Polymer-mediated particle coarsening within hollow silica shell nanoreactors

Patent metadata

Field	Value
Publication number	US-12558725-B2
Application number	US-202318118031-A
Country	US
Kind code	B2
Filing date	Mar 6, 2023
Priority date	Mar 8, 2022
Publication date	Feb 24, 2026
Grant date	Feb 24, 2026

Abstract

A method of forming a nanoparticle can include admixing an aqueous solution into an oil-phase to thereby form an emulsion of droplets of the aqueous solution in the oil phase, the aqueous solution comprising a nanostructure precursor and a polymer, adding a silane precursor and catalyst to form a silica shell around each of the droplets to nanoreactors; annealing at a first temperature below the decomposition temperature of the polymer to aggregate the nanostructure precursor within the nanoreactor; and annealing at a second temperature above the decomposition temperature of the polymer to convert the aggregated nanostructure precursor to the nanostructure and decompose the polymer.

First claim

What is claimed is:

1 . A method of forming nanostructures, comprising:
admixing an aqueous solution into an oil-phase to thereby form an emulsion of droplets of the aqueous solution in the oil phase, the aqueous solution comprising a nanostructure precursor and a polymer; adding a silane precursor and catalyst to the emulsion under conditions sufficient to form a silica shell around each of the droplets to thereby form nanoreactors, each comprised of a hollow silica shell surrounding a core comprising the aqueous solution; annealing the nanoreactors at a first temperature below the decomposition temperature of the polymer to aggregate the nanostructure precursor within each of the nanoreactors; and annealing the nanoreactors at a second temperature above the decomposition temperature of the polymer to convert the aggregated nanostructure precursor to the nanostructure and decompose the polymer and thereby form the nanostructure within the hollow silica shell.

2 . The method of claim 1 , wherein annealing at the first and/or second temperature is performed in a reductive atmosphere using a flow of H 2 gas.

3 . The method of claim 1 , wherein the oil-phase further comprises one or more surfactants.

4 . The method of claim 3 , wherein the one or more surfactants comprise one or more of n-decane, n-hexanol, pentanol, n-butanol, tert-butyl alcohol, tert-amyl alcohol, sodium dodecylbenzene sulfonate (SDBS), and cetyl trimethyl ammonium bromide (CTAB).

5 . The method of claim 1 , wherein the silane precursor comprises one or more of tetraethyl orthosilicate (TEOS), (3-aminopropyl) trimethoxysilane (APTMS), tetramethyl orthosilicate, aminopropyl) triethoxysilane (APTES), 3-(2-Aminoethylamino)propyldimethoxymethylsilane, n-(6-aminohexyl)aminopropyltrimethoxysilane, 95%, n-methylaminopropyltrimethoxysilane, n-butylaminopropyltrimethoxysilane, n-(2-aminoethyl)-3-aminopropyltriethoxysilane.

6 . The method of claim 1 , wherein the nanostructure precursor comprises a metal salt.

7 . The method of claim 6 , wherein the metal salt is one or more of HAuCl 4 , AgNO 3 , H 2 PtCl 6 , Na 2 PdCl 4 , Fe(NO 3 ) 3 , Co(NO 3 ) 2 , Ni(NO 3 ) 2 , Cu(NO 3 ) 2 , Na 2 PtCl 4 , CdCl 2 , ZnCl 2 , FeCl 3 , and NiCl 2 .

8 . The method of claim 1 , wherein the polymer comprises one or more of polyethylene oxide, polyethylene oxide-b-poly (2vinyl pyridine) (PEO-b-P2VP), polyacrylic acid (PAA), Poly(vinyl alcohol), polyethyleneimine, poly(sodium 4-styrenesulfonate), and Poly(diallyldimethylammonium chloride).

9 . The method of claim 1 , wherein the first temperature is in a range of 70° C. to 400° C.

10 . The method of claim 1 , wherein the second temperature is in a range of 400° C. to 800° C.

11 . The method of claim 1 , further comprising isolating the nanoreactors before annealing.

12 . The method of claim 11 , further comprising washing the isolated nanoreactors before annealing.

13 . The method of claim 1 , wherein the oil-phase comprises a solvent comprising one or more of cyclohexane, n-hexane, n-heptane, n-octane, n-nonane, n-decane, n-undecane, and n-dodecane.

14 . The method of claim 1 , wherein the method results in a yield of single nanostructures within the nanoreactors of at least about 70%.

15 . The method of claim 1 , wherein the resulting nanostructures have an average particle size of at least about 5 nm.

16 . The method of claim 1 , wherein the catalyst is one or more of ammonium hydroxide, potassium hydroxide, and sodium hydroxide.

17 . The method of claim 1 , further comprising etching the hollow silica shell with a base to remove the nanostructure from the hollow silica shell.

Assignees

• Univ Northwestern

Inventors

• Mirkin Chad A
• Dravid Vinayak P
• Jibril Liban

Classifications

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B22F2301/255

  Silver or gold · CPC title

• B22F2304/054

  Particle size between 1 and 100 nm · CPC title

• B22F2201/013

  Hydrogen · CPC title

• B22F2302/256

  Silicium oxide (SiO2) · CPC title