Method of manufacturing fluorine-containing compound

US12577199B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12577199-B2
Application numberUS-202217698102-A
CountryUS
Kind codeB2
Filing dateMar 18, 2022
Priority dateSep 20, 2019
Publication dateMar 17, 2026
Grant dateMar 17, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The present invention is directed to providing a method of manufacturing a fluorine-containing compound according to which a fluorine-containing compound is manufactured under a relatively moderate reaction condition by use of a readily available compound. A method of manufacturing a fluorine-containing compound includes reacting a compound having a partial structure expressed by a formula (a) below with a Grignard reagent in the presence of a transition metal compound, —CF 2 —CH 2 -L  (a) wherein L is a sulfonate group.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method of manufacturing a fluorine-containing compound, comprising: reacting a compound of Formula (A1) or Formula (A2), with a Grignard reagent of Formula (B), in the presence of a transition metal compound, and obtaining a fluorine-containing compound of a formula G 1 -CF 2 —CH 2 —R if the starting material is of Formula (A1), or obtaining a fluorine-containing compound of a formula R—CH 2 (—CF 2 -G 2 ) n -CF 2 —CH 2 —R if the starting material is of Formula (A2), G 1 -CF 2 —CH 2 -L  Formula (A1) L-CH 2 (—CF 2 -G 2 ) n -CF 2 —CH 2 -L  Formula (A2) R—MgX  Formula (B) wherein G 1 is a monovalent group having a (poly)oxyfluoroalkylene chain, a hydrogen atom, an alkyl group, or a fluoroalkyl group, G 2 is a divalent group having a (poly)oxyfluoroalkylene chain, a single bond, an alkylene group, or a fluoroalkylene group, L is a sulfonate group, and a plurality of L's in the formula (A2) may be identical to or different from each other, R is a hydrocarbon group optionally including a substituent and/or a heteroatom within a carbon chain, X is a halogen atom, and n is 0 or 1. 2 . The method of manufacturing a fluorine-containing compound according to claim 1 , wherein G 1 is a monovalent group having a (poly)oxyfluoroalkylene chain or a perfluoroalkyl group. 3 . The method of manufacturing a fluorine-containing compound according to claim 1 , wherein, n is 1, and G 2 is a divalent group having a (poly)oxyfluoroalkylene chain, a single bond, or a perfluoroalkylene group. 4 . The method of manufacturing a fluorine-containing compound according to claim 1 , wherein the Grignard reagent is of Formula (B1), R 1 —CH 2 —MgX  Formula (B1) wherein R 1 is a hydrogen atom or a hydrocarbon group optionally including a substituent and/or a heteroatom within a carbon chain, and X is a halogen atom. 5 . The method of manufacturing a fluorine-containing compound according to claim 1 , wherein L is a triflate group. 6 . The method of manufacturing a fluorine-containing compound according to claim 1 , wherein the transition metal compound comprises copper.

Assignees

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Classifications

  • involving an organo-magnesium compound, e.g. Grignard synthesis · CPC title

  • Grignard reactions · CPC title

  • containing halogen · CPC title

  • and bromine · CPC title

  • by increasing the number of carbon atoms, e.g. by oligomerisation · CPC title

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What does patent US12577199B2 cover?
The present invention is directed to providing a method of manufacturing a fluorine-containing compound according to which a fluorine-containing compound is manufactured under a relatively moderate reaction condition by use of a readily available compound. A method of manufacturing a fluorine-containing compound includes reacting a compound having a partial structure expressed by a formula (a) …
Who is the assignee on this patent?
Agc Inc
What technology area does this patent fall under?
Primary CPC classification C07C17/2632. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 17 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).