Grit blasting

US12555698B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12555698-B2
Application numberUS-201916979412-A
CountryUS
Kind codeB2
Filing dateMar 12, 2019
Priority dateMar 29, 2018
Publication dateFeb 17, 2026
Grant dateFeb 17, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a process for blast cleaning comprising subjecting a work surface to a blast stream, wherein the work surface is metal that is contaminated with one or more radioactive moiety, wherein the blast stream comprises water and one or more resin particles.

First claim

Opening claim text (preview).

The invention claimed is: 1 . A process for blast cleaning comprising contacting a work surface with a blast stream, wherein the work surface is metal that is contaminated with one or more radioactive moiety, wherein the blast stream comprises water and one or more resin particles, wherein the resin is an ion exchange resin that is crosslinked, wherein the blast stream is propelled at the work surface, and wherein at least a part of the radioactive moieties is removed from the work surface and attached to the particles of ion exchange resin. 2 . The process of claim 1 , wherein the metal is steel. 3 . The process of claim 1 , wherein the radioactive moiety comprises one or more radioisotope of cobalt, nickel, or chromium. 4 . The process of claim 1 , wherein the radioactive moiety comprises 60 Co. 5 . The process of claim 1 , wherein the resin particles comprise styrenic resin. 6 . The process of claim 1 , wherein the resin particles comprise particles of one or more ion exchange resin selected from the group consisting of ion exchange resins having covalently bound sulfonic groups; ion exchange resins having covalently bound carboxylic groups; ion exchange resins having covalently bound secondary amine groups; ion exchange resins having covalently bound tertiary amine groups; ion exchange resins having covalently bound quaternary ammonium groups; and mixtures thereof. 7 . The process of claim 1 , wherein the pH of the blast stream is 4 or lower. 8 . The process of claim 1 , wherein the blast stream has a temperature of 15° C. to 35° C. 9 . The process of claim 1 , wherein the ion exchange resin comprises from 2 to 15% of polymerized units of multifunctional vinyl monomer, by weight based on the weight of the resin. 10 . The process of claim 1 , wherein the ion exchange resin is fully crosslinked. 11 . The process of claim 1 , wherein the blast stream is forced through a nozzle, and the pressure of the blast stream in the inside of the nozzle is 1 megapascal or higher. 12 . The process of claim 1 , wherein the blast stream is propelled by a pump. 13 . The process of claim 1 , wherein the blast stream is combined with a stream of compressed air to form a mixed stream. 14 . The process of claim 13 , wherein the blast stream is a slurry, and wherein ratio of air to slurry is 0.05:1 or higher.

Assignees

Inventors

Classifications

  • by absorption; by adsorption; by ion-exchange · CPC title

  • Decontamination of the surface of objects by ablation · CPC title

  • for polishing surfaces, e.g. {smoothing a surface} by making use of liquid-borne abrasives · CPC title

  • Selection of abrasive materials {or additives} for abrasive blasts (polishing compositions C09G) · CPC title

  • G21F9/30Primary

    Processing (separating different isotopes of the same chemical element B01D59/00) · CPC title

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Frequently asked questions

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What does patent US12555698B2 cover?
Provided is a process for blast cleaning comprising subjecting a work surface to a blast stream, wherein the work surface is metal that is contaminated with one or more radioactive moiety, wherein the blast stream comprises water and one or more resin particles.
Who is the assignee on this patent?
Ddp Specialty Electronic Materials Us Llc, Ddp Specialty Electronic Materis Us Llc
What technology area does this patent fall under?
Primary CPC classification G21F9/30. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 17 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).