Integrated Lamellae Extraction Station

US2015114193A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2015114193-A1
Application numberUS-201314066782-A
CountryUS
Kind codeA1
Filing dateOct 30, 2013
Priority dateOct 30, 2013
Publication dateApr 30, 2015
Grant date

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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An integrated station for extracting specimens suitable for viewing by a transmission electron microscope from a patterned semiconductor wafer, including a wafer cassette holder; a wafer transfer device; a nanomachining device, including a scanning electron microscope and a focused ion beam, a vacuum load lock and an operator control device, and wherein the operator control device notes locations of created lamellae; a plucker device; a control computer, adapted to control the wafer transfer device and the plucker device, commanding the plucker device to remover lamellae at the locations noted by the operator control device; and a user monitor and data input device, communicatively coupled to the computer. The wafer transfer device can transfer wafers from the wafer cassette holder to the vacuum load lock; from the vacuum load lock to the plucker device and from the plucker device to the wafer cassette holder.

First claim

Opening claim text (preview).

We claim as follows: 1 . A method of creating and removing a lamella from a semiconductor wafer, comprising: a. providing an integrated lamellae extraction station, including: i. one or more wafer cassette holder, bearing a semiconductor wafer; ii. a wafer transfer device; iii. a nanomachining device, including a focused ion beam, and a nanomachining chamber, maintained in a vacuum state during nanomachining device use and a vacuum load lock for accessing said chamber; iv…

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What does patent US2015114193A1 cover?
An integrated station for extracting specimens suitable for viewing by a transmission electron microscope from a patterned semiconductor wafer, including a wafer cassette holder; a wafer transfer device; a nanomachining device, including a scanning electron microscope and a focused ion beam, a vacuum load lock and an operator control device, and wherein the operator control device notes locatio…
Who is the assignee on this patent?
Fei Co
What technology area does this patent fall under?
Primary CPC classification B26D7/18. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Apr 30 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).