbon atom, a nitrogen atom and a sulfur atom, and
n is an integer of 1 to 10.

18 . The light curable composition of claim 17 , further comprising a compound represented by Formula II comprising and wherein Formula II is

wherein, each of R 5 , R 6 , R 7 and R 8 in Formula II represents a substituent containing at least one of a hydrogen atom, a carbon atom, a nitrogen atom and a sulfur atom, and
each of m and r in Formula II represents an integer of 1 to 30.

19 . The light curable composition of claim 18 , wherein the light curable composition comprises Formula II and wherein each of R 5 and R 6 in Formula II is independently selected from the group consisting of a hyd

Assignees

• Toyo Gosei Co Ltd

Inventors

• Wada Risa
• Osaki Takeshi

Classifications

• C08F299/024

  the unsaturation being in acrylic or methacrylic groups · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F7/0046

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• C08F290/06 Primary

  Polymers provided for in subclass C08G · CPC title

• G03F7/027

  Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title