Coating agent, resin member, and production method therefor

US12545803B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12545803-B2
Application numberUS-202118036306-A
CountryUS
Kind codeB2
Filing dateNov 12, 2021
Priority dateNov 16, 2020
Publication dateFeb 10, 2026
Grant dateFeb 10, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A coating agent has: a film-forming component containing an organosilicon compound having a radical polymerizable functional group and an alkoxysilyl group; and a film-curing component composed so that a base and a radical can be generated on irradiation with ultraviolet light. The film-curing component includes a nonionic photobase generator having no ionic bond in the molecular structure. The content of the nonionic photobase generator is 0.1 parts by mass or more and 50 parts by mass or less, based on 100 parts by mass of the organosilicon compound.

First claim

Opening claim text (preview).

The invention claimed is: 1 . A coating agent comprising: a film-forming component containing an organosilicon compound having a radical polymerizable functional group and an alkoxysilyl group, and a polymerizable ester having a radical polymerizable functional group, wherein the polymerizable ester excludes the organosilicon compound; and a film-curing component composed so that a base and a radical can be generated on irradiation with ultraviolet light, wherein the film-curing component contains a nonionic photobase generator having no ionic bond in a molecular structure, a content of the nonionic photobase generator is 0.1 parts by mass or more and 50 parts by mass or less, based on 100 parts by mass of the organosilicon compound, and a content of the polymerizable ester is 0.1 times or more and 1000 times or less than a content of the organosilicon compound in terms of mass ratio, the coating agent satisfies at least one of two conditions: condition (α): the organosilicon compound and the polymerizable ester satisfy relationships of formulas (I) and (II), and condition (β): the organosilicon compound and the polymerizable ester satisfy relationships of formulas (III) and (IV): [ Mathematical ⁢ Formula ⁢ 1 ] 32.9 4 ⁢ 6   × ( y ester - γ Si - 1 ⁢ 6 . 7 ) < w Si ⁢ η Si + w ester ⁢ η ester w si + w ester + 3 ⁢ 3 1.2 < 32. 9 ⁢ 4 ⁢ 6 ⁢ ( γ ester - γ Si +   7 .0 ) ( I ) [ Mathematical ⁢ Formula ⁢ 2 ] w Si ⁢ η Si + w ester ⁢ η ester w si + w ester > 200 ( II ) [ Mathematical ⁢ Formula ⁢ 3 ] η > - 4.6003 ⁢ (

Assignees

Inventors

Classifications

  • Block or graft copolymers containing polysiloxane sequences (obtained by polymerising a compound having a carbon-to-carbon double bond on to a polysiloxane C09D151/08, C09D153/00) · CPC title

  • Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond {; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16} · CPC title

  • Block- or graft-copolymers containing polysiloxane sequences · CPC title

  • of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen · CPC title

  • Characterised by the use of polycarbonates; Derivatives of polycarbonates · CPC title

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What does patent US12545803B2 cover?
A coating agent has: a film-forming component containing an organosilicon compound having a radical polymerizable functional group and an alkoxysilyl group; and a film-curing component composed so that a base and a radical can be generated on irradiation with ultraviolet light. The film-curing component includes a nonionic photobase generator having no ionic bond in the molecular structure. The…
Who is the assignee on this patent?
Toyota Jidoshokki Kk, Univ Tokyo Science Found
What technology area does this patent fall under?
Primary CPC classification C09D7/63. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 10 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).