Electrode material for aluminum electrolytic capacitors and method for producing same
US-2024301561-A1 · Sep 12, 2024 · US
High purity aluminum top coat on substrate
US2016002811A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016002811-A1 |
| Application number | US-201414762151-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 3, 2014 |
| Priority date | Mar 14, 2013 |
| Publication date | Jan 7, 2016 |
| Grant date | — |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
To manufacture a chamber component for a processing chamber, an aluminum coating is formed on an article comprising impurities, the aluminum coating being substantially free from impurities.
First claim
Opening claim text (preview).
What is claimed is: 1 . A method of manufacturing a chamber component for a processing chamber comprising: forming an aluminum coating on an article comprising impurities, the aluminum coating being substantially free from impurities. 2 . The method of claim 1 , wherein the aluminum coating has a thickness in a range from about 0.8 mils to about 5 mils. 3 . The method of claim 1 , further comprising anodizing the aluminum coating to form an anodization layer. 4 . The method of claim 3 , wherein the anodization layer has a thickness in a range from about 30% to about 70% of the thickness of the aluminum coating. 5 . The method of claim 3 , wherein a surface roughness of the anodization layer is about 40 micro-inch. 6 . The method of claim 1 , wherein the article comprises an alloy of at least one of aluminum, copper, or magnesium. 7 . The method of claim 1 , wherein forming the aluminum coating comprises performing electroplating. 8 . A chamber component for a processing chamber, comprising: an article that comprises impurities; an aluminum coating on the article, the aluminum coating being substantially free from impurities. 9 . The chamber component of claim 8 , wherein the aluminum coating has a thickness in a range from about 0.8 mils to about 5 mils. 10 . The chamber component of claim 8 , wherein the anodization layer has a thickness in a range from about 0.4 mils to about 4 mils. 11 . The chamber component of claim 8 , wherein a surface roughness of the anodization layer is about 40 micro-inch. 12 . The chamber component of claim 8 , wherein about half of the anodization layer is formed from conversion of the aluminum coating during anodization. 13 . The chamber component of claim 8 , wherein the article comprises an alloy of at least one of aluminum, copper, or magnesium. 14 . The chamber component of claim 8 , wherein the article comprises a ceramic material. 15 . The chamber component of claim 8 , wherein aluminum coating is electroplated on the article.
Assignees
Inventors
Classifications
- C25D11/04Primary
of aluminium or alloys based thereon · CPC title
of metals not provided for in groups C25D3/04 - C25D3/50 · CPC title
After-treatment of electroplated surfaces · CPC title
Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title
Anodisation under pulsed or modulated current or potential · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US2016002811A1 cover?
- To manufacture a chamber component for a processing chamber, an aluminum coating is formed on an article comprising impurities, the aluminum coating being substantially free from impurities.
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification C25D11/04. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Jan 07 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).