Dynamic Pressure Sensor
US-2015276529-A1 · Oct 1, 2015 · US
Diaphragm Stiffener
US2016007119A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016007119-A1 |
| Application number | US-201514683360-A |
| Country | US |
| Kind code | A1 |
| Filing date | Apr 10, 2015 |
| Priority date | Apr 23, 2014 |
| Publication date | Jan 7, 2016 |
| Grant date | — |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A diaphragm for deployment in a micro electro mechanical system (MEMS) microphone includes a base portion. The base portion is generally planar and has a first side and a second side. One or more protrusions are formed with and extend from the base portion. The protrusions are configured and arranged so as to stiffen the base portion and increase a range of sound pressure levels before distortion occurs.
First claim
Opening claim text (preview).
What is claimed is: 1 . A diaphragm for deployment in a micro electro mechanical system (MEMS) microphone, the diaphragm comprising: a base portion, the base portion being generally planar and having a first side and a second side; one or more protrusions that are formed with and extend from the base portion, the protrusions being configured and arranged so as to stiffen the base portion and increase a range of sound pressure levels before distortion occurs. 2 . The diaphragm of claim 1 , wherein the protrusions are arranged in a scaffold pattern 3 . The diaphragm of claim 1 , wherein the protrusions are disposed on one of the first side of the diaphragm and the second side of the diaphragm. 4 . The diaphragm of claim 1 , wherein the protrusions are disposed on both of the first side of the diaphragm and the second side of the diaphragm. 5 . The diaphragm of claim 1 , wherein the protrusions are disposed over the base portion so as to provide greater than 90 percent coverage over a flexing region. 6 . A micro electro mechanical system (MEMS) microphone, the diaphragm comprising: a back plate; a diaphragm disposed is proximity to the back plate, the diaphragm comprising: a base portion, the base portion being generally planar and having a first side and a second side; one or more protrusions that are formed with and extend from the base portion, the protrusions being configured and arranged so as to stiffen the base portion and increase a range of sound pressure levels before distortion occurs. 7 . The MEMS microphone of claim 1 , wherein the protrusions of the diaphragm are arranged in a scaffold pattern 8 . The MEMS microphone of claim 1 , wherein the protrusions of the diaphragm are disposed on one of the first side of the diaphragm and the second side of the diaphragm. 9 . The MEMS microphone of claim 1 , wherein the protrusions of the diaphragm are disposed on both of the first side of the diaphragm and the second side of the diaphragm. 10 . The MEMS microphone of claim 1 , wherein the protrusions of the diaphragm are disposed over the base portion so as to provide greater than 90 percent coverage over a flexing region.
Assignees
Inventors
Classifications
Mouthpieces; {Microphones;} Attachments therefor · CPC title
- H04R7/00Primary
Diaphragms for electromechanical transducers (in general F16J3/00); Cones (for musical instruments G10 ){(cones, diaphragms or the like, for emitting or receiving sound in general G10K13/00; Mounting thereof)} · CPC title
Mems transducers or their use · CPC title
Plane diaphragms · CPC title
- H04R19/04Primary
Microphones (H04R19/01 takes precedence) · CPC title
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Frequently asked questions
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- What does patent US2016007119A1 cover?
- A diaphragm for deployment in a micro electro mechanical system (MEMS) microphone includes a base portion. The base portion is generally planar and has a first side and a second side. One or more protrusions are formed with and extend from the base portion. The protrusions are configured and arranged so as to stiffen the base portion and increase a range of sound pressure levels before distorti…
- Who is the assignee on this patent?
- Knowles Electronics Llc
- What technology area does this patent fall under?
- Primary CPC classification H04R7/00. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Jan 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).