Modification method of polyurethane, polyurethane, polishing pad, and modification method of polishing pad

US12576474B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12576474-B2
Application numberUS-202418753038-A
CountryUS
Kind codeB2
Filing dateJun 25, 2024
Priority dateMay 11, 2018
Publication dateMar 17, 2026
Grant dateMar 17, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A modification method of a polyurethane, including the steps of: preparing a polyurethane having an ethylenically unsaturated bond; and treating the polyurethane with a liquid containing a compound having a conjugated double bond, or a modification method of a polyurethane, including the steps of: preparing a polyurethane having a conjugated double bond; and treating the polyurethane with a liquid containing a compound having an ethylenically unsaturated bond is used.

First claim

Opening claim text (preview).

The invention claimed is: 1 . A polishing pad comprising, in at least a polishing surface thereof, a polyurethane having an ethylenically unsaturated bond, wherein a compound having a conjugated double bond and a functional group selected from the group consisting of a carboxyl group, a metal salt of a carboxyl group, a hydroxyl group, an amino group, a sulfonic acid group, a phosphoric acid group and an imidazole group is added to the ethylenically unsaturated bond to obtain a Diels Alder ring substituted with the functional group. 2 . The polishing pad according to claim 1 , wherein the polyurethane comprises a polymer constituent unit derived from a compound having an ethylenically unsaturated bond. 3 . The polishing pad according to claim 1 , wherein the polyurethane comprises a polymer constituent unit derived from at least one compound selected from the group consisting of cis-2-butene-1,4-diol, 4,5-bis(hydroxymethyl) imidazole, 5-norbornene-2,3-dimethanol, cis-2-nonene-1-ol, cis-3-nonene-1-ol, cis-3-octene-1-ol, and polybutadiene diol. 4 . The polishing pad according to claim 1 , wherein the functional group is a carboxyl group. 5 . The polishing pad according to claim 4 , wherein the polishing surface has a zeta potential at a pH of 3.0 of −1.0 mV or less. 6 . A polishing pad comprising, in at least a polishing surface thereof, a polyurethane having an ethylenically unsaturated bond, wherein the polyurethane comprises a polymer constituent unit derived from at least one compound selected from the group consisting of cis-2-butene-1,4-diol, 4,5-bis(hydroxymethyl) imidazole, 5-norbornene-2,3-dimethanol, cis-2-nonene-1-ol, cis-3-nonene-1-ol, and cis-3-octene-1-ol.

Assignees

Inventors

Classifications

  • of semiconductor materials · CPC title

  • Chemically modified polymers · CPC title

  • containing carboxylic acid groups · CPC title

  • Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

  • B24B37/24Primary

    characterised by the composition or properties of the pad materials · CPC title

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Frequently asked questions

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What does patent US12576474B2 cover?
A modification method of a polyurethane, including the steps of: preparing a polyurethane having an ethylenically unsaturated bond; and treating the polyurethane with a liquid containing a compound having a conjugated double bond, or a modification method of a polyurethane, including the steps of: preparing a polyurethane having a conjugated double bond; and treating the polyurethane with a liq…
Who is the assignee on this patent?
Kuraray Co
What technology area does this patent fall under?
Primary CPC classification B24B37/24. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 17 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).