Member, container, chemical liquid storage body, reactor, distillation column, filter unit, storage tank, pipe line, and chemical liquid manufacturing method

US12559301B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12559301-B2
Application numberUS-202117141335-A
CountryUS
Kind codeB2
Filing dateJan 5, 2021
Priority dateJul 6, 2018
Publication dateFeb 24, 2026
Grant dateFeb 24, 2026

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a member which makes is possible to obtain excellent residue defect inhibition properties and excellent bridge defect inhibition properties of a chemical liquid in a case where the member is brought into contact with the chemical liquid. The present invention also provides a container, a chemical liquid storage body, a reactor, a distillation column, a filter unit, a storage tank, a pipe line, and a chemical liquid manufacturing method. The member according to an embodiment of the present invention is a member that will be brought into contact with a chemical liquid. A surface of the member is constituted with stainless steel containing chromium atoms and iron atoms. In a case where an atomic ratio of the chromium atoms to the iron atoms is measured from the surface of the member to a position 10 nm below the surface in a depth direction, a maximum value of the atomic ratio is found in a region extending 3 nm from the surface of the member in the depth direction. The maximum value is 0.5 to 3.0, and an average surface roughness of the surface of the member is equal to or lower than 10 nm.

First claim

Opening claim text (preview).

What is claimed is: 1 . A chemical liquid storage body comprising: a container; and a chemical liquid stored in the container, wherein at least a part of a liquid contact portion of the container is formed of a member that will be brought into contact with the chemical liquid, wherein a surface of the member is constituted with stainless steel containing chromium atoms and iron atoms, an atomic ratio of the chromium atoms to the iron atoms is measured from the surface of the member to a position 10 nm below the surface along a depth direction, a maximum value of the atomic ratio is found in a region extending 3 nm from the surface in the depth direction, the maximum value is 0.5 to 3.0, an average surface roughness of the surface of the member is equal to or lower than 10 nm the atomic ratio of the chromium atoms to the iron atoms at a position 10 nm deep from the surface of the member is 0.3 to 0.6 and wherein the chemical liquid contains one or more kinds of compounds selected from the group consisting of propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, cyclohexanone, propylene carbonate, γ-butyrolactone, isoamyl acetate, propylene glycol monoethyl ether, ethyl lactate, methyl methoxypropionate, cyclopentanone, diisoamyl ether, dimethyl sulfoxide, N-methylpyrrolidone, ethylene carbonate, cycloheptanone, 2-heptanone, butyl butyrate, isobutyl isobutyrate, undecane, pentyl propionate, isopentyl propionate, ethylcyclohexane, mesitylene, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate. 2 . The chemical liquid storage body according to claim 1 , wherein the average surface roughness is 0.10 to 10 nm. 3 . The chemical liquid storage body according to claim 1 , wherein the atomic ratio of the chromium atoms to the iron atoms within the surface of the member is 1.1 to 2.5. 4 . The chemical liquid storage body according to claim 1 , wherein the surface of the member is subjected to electropolishing. 5 . The chemical liquid storage body according to claim 4 , wherein the surface of the member is subjected to a surface treatment other than the electropolishing before the electropolishing. 6 . The chemical liquid storage body according to claim 4 , wherein the surface of the member is further subjected to an acid treatment after the electropolishing. 7 . The chemical liquid storage body according to claim 1 that is used for at least one kind of purpose selected from the group consisting of manufacturing, storage, transport, and transfer of a chemical liquid for manufacturing semiconductors. 8 . The chemical liquid storage body according to claim 7 , wherein the chemical liquid has a volume resistivity equal to or higher than 500,000,000 Ωm. 9 . The chemical liquid storage body according to claim 1 , wherein the chemical liquid is a mixed solvent containing 20% to 80% by mass of an organic solvent having a Hansen solubility parameter distance of 3 to 20 MPa 0.5 to eicosene with respect to a total mass of the chemical liquid and 20% to 80% by mass of an organic solvent having a Hansen solubility parameter distance not being in a range of 3 to 20 MPa 0.5 to eicosene with respect to a total mass of the chemical liquid. 10 . The chemical liquid storage body according to claim 1 , wherein the chemical liquid has a volume resistivity equal to or higher than 500,000,000 Ωm. 11 . The chemical liquid storage body according to claim 1 , wherein the chemical liquid contains 0.1 to 100,000 mass ppt of a high-boiling-point organic component having a boiling point equal to or higher than 250° C. with respect to a mass of the chemical liquid. 12 . The chemical liquid storage body according to claim 1 , wherein a void portion in the container is filled with an inert gas. 13 . The chemical liquid storage body according to claim 1 , wherein the chemical liquid contains one or more kinds of compounds selected from the group consisting of propylene glycol monomethyl ether acetate, propylene carbonate, γ-butyrolactone, isoamyl acetate, propylene glycol monoethyl ether, propylene glycol monopropyl ether, ethyl lactate, methyl methoxypropionate, diisoamyl ether, dimethyl sulfoxide, N-methylpyrrolidone, ethylene carbonate, butyl butyrate, isobutyl isobutyrate, pentyl propionate, isopentyl propionate, ethyl acetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate.

Assignees

Inventors

Classifications

  • Cleaning during device manufacture · CPC title

  • of iron or steel · CPC title

  • Organic solvents · CPC title

  • Linings or internal coatings (of containers made by folding or erecting blanks made of paper B65D5/56 {; linings for domestic water storage heaters F24H1/183}) · CPC title

  • Metallic material · CPC title

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Frequently asked questions

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What does patent US12559301B2 cover?
The present invention provides a member which makes is possible to obtain excellent residue defect inhibition properties and excellent bridge defect inhibition properties of a chemical liquid in a case where the member is brought into contact with the chemical liquid. The present invention also provides a container, a chemical liquid storage body, a reactor, a distillation column, a filter unit…
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification B65D85/84. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Feb 24 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).