Member for plasma processing apparatus, method for manufacturing same, and plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-12542258-B2
Application number	US-202117908050-A
Country	US
Kind code	B2
Filing date	Mar 5, 2021
Priority date	Mar 5, 2020
Publication date	Feb 3, 2026
Grant date	Feb 3, 2026

Abstract

A member for a plasma processing apparatus includes a base material and a heat transfer layer provided on one surface of the base material, and the heat transfer layer contains at least one of a fluorine-based resin and a fluorine-based elastomer.

First claim

What is claimed is:

1 . A member for a plasma processing apparatus comprising:
a base material; and a heat transfer layer provided on one surface of the base material, wherein the heat transfer layer contains a fluorine-based elastomer, the fluorine-based elastomer is a fluorine-containing three-dimensional crosslinkable compound having a fluorine-containing group and a three-dimensional crosslinked structure, the fluorine-containing group is either one or both of a perfluoroalkylene group and a perfluoropolyether group, and the three-dimensional crosslinked structure is either one of an epoxy structure having an epoxy bond or a urethane structure having a urethane bond.

2 . The member for a plasma processing apparatus according to claim 1 , wherein
a material forming the base material is Si or SiC.

3 . The member for a plasma processing apparatus according to claim 1 , wherein
the heat transfer layer contains a filler.

4 . The member for a plasma processing apparatus according to claim 3 , wherein
the filler is at least one of alumina and boron nitride.

5 . The member for a plasma processing apparatus according to claim 1 , wherein
the fluorine-containing group is the perfluoropolyether group or both of the perfluoroalkylene group and the perfluoropolyether group.

6 . The member for a plasma processing apparatus according to claim 1 , wherein
a thickness of the heat transfer layer is within a range of 20 μm or more and 1 mm or less.

7 . The member for a plasma processing apparatus according to claim 1 , wherein
the member for a plasma processing apparatus is an electrode plate for a plasma processing apparatus having a vent hole through which a gas for plasma generation passes.

8 . The member for a plasma processing apparatus according to claim 7 , wherein
in the electrode plate for a plasma processing apparatus, the base material is a substrate having multiple vent holes, and the heat transfer layer is provided on one surface of the substrate.

9 . The member for a plasma processing apparatus according to claim 8 , wherein
the substrate has a disk shape and a thickness within a range of 1 mm or more and 20 mm or less, in which a diameter of the vent hole is within a range of 0.1 mm or more and 1 mm or less and an aspect ratio of the vent hole is 3 or more.

10 . The member for a plasma processing apparatus according to claim 1 , wherein
the member for a plasma processing apparatus is a focus ring.

11 . The member for a plasma processing apparatus according to claim 10 , wherein
in the focus ring, the base material is an annular base material including a flat part that is annular and a projection formed on an outer peripheral side of one surface of the flat part, and the heat transfer layer is provided on a surface of the flat part opposite to a surface on which the projection is formed.

12 . A method for manufacturing a member for a plasma processing apparatus comprising:
a preparation step of preparing a base material; a coating step of applying a coating composition containing a fluorine-based compound that produces a fluorine-based elastomer to one surface of the base material by heating or irradiation with ultraviolet rays to form a coating layer; and a heat transfer layer forming step of heating the coating layer or irradiating the coating layer with ultraviolet rays to produce a heat transfer layer containing the fluorine-based elastomer, wherein the fluorine-based elastomer is a fluorine-containing three-dimensional crosslinkable compound having a fluorine-containing group and a three-dimensional crosslinked structure, the fluorine-containing group is either one or both of a perfluoroalkylene group and a perfluoropolyether group, and the three-dimensional crosslinked structure is either one of an epoxy structure having an epoxy bond or a urethane structure having a urethane bond.

13 . The method for manufacturing a member for a plasma processing apparatus according to claim 12 , wherein
the base material is a substrate having multiple vent holes, and the coating composition is applied to one surface of the substrate.

14 . The method for manufacturing a member for a plasma processing apparatus according to claim 12 , wherein
the base material is an annular substrate including a flat part that is annular and a projection formed on an outer peripheral side of one surface of the flat part, and the coating composition is applied to a surface of the flat part opposite to a surface on which the projection is formed.

15 . A plasma processing apparatus comprising:
an electrode plate for a plasma processing apparatus having a vent hole through which a gas for plasma generation passes; and a focus ring, wherein the focus ring or each of both of the electrode plate for a plasma processing apparatus and the focus ring includes a heat transfer layer, and the heat transfer layer contains a fluorine-based elastomer, the fluorine-based elastomer is a fluorine-containing three-dimensional crosslinkable compound having a fluorine-containing group and a three-dimensional crosslinked structure, the fluorine-containing group is either one or both of a perfluoroalkylene group and a perfluoropolyether group, and the three-dimensional crosslinked structure is either one of an epoxy structure having an epoxy bond or a urethane structure having a urethane bond.

16 . The member for a plasma processing apparatus according to claim 2 , wherein
the heat transfer layer contains a filler.

17 . The member for a plasma processing apparatus according to claim 2 , wherein
the fluorine-containing group is the perfluoropolyether group or both of the perfluoroalkylene group and the perfluoropolyether group.

18 . The member for a plasma processing apparatus according to claim 2 , wherein
a thickness of the heat transfer layer is within a range of 20 μm or more and 1 mm or less.

19 . The member for a plasma processing apparatus according to claim 2 , wherein
the member for a plasma processing apparatus is an electrode plate for a plasma processing apparatus having a vent hole through which a gas for plasma generation passes.

20 . The member for a plasma processing apparatus according to claim 2 , wherein
the member for a plasma processing apparatus is a focus ring.

Assignees

• Mitsubishi Materials Corp

Inventors

• Ishikawa Fumiaki
• Kurata Yuto
• YASOSHIMA Tsukasa
• Shiono Ichiro
• Katase Takuma

Classifications

• H01J2237/334

  Etching · CPC title

• H01L21/68721

  Electricity · mapped topic

• H01J37/3255 Primary

  Material · CPC title

• H01J37/32541

  Shape · CPC title

• H01J37/3244

  Gas supply means · CPC title