Fabric care compositions comprising polyurethane, polyurea and/or polyurethaneurea polymers

US2015307816A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2015307816-A1
Application numberUS-201514698879-A
CountryUS
Kind codeA1
Filing dateApr 29, 2015
Priority dateApr 29, 2014
Publication dateOct 29, 2015
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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The present disclosure relates to compositions and systems comprising fit retention polymers and methods of making and using the same. Methods of using such compositions including contacting a fabric with the fabric care composition are also disclosed.

First claim

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What is claimed is: 1 . A fabric care composition comprising a) from about 0.01% to about 30% based on total fabric care composition weight, of an organosiloxane polymer comprising having Formula I, Formula II or Formula III below: said Formula I comprising a total of from 1 to about 200 Qs and said Formula II comprising from 2 to about 200 Qs, each Q for Formula I and II being independently selected from Formula IV, Formula V and Formula VI below: wherein for each Formula I through VI; (i) each X is independently selected from the group consisting of and combinations thereof; (ii) each L is a linking bivalent alkylene radical, (iii) at least one, R moiety is —OR 2 , and all other R moieties are independently selected from the group consisting of H, C 1 -C 20 alkyl radical, C 1 -C 20 substituted alkyl radical, C 6 -C 20 aryl radical, C 6 -C 20 substituted aryl radical, C 7 -C 20 alkylaryl radical and combinations thereof; (iv) each R 1 is independently selected from the group consisting of, H, a C 1 -C 20 alkyl radical, a C 6 -C 10 aryl radical, a C 1 -C 4 substituted alkyl radical, and a C 6 -C 10 cycloalkyl radical; (v) each R 2 is independently selected from the group consisting of H, a C 1 -C 4 alkyl radical, —C(O)R 6 wherein each R 6 is independently selected from the group consisting of C 1 -C 20 alkyl radical, C 1 -C 20 substituted alkyl radical, C 6 -C 20 aryl radical, C 6 -C 20 substituted aryl radical, and C 7 -C 20 alkylaryl radical; (vi) each R 3 is independently selected from the group consisting of an aromatic radical comprising from 6 to 30 carbon atoms, an aliphatic radical comprising from 2 to 30 carbon atoms, and a cycloaliphatic radical comprising from 6 to 30 carbon atoms; (vii) each R 4 is independently selected from the group consisting of H, a C 1 -C 20 alkyl radical, a C 6 -C 10 aryl radical, a C 1 -C 4 substituted alkyl radical, and a C 6 -C 10 cycloalkyl radical; (viii) each R 5 is independently selected from the group consisting of H, a C 1 -C 4 alkyl radical, a C 1 -C 4 substituted alkyl radical, a C 6 -C 10 aryl radical, and a C 6 -C 10 substituted aryl radical; (ix) each W is independently selected from the group consisting of a C 1 -C 200 alkylene radical that optionally comprises at least one hetero atom that interrupts said C 1 -C 200 chain, or a substituted C 1 -C 200 alkylene radical that optionally comprises at least one hetero atom that interrupts said C 1 -C 200 chain and/or optionally at least one hetero atom that interrupts said substituent; (x) p is an integer of from about 2 to about 2000; (xi) s is an integer of from about 2 to about 83; (xii) y is an integer of from about 1 to about 50; (xiii) n is an integer of from about 0 to about 50; (xiv) k is an integer selected from 0 to about 100; and f. optionally, a material having the formula Si(R 7 ) m (OR 8 ) j wherein the index j is 1 to 4 and the index m=4−j and each R 7 is independently selected from the group consisting of C 1 -C 20 alkyl radical, C 1 -C 20 substituted alkyl radical, C 6 -C 20 aryl radical, C 6 -C 20 substituted aryl radical, and C 7 -C 20 alkylaryl radical, and each R 8 is independently selected from the group consisting of H, C 1 -C 20 alkyl radical, C 1 -C 20 substituted alkyl radical, C 6 -C 20 aryl radical, C 6 -C 20 substituted aryl radical, C 7 -C 20 alkylaryl radical, and —C(O)R 9 , wherein each R 9 is independently selected from the group consisting of C 1 -C 20 alkyl radical, C 1 -C 20 substituted alkyl radical, C 6 -C 20 aryl radical, C 6 -C 20 substituted aryl radical, and C 7 -C 20 alkylaryl radical; g. optionally a solvent system h. optionally a carrier; and i. optionally, based on total fabric care composition weight, from about 0.1% to about 95%, of a surfactant. 2 . A fabric care composition according to claim 1 wherein said organosiloxane polymer comprises, based on total organosiloxane polymer weight, from about 5% to about 100%, of said repeat units having Formula (I). 3 . A fabric care composition according to claim 1 wherein 1 to 20 R moieties of Formula I are —OR 2 . 4 . A fabric care composition according to claim 1 wherein the solvent system is selected from the group consisting of a solvent having a C log P from about −0.180 to about 3.764. 5 . A fabric care composition according to claim 3 wherein said solvent is selected from the group consisting of ethanol, acetic acid, 1-propanol, 1-butanol, 2-propanol, acetonitrile, t-butyl alcohol, dimethylformamide, acetone, 1,2-dichloroethane, methylene chloride, chloroform, ethylacetate, tetrahydrofuran, dioxane, methyl t-butyl ether, diethyl ether, benzene, toluene, butyl cellosolve, butyl carbitol, hexylene glycol, water, glycerine, polyglycerine, ethylene glycol, diethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, butylene glycol, mono, di and triethanolamine, methyldiethanolamine, diethylene glycol monomethyl ether, mono and diacetin, methanol and mixtures thereof. 6 . A fabric care composition according to claim 1 wherein said carrier is selected from the group consisting of polymers, waxes, salts and mixtures thereof, preferably said polymer is selected from a polysaccharide, a polyethylene glycol and mixtures thereof and, said salt is selected from a detergent builder. 7 . A fabric care composition according to claim 1 wherein surfactant is selected from: a) an anionic surfactant; b) a cationic surfactant; c) an amphoteric surfactant; d) a nonionic surfactant; and e) mixtures thereof. 8 . A fabric care composition according to claim 1 wherein said material having the formula Si(R 7 ) m O(R 8 ) j is selected from a monoalkoxysilane, a monoacetoxysilane, a dialkoxysilane, a diacetoxysilane, a trialkoxysilane, a triacetoxysilane, a tetraalkoxysilane, a tetraacetoxysilane and mixtures thereof. 9 . A fabric care composition according to claim 7 wherein: a) said monoalkoxysilane is selected from the group consisting of Methoxytrimethylsilane, Ethoxytrimethylsilane, (3-Aminopropyl) ethoxydimethylsilane, (3-Aminopropyl)methoxydimethylsilane, 2-(Trimethylsiloxy)-1-aminoethane, and mixtures thereof; b) said monoacetoxysilane is acetoxytrimethylsilane; c) said dialkoxysilane is selected from the group consisting of Dimethoxydimethylsilane, 2-Aminoethyl-3-aminopropylmethyldimethoxysilane, Dimethyldiethoxysilane, (3-Aminopropyl)methyldiethoxysilane, 3-Aminopropylmethyldimethoxysilane and mixtures thereof; d) said diacetoxysilane is Diacetoxydimethylsilane; e) said trialkoxysilane is selected from the group consisting of (3-Aminopropyl)triethoxylsilane, (3-Aminopropyl)trimethoxysilane, 3-(N-Aminoethyl)aminopropyltrimethoxysilane, Methyltrimethoxysilane, Methyltriethoxysilane, (Aminomethyl)trimethoxysilane and (Diethylamino)methyltriethoxysilane, and mixtures thereof; f) said triacetoxysilane is selected from the group consisting of Triacetoxymethylsilane, Triacetoxyethylsilane and mixtures thereof; and g) said tetraalkoxysilane is selected from the group consisting of tetramethoxysilane, tetraethoxysilane, and mixtures thereof. 10 . A fabric care composition according to claim 1 , said fabric care composition, based on total fabric care composition weight, comprising less than 2% of a material that comprises an aldehyde and/or ketone group.

Assignees

Inventors

Classifications

  • Chemistry & Metallurgy · mapped topic

  • containing nitrogen · CPC title

  • C11D3/3742Primary

    Nitrogen containing silicones · CPC title

  • Processes in which the treating agent is dispersed in a gas, e.g. aerosols (aerosol compositions C09K3/30) · CPC title

  • with at least one carbon-silicon bond · CPC title

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What does patent US2015307816A1 cover?
The present disclosure relates to compositions and systems comprising fit retention polymers and methods of making and using the same. Methods of using such compositions including contacting a fabric with the fabric care composition are also disclosed.
Who is the assignee on this patent?
Procter & Gamble
What technology area does this patent fall under?
Primary CPC classification C11D3/3742. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Oct 29 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).