Semiconductor device

US2016013303A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016013303-A1
Application numberUS-201514860826-A
CountryUS
Kind codeA1
Filing dateSep 22, 2015
Priority dateOct 9, 2012
Publication dateJan 14, 2016
Grant date

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

According to one embodiment, a semiconductor device includes a semiconductor layer, an electrode, and an insulating portion. The semiconductor layer has a first surface. The electrode is provided on the first surface of the semiconductor layer. The insulating portion includes a first layer and a second layer. The first layer covers the electrode on the first surface of the semiconductor layer and has a first internal stress along the first surface. The second layer is provided on the first layer and has a second internal stress in a reverse direction of the first internal stress.

First claim

Opening claim text (preview).

What is claimed is: 1 . A semiconductor device comprising: a semiconductor layer having a first surface; a first electrode provided on the first surface of the semiconductor layer; a second electrode provided spaced from the first electrode on the first surface of the semiconductor layer; a control electrode provided between the first electrode and the second electrode on the first surface of the semiconductor layer; and a first insulating portion including a first layer and a second layer, the first layer covering the first electrode, the second electrode, and the control electrode on the first surface of the semiconductor layer and having a first internal stress along the first surface, the second layer provided on the first layer and having a second internal stress in a reverse direction of the first internal stress. 2 . The device according to claim 1 , wherein a thickness of the second layer is thinner than a thickness of the first layer, and the second internal stress is larger than the first internal stress. 3 . The device according to claim 1 , wherein a material composition of the second layer is different from a material composition of the first layer. 4 . The device according to claim 1 , wherein a material of the second layer is same as a material of the first layer. 5 . The device according to claim 1 , wherein the first internal stress is a tensile stress, and the second internal stress is a compressive stress. 6 . The device according to claim 1 , wherein the semiconductor layer includes a nitride semiconductor. 7 . The device according to claim 1 , wherein the semiconductor layer includes silicon carbide. 8 . The device according to claim 1 , further comprising a control insulating film provided between the control electrode and the first surface, a material of the second layer being same as a material of the control insulating film. 9 . The device according to claim 8 , wherein a thickness of the second layer is same as a thickness of the control insulating film. 10 . The device according to claim 1 , further comprising: a first extending electrode extending on the second layer and an extending end of the first extending electrode covering the control electrode; and a contact portion connecting the first extending electrode to the first electrode. 11 . The device according to claim 1 , further comprising a second insulating portion including a third layer and a fourth layer, the third layer covering the first extending electrode on the second layer and having a third internal stress along the first surface, the fourth layer provided on the third layer and having a fourth internal stress in a reverse direction of the third internal stress. 12 . The device according to claim 11 , wherein a thickness of the fourth layer is thinner than a thickness of the third layer. 13 . The device according to claim 11 , wherein a material composition of the fourth layer is different from a material composition of the third layer. 14 . The device according to claim 11 , wherein a material of the fourth layer is same as a material of the third layer.

Assignees

Inventors

Classifications

  • Reinforcing structures, e.g. collars · CPC title

  • the encapsulations being multilayered · CPC title

  • Bond pads, in general · CPC title

  • H10W42/121Primary

    protecting against mechanical damage (H10W76/00, H10W74/00 take precedence) · CPC title

  • High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] · CPC title

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Frequently asked questions

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What does patent US2016013303A1 cover?
According to one embodiment, a semiconductor device includes a semiconductor layer, an electrode, and an insulating portion. The semiconductor layer has a first surface. The electrode is provided on the first surface of the semiconductor layer. The insulating portion includes a first layer and a second layer. The first layer covers the electrode on the first surface of the semiconductor layer a…
Who is the assignee on this patent?
Toshiba Kk
What technology area does this patent fall under?
Primary CPC classification H10W42/121. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jan 14 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).