Novel crystalline arylalkylamine compound and process for producing the same
US-2017267633-A1 · Sep 21, 2017 · US
Amide compound or salt thereof, biofilm inhibitor, biofilm remover and disinfectant containing the same
US2015018564A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2015018564-A1 |
| Application number | US-201414264471-A |
| Country | US |
| Kind code | A1 |
| Filing date | Apr 29, 2014 |
| Priority date | Nov 7, 2006 |
| Publication date | Jan 15, 2015 |
| Grant date | — |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
The present invention provides a new amide compound and salt thereof that is capable of inhibiting biofilm formation or removing deposited biofilms. The present invention also provides a biofilm formation inhibitor or a biofilm remover containing the amide compound or salt thereof as an active ingredient. An amide compound or salt thereof according to the present invention is denoted by General Formula (1): wherein R 1 is a hydrogen atom or a hydroxyl group, R 2 is a C 5-12 alkyl group, and Q is a substituent denoted by Formula (Q1) or (Q2), wherein n and m are 0 or 1.
First claim
Opening claim text (preview).
1 - 14 . (canceled) 15 . An amide compound denoted by General Formula (1) or salt thereof: wherein R 1 is a hydrogen atom or a hydroxyl group, R 2 is a C 5-12 alkyl group, and Q is a substituent denoted by Formula (Q1) or (Q2), wherein n and m…
Assignees
Inventors
Classifications
Human Necessities · mapped topic
Human Necessities · mapped topic
Human Necessities · mapped topic
- C07D207/50Primary
Chemistry & Metallurgy · mapped topic
Human Necessities · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US2015018564A1 cover?
- The present invention provides a new amide compound and salt thereof that is capable of inhibiting biofilm formation or removing deposited biofilms. The present invention also provides a biofilm formation inhibitor or a biofilm remover containing the amide compound or salt thereof as an active ingredient. An amide compound or salt thereof according to the present invention is denoted by G…
- Who is the assignee on this patent?
- Univ Tokyo, Otsuka Chemical Co Ltd, Univ Tokyo
- What technology area does this patent fall under?
- Primary CPC classification C07D207/50. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Jan 15 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).