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US-2024342688-A1 · Oct 17, 2024 · US
Selective metamaterial absorber and method for fabricating the same
US12544736B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12544736-B2 |
| Application number | US-202217945597-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 15, 2022 |
| Priority date | Sep 15, 2021 |
| Publication date | Feb 10, 2026 |
| Grant date | Feb 10, 2026 |
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- Title
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Abstract
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A selective metamaterial absorber and method for fabricating the same is disclosed. The method includes deposing a first metal layer on a first surface of a substrate and on a plurality of nanowires extending outward from the first surface of the substrate, the plurality of nanowires forming an array on the first surface, the substrate further including a second surface opposite the first surface. The first metal layer may be deposed using conformally sputtering. The substrate and the plurality of nanowires may be composed of silicon, and the first metal layer may be composed of tungsten. The first metal layer may be composed of a material having a penetration depth for a wavelength range of interest. The first metal layer may be at least three times thicker than the penetration depth.
First claim
Opening claim text (preview).
What is claimed is: 1 . A selective metamaterial absorber, comprising: a substrate comprising a first surface and a second surface opposite the first surface; a plurality of nanowires extending outward from the first surface of the substrate, forming an array on the first surface; and a first metal layer conformally deposed on the first surface and the plurality of nanowires, the first metal layer composed of a material having a penetration depth for a wavelength range of interest, wherein the first metal layer is at least three times thicker than the penetration depth. 2 . The absorber of claim 1 , wherein the substrate and the plurality of nanowires are composed of silicon. 3 . The absorber of claim 1 , wherein the first metal layer is composed of tungsten. 4 . The absorber of claim 1 , further comprising a second metal layer on the second surface of the substrate, wherein the second metal layer is at least 200-nm thick. 5 . The absorber of claim 1 , wherein each nanowire of the plurality of nanowires has a diameter, wherein the array of nanowires has a period, and wherein the diameter is substantially equal to half the period. 6 . The absorber of claim 4 , wherein the second metal layer is composed of aluminum. 7 . The absorber of claim 5 , wherein the diameter of each nanowire of the plurality of nanowires is substantially equal to 275 nm. 8 . The absorber of claim 5 , wherein the period of the array of nanowires is substantially equal to 600 nm.
Assignees
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Classifications
with more than one layer, e.g. laminates, separated sheets · CPC title
Nanotechnology for materials or surface science, e.g. nanocomposites · CPC title
- B01J20/3204Primary
Inorganic carriers, supports or substrates · CPC title
Manufacture or treatment of nanostructures · CPC title
the starting material being of inorganic character · CPC title
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- What does patent US12544736B2 cover?
- A selective metamaterial absorber and method for fabricating the same is disclosed. The method includes deposing a first metal layer on a first surface of a substrate and on a plurality of nanowires extending outward from the first surface of the substrate, the plurality of nanowires forming an array on the first surface, the substrate further including a second surface opposite the first surfa…
- Who is the assignee on this patent?
- Chang Jui Yung, Taylor Sydney, Wang Liping, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification B01J20/3204. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Feb 10 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).