Method of manufacturing EUV photo masks
US-12085843-B2 · Sep 10, 2024 · US
Pellicle for euv, and an assembly including the pellicle, and a method for assembling the same
US2015205193A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2015205193-A1 |
| Application number | US-201514598616-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jan 16, 2015 |
| Priority date | Jan 20, 2014 |
| Publication date | Jul 23, 2015 |
| Grant date | — |
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Abstract
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Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the shadow contrast, in terms of a contrast ratio, of the mesh structure; the angle of the rotation is 30 degrees or smaller, and the resultant contrast ratio should be 25% or lower.
First claim
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What is claimed is: 1 . A pellicle for EUV which comprises: (i) a pellicle membrane structure having a pellicle membrane and a mesh structure, the latter reinforcing the former, and (ii) a pellicle frame for holding the pellicle membrane structure, the mesh structure being disposed to be projected in two kinds of image shadow on a wafer on account of EUV light's passing the EUV pellicle twice as it approaches and reflects on a pattern-carrying face of a mask; wherein a stand-off…
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- What does patent US2015205193A1 cover?
- Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the s…
- Who is the assignee on this patent?
- Shinetsu Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification G03F1/24. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Thu Jul 23 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).