Semiconductor die, semiconductor package and substrate dicing method
US-2024421000-A1 · Dec 19, 2024 · US
US2016013303A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016013303-A1 |
| Application number | US-201514860826-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 22, 2015 |
| Priority date | Oct 9, 2012 |
| Publication date | Jan 14, 2016 |
| Grant date | — |
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Official abstract text for this publication.
According to one embodiment, a semiconductor device includes a semiconductor layer, an electrode, and an insulating portion. The semiconductor layer has a first surface. The electrode is provided on the first surface of the semiconductor layer. The insulating portion includes a first layer and a second layer. The first layer covers the electrode on the first surface of the semiconductor layer and has a first internal stress along the first surface. The second layer is provided on the first layer and has a second internal stress in a reverse direction of the first internal stress.
Opening claim text (preview).
What is claimed is: 1 . A semiconductor device comprising: a semiconductor layer having a first surface; a first electrode provided on the first surface of the semiconductor layer; a second electrode provided spaced from the first electrode on the first surface of the semiconductor layer; a control electrode provided between the first electrode and the second electrode on the first surface of the semiconductor layer; and a first insulating portion including a first layer and a second layer, the first layer covering the first electrode, the second electrode, and the control electrode on the first surface of the semiconductor layer and having a first internal stress along the first surface, the second layer provided on the first layer and having a second internal stress in a reverse direction of the first internal stress. 2 . The device according to claim 1 , wherein a thickness of the second layer is thinner than a thickness of the first layer, and the second internal stress is larger than the first internal stress. 3 . The device according to claim 1 , wherein a material composition of the second layer is different from a material composition of the first layer. 4 . The device according to claim 1 , wherein a material of the second layer is same as a material of the first layer. 5 . The device according to claim 1 , wherein the first internal stress is a tensile stress, and the second internal stress is a compressive stress. 6 . The device according to claim 1 , wherein the semiconductor layer includes a nitride semiconductor. 7 . The device according to claim 1 , wherein the semiconductor layer includes silicon carbide. 8 . The device according to claim 1 , further comprising a control insulating film provided between the control electrode and the first surface, a material of the second layer being same as a material of the control insulating film. 9 . The device according to claim 8 , wherein a thickness of the second layer is same as a thickness of the control insulating film. 10 . The device according to claim 1 , further comprising: a first extending electrode extending on the second layer and an extending end of the first extending electrode covering the control electrode; and a contact portion connecting the first extending electrode to the first electrode. 11 . The device according to claim 1 , further comprising a second insulating portion including a third layer and a fourth layer, the third layer covering the first extending electrode on the second layer and having a third internal stress along the first surface, the fourth layer provided on the third layer and having a fourth internal stress in a reverse direction of the third internal stress. 12 . The device according to claim 11 , wherein a thickness of the fourth layer is thinner than a thickness of the third layer. 13 . The device according to claim 11 , wherein a material composition of the fourth layer is different from a material composition of the third layer. 14 . The device according to claim 11 , wherein a material of the fourth layer is same as a material of the third layer.
Reinforcing structures, e.g. collars · CPC title
the encapsulations being multilayered · CPC title
Bond pads, in general · CPC title
protecting against mechanical damage (H10W76/00, H10W74/00 take precedence) · CPC title
High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] · CPC title
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