Membranes for gas separation
US-12023633-B2 · Jul 2, 2024 · US
Method for producing a microscreen
US2016004162A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016004162-A1 |
| Application number | US-201414770244-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 17, 2014 |
| Priority date | Feb 25, 2013 |
| Publication date | Jan 7, 2016 |
| Grant date | — |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A microscreen, substantially formed of a photoresist material, is produced by applying a photoresist layer to a support using a liquid photoresist, partially covering the photoresist layer with a mask that defines the structure of the microscreen, exposing the photoresist to radiation, developing the photoresist, and removing the photoresist from the support.
First claim
Opening claim text (preview).
1 - 5 . (canceled) 6 . A process for producing a microsieve substantially formed by a photoresist material, comprising: applying a liquid photoresist to a carrier to form a photoresist layer; partly covering the photoresist layer with a mask determining a structure of the microsieve; exposing the photoresist by action of radiation; developing the photoresist; and detaching the photoresist from the carrier. 7 . The process as claimed in claim 6 , further comprising, prior to said applying of the liquid photoresist to the carrier, applying to the carrier a detachment layer, activatable at least one of thermally and by radiation, simplifying detachment of the microsieve from the carrier. 8 . The process as claimed in claim 6 , wherein the carrier is a detachment layer activatable at least one of thermally and by radiation. 9 . The process as claimed in claim 6 , further comprising, prior to said applying of the liquid photoresist to the carrier, applying a sacrificial layer simplifying detachment of the microsieve from the carrier. 10 . The process as claimed in claim 6 , further comprising detaching the microsieve from the carrier by etching to obtain at least partial dissolution of the carrier.
Assignees
Inventors
Classifications
- B01D39/1692Primary
Other shaped material, e.g. perforated or porous sheets · CPC title
Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title
- G03F7/40Primary
Treatment after imagewise removal, e.g. baking · CPC title
Liquid compositions therefor, e.g. developers · CPC title
Details relating to pores or porosity of the membranes · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US2016004162A1 cover?
- A microscreen, substantially formed of a photoresist material, is produced by applying a photoresist layer to a support using a liquid photoresist, partially covering the photoresist layer with a mask that defines the structure of the microscreen, exposing the photoresist to radiation, developing the photoresist, and removing the photoresist from the support.
- Who is the assignee on this patent?
- Siemens Ag
- What technology area does this patent fall under?
- Primary CPC classification B01D39/1692. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Thu Jan 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).