Device for magnetizing laser plasma by means of a pulsed magnetic field

US2016014875A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016014875-A1
Application numberUS-201414771023-A
CountryUS
Kind codeA1
Filing dateFeb 26, 2014
Priority dateFeb 27, 2013
Publication dateJan 14, 2016
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A device for magnetizing laser plasma by unit of a pulsed magnetic field, which includes: a laser source for emitting a laser pulse; a vacuum chamber in which a target capable of generating a laser plasma during an interaction of the laser pulse with the target is arranged; and a coil capable of generating a pulsed magnetic field in the laser plasma, the device being characterised in that the coil is arranged in a reentrant chamber containing a coolant.

First claim

Opening claim text (preview).

1 - 13 . (canceled) 14 . A device for magnetizing a laser plasma with a pulsed magnetic field, comprising: a vacuum chamber in which a target able to generate a laser plasma during an interaction of the target with a laser pulse is placed; and a winding that is powerable electrically in order to generate a pulsed magnetic field in the laser plasma, wherein the winding is placed in a re-entrant chamber containing a cooling fluid. 15 . The device as claimed in claim 14 , wherein the re-entrant chamber comprises an axial vacuum through-duct comprising two axial ends, each of the axial ends being in communication with the vacuum chamber. 16 . The device as claimed in claim 15 , wherein the winding comprises at least one coil encircling the axial vacuum through-duct. 17 . The device as claimed in claim 15 , wherein the winding comprises two coils encircling the axial vacuum through-duct, said coils being separated by a central plate. 18 . The device as claimed in claim 14 , wherein the re-entrant chamber furthermore comprises at least one radial vacuum through-duct comprising two radial ends, each of the radial ends being in communication with the vacuum chamber. 19 . The device as claimed in claim 18 , wherein the winding comprises two coils encircling the axial vacuum through-duct, said coils being separated by a central plate, and wherein the radial vacuum through-duct is located in the central plate separating the two coils. 20 . The device as claimed in claim 14 , wherein the target is placed in the middle of the winding. 21 . The device as claimed in claim 14 , wherein the target is placed at one end of the winding. 22 . The device as claimed in claim 14 , wherein the cooling fluid is either a gas or a cryogenic fluid. 23 . The device as claimed in claim 14 , wherein the re-entrant chamber comprises a weakly conductive vacuum-resistant material. 24 . The device as claimed in claim 23 , wherein the re-entrant chamber comprises a stainless steel. 25 . The device as claimed in claim 14 , wherein the pulsed magnetic field is a magnetic field the strength of which is higher than a few tesla. 26 . The device as claimed in claim 25 , wherein the pulsed magnetic field is a magnetic field the strength of which is higher than ten tesla. 27 . The device as claimed in claim 26 , wherein the pulsed magnetic field is a magnetic field the strength of which is higher than forty tesla. 28 . The device as claimed in claim 14 , furthermore comprising a laser source for emitting a laser pulse able to interact with the target in order to generate the laser plasma, wherein the laser pulse possesses a power comprised between one gigawatt and one petawatt. 29 . The device as claimed in claim 28 , wherein the laser pulse possesses a power comprised between one terawatt and one hundred terawatts. 30 . The device as claimed in claim 28 , wherein the laser pulse possesses a duration comprised between ten femtoseconds and ten nanoseconds. 31 . The device as claimed in claim 28 , wherein the laser pulse possesses a duration comprised between ten femtoseconds and ten picoseconds. 32 . The device as claimed in claim 29 , wherein the laser pulse possesses a duration comprised between ten femtoseconds and ten nanoseconds. 33 . The device as claimed in claim 29 , wherein the laser pulse possesses a duration comprised between ten femtoseconds and ten picoseconds.

Assignees

Inventors

Classifications

  • H05H6/00Primary

    Targets for producing nuclear reactions (supports for targets or objects to be irradiated G21K5/08 {; preparation of tritium C01B4/00; targets, e.g. pellets for fusion reactions by laser or charged particles beam injection H05H1/22}) · CPC title

  • Nuclear fusion reactors · CPC title

  • Fusion by impact, e.g. cluster/beam interaction, ion beam collisions, impact on a target · CPC title

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What does patent US2016014875A1 cover?
A device for magnetizing laser plasma by unit of a pulsed magnetic field, which includes: a laser source for emitting a laser pulse; a vacuum chamber in which a target capable of generating a laser plasma during an interaction of the laser pulse with the target is arranged; and a coil capable of generating a pulsed magnetic field in the laser plasma, the device being characterised in that the c…
Who is the assignee on this patent?
Ecole Polytech
What technology area does this patent fall under?
Primary CPC classification H05H6/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jan 14 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).