Under layer film-forming composition for imprints and method for forming pattern

Patent metadata

Field	Value
Publication number	US-2016009946-A1
Application number	US-201514860767-A
Country	US
Kind code	A1
Filing date	Sep 22, 2015
Priority date	Mar 26, 2013
Publication date	Jan 14, 2016
Grant date	—

Abstract

Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

First claim

What is claimed is:

1 . A composition for forming underlying layer for imprints, the composition comprising:
(A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

2 . The composition for forming underlying layer for imprints of claim 1 ,
wherein the (A) resin is a copolymer comprising a repeating unit having the ethylenic unsaturated group (P), and a repeating unit having the cyclic ether group (T) selected from oxiranyl group and oxetanyl group.

3 . The composition for forming underlying layer for imprints of claim 1 ,
wherein the (A) resin is a copolymer comprising 10 to 97 mol %, relative to a total repeating units, of the repeating unit having the ethylenic unsaturated group (P), and 3 to 90 mol %, relative to a total repeating units, of the repeating unit having the cyclic ether group (T) selected from oxiranyl group and oxetanyl group.

4 . The composition for forming underlying layer for imprints of claim 1 ,
wherein the ethylenic unsaturated group (P) is a (meth)acryloyloxy group.

5 . The composition for forming underlying layer for imprints of claim 1 ,
wherein the (A) resin comprises at least one species of repeating unit represented by any of Formulae (I) to (III), and at least one species of repeating unit represented by Formulae (IV) to (VI):

wherein each of R 11 , R 12 , R 21 , R 22 , R 31 , R 32 , R 41 , R 51 , and R 61 independently represents a hydrogen atom or methyl group; each of L 1 , L 2 , L 3 , L 4 , L 5 and L 6 independently represents a single bond or alkylene group having 1 to 10 carbon atoms, the alkylene chain may contain at least one of ether bond, ester bond, amide bond and urethane bond, and a hydrogen atom in the alkylene group may be substituted by a hydroxy group; and T represents any of cyclic ether groups represented by Formulae (T-1), (T-2) and Formula (T-3);

wherein each of R T1 and R T3 independently represents a hydrogen atom or alkyl group having 1 to 5 carbon atoms; p represents an integer of 0 or 1, q represents an integer of 0 or 1, and n represents an integer of 0 to 2; each wavy line indicates a position beyond where L 4 , L 5 or L 6 is bound.

6 . The composition for forming underlying layer for imprints of claim 5 , wherein the cyclic ether group (T) is a group represented by Formula (T-1).

7 . The composition for forming underlying layer for imprints of claim 1 , wherein the (A) resin comprises at least one species of repeating units represented by Formulae (I-1) to (IV-1):

wherein each of R 11 , R 12 , R 21 , R 22 , R 31 , R 32 , R 41 , R 51 and R 61 independently represents a hydrogen atom or methyl group.

8 . The composition for forming underlying layer for imprints of claim 1 , wherein the (A) resin is a (meth)acrylic resin.

9 . The composition for forming underlying layer for imprints of claim 1 , which comprises 1.0% by mass or less of the (A) resin in the composition for forming underlying layer for imprints.

10 . The composition for forming underlying layer for imprints of claim 1 , wherein the composition for forming underlying layer for imprints contains a (C) acid or acid generator.

11 . The composition for forming underlying layer for imprints of claim 1 , wherein the composition for forming underlying layer for imprints contains 0.05 to 1.0% by mass of the (A) resin, 98.0 to 99.95% by mass of the (B) solvent, and 0.0005 to 0.1% by mass of a (C) acid or acid generator.

12 . A laminate comprising:
a substrate; and an underlying layer obtainable by curing, on a surface of the substrate, the composition for forming underlying layer for imprints described in claim 1 .

13 . A method for forming a fine pattern comprising:
coating the composition for forming underlying layer for imprints described in claim 1 , over a substrate; forming an underlying layer, by curing the coated composition for forming underlying layer for imprints; coating a photo-curable composition for imprints over the underlying layer; pressing thereto a mold with a fine pattern; curing the photo-curable composition for imprints by photo-irradiation, while keeping the photo-curable composition for imprints pressed under the mold; and releasing the mold.

14 . A method for forming a fine pattern of claim 13 , wherein the forming an underlying layer is carried out by curing the composition for forming underlying layer for imprints under heating at 120 to 160° C.

15 . A method for manufacturing a semiconductor device, comprising the method for forming a fine pattern described in claim 13 .

Assignees

• Fujifilm Corp

Inventors

• Kitagawa Hirotaka
• Enomoto Yuichiro

Classifications

• C09D151/003

  grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds (C09D151/04, C09D151/06 take precedence) · CPC title

• C09D151/08 Primary

  grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds · CPC title

• B29K2096/02

  Graft polymers · CPC title

• B29C59/005

  characterised by the choice of material · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title