Block copolymer, resin composition, stretch conductor, electronic device, and pressure-sensitive adhesive film

US12534563B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12534563-B2
Application numberUS-202017784097-A
CountryUS
Kind codeB2
Filing dateDec 8, 2020
Priority dateDec 13, 2019
Publication dateJan 27, 2026
Grant dateJan 27, 2026

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A block copolymer consists mainly of structural units each derived from an ethylenically unsaturated monomer and has at least one mercapto group. The block copolymer has an Mn of 5,000-500,000 and has a block structure, which is an A-B-A triblock structure or a star-shaped block structure of [A-B]qX. The q is an integer of 2-6. The polymer block (A) has a glass transition temperature of 20° C. or higher. The polymer block (B) of the triblock structure has a glass transition temperature lower than 20° C., and the [polymer block (B)]qX of the star-shaped block structure has a glass transition temperature lower than 20° C. The X is an initiator residue or/and a coupling-agent residue or is a derivative thereof.

First claim

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What is claimed is: 1 . A block copolymer mainly composed of a structural unit derived from an ethylenically unsaturated monomer, which has at least one mercapto group, a number average molecular weight of 5,000 to 500,000, wherein the block copolymer contains an organic iodine-based living radical polymerization initiator residue and has any structure of the following General Formulae (2) to (4), and the polymerization unit in the General Formulae (2) to (4) is a block structure that is a triblock structure of polymer block (A)-polymer block (B)-polymer block (A) or a star-shaped block structure of [polymer block (A)-polymer block (B)] q X, wherein q represents an integer of 2 or more and 6 or less, the glass transition temperature of the polymer block (A) is 20° C. or higher, the glass transition temperature of the polymer block (B) in the case of the triblock structure and the glass transition temperature of [polymer block (B)] q X in the case of the star-shaped block structure are lower than 20° C., and X represents an initiator residue and/or a coupling agent residue, or its derivatives, where the polymerization unit is a polymer unit mainly composed of a structural unit derived from an ethylenically unsaturated monomer independently for each branch from Y in the case of General Formula (4), Z 1 each independently represents a divalent group selected from the group consisting of an ester group, a ketone group and an amide group, or a direct bond for each branch from Y, Q represents a monovalent molecular terminal group, and the molecular terminal group is a functional group, a hydrocarbon group which may have a functional group, or an iodine group independently for each branch from Y, Y represents a p-valent hydrocarbon group which may have a substituent, p represents an integer of 2 to 6, R 2 , R 5 and R 6 each independently represent a hydrogen atom or a monovalent hydrocarbon group which may have a substituent independently for each branch from Y in the case of General Formula (4), R 3 and R 7 each independently represent a hydrogen atom, a monovalent hydrocarbon group which may have a substituent or —COR 8 independently for each branch from Y in the case of General Formula (4), R 4 represents a monovalent hydrocarbon group which may have a substituent, —COR 8 , a cyano group or a nitro group, R 2 and R 3 , R 3 and R 4 , R 2 and R 4 and R 6 and R 7 each independently may be bonded to each other to form a ring independently for each branch from Y in the case of General Formula (4), R 8 each independently represents a hydrogen atom, a hydroxy group, an alkoxy group, an amino group or a monovalent hydrocarbon group which may have a substituent, R 11 represents a divalent hydrocarbon group, which may have a substituent, R 12 represents a divalent hydrocarbon group selected from the group consisting of an alkylene group, an arylene group and an alkylene oxide group or a direct bond, and the hydrocarbon group may have a heterocycle, and each independently include at least one of a chain hydrocarbon group, an alicyclic hydrocarbon group and an aromatic hydrocarbon group. 2 . The block copolymer according to claim 1 , wherein at least some of the mercapto groups are introduced by a thiol-ene reaction between an alkenyl group of a precursor of the block copolymer and a compound represented by General Formula (1): HS—R 1 —SH  General Formula (1) where R 1 each independently represents a divalent organic group having at least one selected from among an alkylene group, an arylene group, a heterocyclic group and an alkylene oxide group, which may have a substituent. 3 . The block copolymer according to claim 1 , which is obtained by a living radical polymerization method. 4 . The block copolymer according to claim 1 , wherein the polymer block (A) has a mercapto group, and the polymer block (B) does not have a mercapto group. 5 . The block copolymer according to claim 1 , wherein the mercapto group is introduced into at least a part of the molecular terminal. 6 . The block copolymer according to claim 1 , wherein the polymer block (A) contains 50 mass % or more of a structural unit derived from a methacrylic acid ester, and the polymer block (B) contains 70 mass % or more of a structural unit derived from an acrylic acid ester. 7 . The block copolymer according to claim 1 , wherein the polymer block (A) contains 50 mass % or more of a structural unit derived from methyl methacrylate and the polymer block (B) contains 70 mass % or more of a structural unit derived from butyl acrylate. 8 . The block copolymer according to claim 1 , wherein 90 mass % or more of the ethylenically unsaturated monomer is a hydrophobic ethylenically unsaturated monomer. 9 . The block copolymer according to claim 1 , wherein the degree of polydispersity (Mw/Mn) is 2.5 or less. 10 . The block copolymer according to claim 1 , wherein the content of the polymer block (A) with respect to the polymer block (A) and the polymer block (B) of the block copolymer is in a range of 1 to 50 mass %. 11 . The block copolymer according to claim 1 , wherein the molar concentration of the mercapto group contained in 1 g of the block copolymer is in a range of 0.00001 to 1.0 mmol/g. 12 . A resin composition containing the block copolymer according to claim 1 . 13 . The resin composition according to claim 12 , wherein the content of iodine with respect to the block copolymer is in a range of 0.0001 to 10,000 ppm (by mass). 14 . The resin composition according to claim 12 , which contains a cross-linking agent that is able to crosslink with the block copolymer. 15 . The resin composition according to claim 12 , further containing at least one conductive material selected from the group consisting of conductive fine particles and conductive nanowires. 16 . A stretch conductor formed of the resin composition according to claim 15 . 17 . An electronic device having the stretch conductor according to claim 16 . 18 . A pressure-sensitive adhesive film having an adhesive layer formed of the resin composition according to claim 12 .

Assignees

Inventors

Classifications

  • Single bars, rods, wires, or strips · CPC title

  • Pressure-sensitive adhesives [PSA] · CPC title

  • using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent · CPC title

  • Introducing sulfur atoms or sulfur-containing groups · CPC title

  • polymerising acrylic acid, methacrylic acid or derivatives thereof · CPC title

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What does patent US12534563B2 cover?
A block copolymer consists mainly of structural units each derived from an ethylenically unsaturated monomer and has at least one mercapto group. The block copolymer has an Mn of 5,000-500,000 and has a block structure, which is an A-B-A triblock structure or a star-shaped block structure of [A-B]qX. The q is an integer of 2-6. The polymer block (A) has a glass transition temperature of 20° C. …
Who is the assignee on this patent?
Artience Co Ltd, Univ Nanyang Tech
What technology area does this patent fall under?
Primary CPC classification C08F293/005. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 27 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).