Color filter substrate, manufacturing method thereof and display panel

Patent metadata

Field	Value
Publication number	US-2016004113-A1
Application number	US-201414655535-A
Country	US
Kind code	A1
Filing date	Oct 11, 2014
Priority date	Oct 15, 2013
Publication date	Jan 7, 2016
Grant date	—

Abstract

A color filter substrate and a manufacturing method thereof, and a display panel are provided. The color filter substrate includes; a first base substrate; a black matrix, disposed on the first base substrate; and a plurality of spacers, disposed on the black matrix, wherein at least part of the spacers and the black matrix are provided with a pillow layer. In the embodiments of the present invention, by forming the pillow layer on the black matrix, and providing the spacer on the pillow layer, a compression amount of the spacer is increased, a risk of occurrence of gravity Mura is reduced, and picture display quality and reliability of a display device are improved; and a thickness of the pillow layer can be changed continuously.

First claim

1 . A color filter substrate, comprising:
a first base substrate; a black matrix, disposed on the first base substrate; and a plurality of spacers, disposed on the black matrix, wherein at least one of the spacers and the black matrix are provided with a pillow layer therebetween.

2 . The color filter substrate according to claim 1 , wherein the pillow layer and the black matrix are of an integral structure.

3 . The color filter substrate according to claim 1 , wherein the pillow layer is of a one-stage step-like structure or a step-like structure of more stages.

4 . The color filter substrate according to claim 3 , wherein the plurality of spacers comprise a main spacer and an auxiliary spacer, the main spacer being disposed on a highest stage of the pillow layer, and the auxiliary spacer being disposed on a stage other than the highest stage of the pillow layer or on the black matrix.

5 . The color filter substrate according to claim 3 , wherein the pillow layer is of a two-stage step-like structure.

6 . The color filter substrate according to claim 5 . wherein the plurality of spacers comprise the main spacer and the auxiliary spacer, the main spacer being disposed on the highest stage of the pillow layer, and the auxiliary spacer comprising a first auxiliary spacer disposed on a lowest stage of the pillow layer and a second auxiliary spacer disposed on the black matrix.

7 . The color filter substrate according to claim 4 , wherein the main spacer and the auxiliary spacer have a same height.

8 . The color filter substrate according to claim 3 , wherein a sum of a thickness of the highest stage of the pillow layer and a thickness of the black matrix is 1.05 μm˜3.15 μm.

9 . A manufacturing method of a color filter substrate according to claim 1 , comprising a step of forming the pillow layer.

10 . The manufacturing method of the color filter substrate according to claim 9 , wherein the forming the pillow layer comprises:
A 1 : coating a photosensitive black resin layer on the first base substrate; A 2 : forming the black matrix and the pillow layer by a photolithography process.

11 . The manufacturing method of the color filter substrate according to claim 10 , wherein the step A 2 comprises:
A 201 : exposing the photosensitive black resin layer by a dual-tone mask, to form a black resin completely-retained region corresponding to the pillow layer, a black resin partly-retained region corresponding to the black matrix and a black resin completely-removed region corresponding to a region except the above-described regions;
A 202 : performing developing process, completely retaining the black resin layer in the black resin completely-retained region, completely removing the black resin layer in the black resin completely-removed region, and removing a partial thickness of the black resin layer in the black resin partly-retained region.

12 . The manufacturing method of the color filter substrate according to claim 9 , wherein the forming the pillow layer comprises:
S 1 : coating a non-photosensitive black resin layer on the first base substrate; S 2 : forming the black matrix and the pillow layer by a patterning process.

13 . The manufacturing method of the color filter substrate according to claim 12 , wherein the step S 2 comprises:
S 201 : coating a layer of photoresist on the black resin layer;
S 202 : exposing the photoresist by a dual-tone mask, to form a photoresist completely-retained region corresponding to the pillow layer, a photoresist partly-retained region corresponding to the black matrix and a photoresist completely-removed region corresponding to a region except the above-described regions, and performing developing treatment;
S 203 : removing the black resin layer in the photoresist completely-removed region by an etching process;
S 204 : removing the photoresist in the photoresist partly-retained region by an aching process;
S 205 : removing a partial thickness of the black resin layer in the photoresist partly-retained region by an etching process;
S 206 : stripping a remaining photoresist.

14 . The manufacturing method of the color filter substrate according to claim 13 , wherein the pillow layer to be formed is of a two-stage step-like structure, and the method further comprises after the step S 206 :
S 207 : coating a layer of photoresist on the color filter substrate; S 208 : exposing by a mask, to form the photoresist completely-removed region corresponding to a pattern of a lowest stage of the pillow layer and the photoresist completely-retained region corresponding to a region except the above-described region; S 209 : removing a partial thickness of the black resin layer in the photoresist completely-removed region by an etching process, after a developing process; S 210 : stripping a remaining photoresist.

15 . A display panel, comprising:
a color filter substrate, according to claim 1 , and an array substrate, cell-assembled with the color filter substrate, wherein at least part of spacers disposed on the pillow layer is in contact with the array substrate by pressing.

16 . The display panel according to claim 15 , wherein a compression amount of a spacer in contact with the array substrate by pressing is 10%˜20% of an initial height of the spacer.

17 . The display panel according to claim 16 , wherein a compression amount of the spacer in contact with the array substrate by pressing is 15% of the initial height of the spacer.

18 . The display panel according to claim 15 , wherein the plurality of spacer comprises a main spacer and an auxiliary spacer, and a compression amount of the main spacer is 10%˜20% of an initial height of the main spacer.

19 . The display panel according to claim 15 , wherein the array substrate comprises a second base substrate and a plurality of functional film layers formed on the second base substrate; an auxiliary pillow layer is disposed at a position on the second base substrate or the functional film layer corresponding to a region where the spacer is in contact with the array substrate by pressing.

20 . The display panel according to claim 18 , wherein the plurality of functional film layers are a gate metal layer, a gate insulating layer, an active layer, a source-drain metal layer, a passivation layer and a transparent electrode layer, and the auxiliary pillow layer is formed in a same layer with the gate metal layer, the gate insulating layer, the active layer, the source-drain metal layer, the passivation layer or the transparent electrode layer.

21 - 24 . (canceled)

Assignees

• Boe Technology Group Co Ltd
• Hefei Boe Optoelectronics Tech

Inventors

• Guo Lei
• Yoon Yong Jun
• Tu Zhizhong
• Hui Dasheng

Classifications

• G02F2001/13396

  Physics · mapped topic

• G02F1/133514

  Colour filters · CPC title

• G02F1/133516

  Methods for their manufacture, e.g. printing, electro-deposition or photolithography · CPC title

• G02F2001/13398

  Physics · mapped topic

• G02F1/13394 Primary

  spacers regularly patterned on the cell subtrate, e.g. walls, pillars (G02F1/133377 takes precedence) · CPC title