Electromagnetic wave reflecting structure and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-12562497-B2
Application number	US-202318356470-A
Country	US
Kind code	B2
Filing date	Jul 21, 2023
Priority date	Jul 24, 2020
Publication date	Feb 24, 2026
Grant date	Feb 24, 2026

Abstract

A method of manufacturing an electromagnetic wave reflecting structure includes the steps of presetting an operating frequency, a reflected wave pointing angle, an incident wave pointing angle, and an incident distance of an electromagnetic wave; obtaining an electromagnetic wave reflecting structure phase distribution of an electromagnetic wave reflecting structure according to the operating frequency, the reflected wave pointing angle, the incident wave pointing angle, and the incident distance; and arranging a plurality of reflecting elements on a substrate according to the electromagnetic wave reflecting structure phase distribution and a reflecting element phase curve of any one of the reflecting elements at the operating frequency.

First claim

What is claimed is:

1 . A reflecting element, comprising:
two first metal sheets, each first metal sheet having a horseshoe shape, the first metal sheets being arranged facing each other to form a rectangle, a first spacing P being defined between the first metal sheets; and two second metal sheets, each second metal sheet being configured in a substantially rectangular shape, the second metal sheets being arranged side by side between the first metal sheets, a second spacing S being defined between proximal side edges of the second metal sheets, the spacing S being unchanged along an entire length L of the second metal sheets.

2 . The reflecting element as claimed in claim 1 , wherein each first metal sheet includes an extension section and two turning sections, the turning sections are connected to two ends of the extension section respectively and extend in a direction perpendicular to the extension section, a length of the extension section of any one of the first metal sheets is substantially equal to the length of each second metal sheet plus six times a width of any one of the turning sections, a length of each turning section is substantially equal to one half of the length of the extension section minus the first spacing, and a width of each second metal sheet is substantially equal to one half of the length of each second metal sheet minus the second spacing.

3 . An electromagnetic wave reflecting structure, adapted for guiding a plurality of electromagnetic waves emitted from a plurality of electromagnetic wave sources to be reflected at a plurality of reflected wave pointing angles, the electromagnetic waves having an operating frequency and each being incident at a respective incident wave pointing angle, the electromagnetic wave reflecting structure comprising:
a substrate having a surface on which a reference point is defined; and a plurality of the reflecting elements disposed on the surface, wherein each reflecting element includes two first metal sheets each having a horseshoe shape and two second metal sheets each being configured in a substantially rectangular shape, in which the two first metal sheets are arranged facing each other to form a rectangle, a first spacing P is defined between the two first metal sheets, the two second metal sheets are arranged side by side between the two first metal sheets, a second spacing S is defined between proximal side edges of the second metal sheets, and the spacing S is unchanged along an entire length L of the second metal sheets; wherein a synthetic reflection phase shift of the i-th reflecting element among the reflecting elements is related to different incident distances of the plurality of electromagnetic wave sources and a phasor superposition of a plurality of reflected phase shifts of the i-th reflecting element corresponding to the plurality of reflected wave pointing angles, wherein each reflection phase shift of the i-th reflecting element is related to a coordinate location of the i-th reflecting element with respect to the reference point, a wave number at the operating frequency, a respective one of the reflected wave pointing angles, and the incident distance of a corresponding one of the plurality of electromagnetic wave sources to the i-th reflecting element; wherein a size of the i-th reflecting element among the reflecting elements is related to the synthetic reflection phase shift of the i-th reflecting element on the substrate and a reflection phase of any one of the reflecting elements at the operating frequency.

4 . The electromagnetic wave reflecting structure as claimed in claim 3 , wherein each reflection phase shift of the i-th reflecting element on the substrate and the incident distance of each electromagnetic wave source to the i-th reflecting element are obtained by the following formulas:
Φ R ( x i ,y i )= k[d i −( x i cosΦ B +y i sinΦ B )sinθ B ]±2 Nπ   (1)
d i =[( x F −x i ) 2 +( y F −y i ) 2 +z F 2 ] 0.5   (2)
wherein (x i , y i ) is the coordinate location of the i-th reflecting element relative to the reference point, Φ R (x i , y i ) is each reflection phase shift of the i-th reflecting element, k is the wave number at the operating frequency, (θ B , Φ B ) is a respective of the reflected wave pointing angles, d i is the incident distance of a respective one of the electromagnetic wave sources to the i-th reflecting element, (x F , y F , z F ) is the spatial coordinate location of a respective one of the electromagnetic wave sources relative to the reference point, and N is a natural number.

5 . The electromagnetic wave reflecting structure as claimed in claim 3 , wherein a length of at least one of the second metal sheets of the i-th reflecting element is related to the synthetic reflection phase shift of the i-th reflecting element on the substrate and a reflection phase of any one of the reflecting elements at the operating frequency.

6 . The electromagnetic wave reflecting structure as claimed in claim 5 , wherein each first metal sheet includes an extension section and two turning sections, the turning sections are connected to two ends of the extension section respectively and extend in a direction perpendicular to the extension section, a length of the extension section of any one of the first metal sheets is substantially equal to the length of each second metal sheet plus six times a width of any one of the turning sections, a length of each turning section is substantially equal to one half of the length of the extension section minus the first spacing, and a width of each second metal sheet is substantially equal to one half of the length of each second metal sheet minus the second spacing.

7 . An electromagnetic wave reflecting structure, adapted for guiding an electromagnetic wave emitted from an electromagnetic wave source to be reflected at a plurality of reflected wave pointing angles, the electromagnetic wave having an operating frequency and being incident at an incident wave pointing angle, the electromagnetic wave reflecting structure comprising:
a substrate having a surface on which a reference point is defined; and a plurality of the reflecting elements disposed on the surface, wherein each reflecting element includes two first metal sheets each having a horseshoe shape and two second metal sheets each being configured in a substantially rectangular shape, in which the two first metal sheets are arranged facing each other to form a rectangle, a first spacing P is defined between the two first metal sheets, the two second metal sheets are arranged side by side between the two first metal sheets, a second spacing S is defined between proximal side edges of the second metal sheets, and the spacing S is unchanged along an entire length L of the second metal sheets; wherein a synthetic reflection phase shift of the i-th reflecting element among the reflecting elements is related to a phasor superposition of a plurality of reflected phase shifts of the i-th reflecting element which correspond to the plurality of reflected wave pointing angles respectively, wherein each reflection phase shift of the i-th reflecting element is related to a coordinate location of the i-th reflecting element with respect to the reference point, a wave number at the operating frequency, a respective one of the reflected wave pointing angles, and an incident distance of the electromagnetic wave source to the i-th reflecting element; wherein a size of the i-th reflecting element among the reflecting elements is related to the synthetic reflection phase shift of the i-th reflecting element on the substrate and a reflection phase of any one of the reflecting elements at the operating frequency.

8 . An electromag

Assignees

• Univ Nat Chung Cheng

Inventors

• Chang Sheng-Fuh
• Chang Chia-Chan
• Lin Shih-Cheng
• Chen wei-yang
• Lin Yu-Cheng

Classifications

• H01Q15/147

  provided with means for controlling or monitoring the shape of the reflecting surface (for scanning H01Q3/01; aerials or aerial systems providing multiple beamwidths H01Q25/002) · CPC title

• H01Q15/0086

  said selective devices having materials with a synthesized negative refractive index, e.g. metamaterials or left-handed materials · CPC title

• H01Q15/0013

  said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective · CPC title

• H01Q15/148 Primary

  with means for varying the reflecting properties (H01Q15/147 takes precedence) · CPC title

• H01Q3/46 Primary

  Active lenses or reflecting arrays · CPC title