Charged particle optics components and their fabrication

Patent metadata

Field	Value
Publication number	US-12525422-B2
Application number	US-202217883495-A
Country	US
Kind code	B2
Filing date	Aug 8, 2022
Priority date	Aug 8, 2022
Publication date	Jan 13, 2026
Grant date	Jan 13, 2026

Abstract

The present invention is directed to an electrode component with at least two electrodes or a multipole component as generally known in the art. Each of the electrodes can be provided with a beam neighboring section or end section forming the free electrodes. This section is the section exposed to high voltages, i.e. more than 10 KV, and is intended to nevertheless work very reliable and precise with respect to the guidance and/or controlling of a beam of a charged particle beam in a microscope or lithographic apparatus. This neighboring section are positioned in the vicinity or close to a charged particle beam or even facing it. This bears the preferred advantage that high voltages can be generated by the electrodes or to the electrode component and they can withstand those high voltages. This assists in a better guidance and/or controlling of the charged beam, such as for compensating aberration etc. The beam neighboring section can have a surface configured to face the beam. This neighboring section or surface are fabricated with absolute dimensional tolerances less than a desired maximum absolute dimensional tolerance wherein the desired maximum absolute dimensional tolerance is based at least on a maximum voltage to be applied to the electrode. With such a precisely fabricated surface, a more precise and/or efficient field can be generated being able to control the charged particle beam more precisely and efficiently.

First claim

The invention claimed is:

1 . A charged particle beam assembly, particularly a charged particle beam microscope, the assembly comprising:
an electrode component ( 302 ) with at least two electrodes ( 302 a,b ), each electrode including silicon, each electrode being provided with a beam neighboring section having an effective thickness of at least 100 μm and a maximum surface roughness of Ra 0.05 μm.

2 . The charged particle beam assembly according to claim 1 , wherein an electrically insulating substrate ( 306 ) is fixed to the electrode component ( 302 ) and has at least one substrate beam facing surface(s) flush with the beam facing surfaces ( 302 c ).

3 . The charged particle beam assembly according to claim 2 , wherein the electrode component ( 302 ) and the substrate ( 306 ) are fixed together by an intermediate layer ( 304 ).

4 . The charged particle beam assembly according to claim 2 , wherein the electrode component ( 302 ) comprises at least two indexing markers ( 408 ) in order to align the electrode component ( 302 ) with any other component, such as the substrate ( 306 ).

5 . Operation of a charged particle beam assembly with a device according to claim 1 , comprising generating a beam voltage of more than 50 KeV.

6 . The charged particle beam assembly of claim 1 , wherein each beam neighboring section has an effective thickness of at least 1,000 μm.

7 . The charged particle beam assembly of claim 1 , wherein each beam neighboring section has an effective thickness of at least 500 μm.

8 . The charged particle beam assembly of claim 1 , wherein the at least two electrodes are configured to be used with a beam having a beam energy of more than 10 KeV.

9 . The charged particle beam assembly of claim 1 , wherein the at least two electrodes are configured to be used with a beam having a beam energy of more than 15 KeV.

10 . The charged particle beam assembly of claim 1 , wherein the at least two electrodes are configured to be used with a beam having a beam energy of more than 20 KeV.

11 . The charged particle beam assembly of claim 1 , wherein the at least two electrodes are configured to be used with a beam having a beam energy of at least 50 KeV.

12 . The charged particle beam assembly of claim 1 , wherein the at least two electrodes are configured to be used with a beam having a beam energy of at least 100 KeV.

13 . The charged particle beam assembly of claim 1 , wherein the at least two electrodes are configured to be used with a beam having a beam energy of at least 200 KeV.

14 . The charged particle beam assembly of claim 1 , wherein at least one electrically insulating substrate ( 306 ) is configured to support each of the at least two electrodes.

15 . The charged particle beam assembly of claim 14 , wherein the at least one electrically insulating substrate ( 306 ) has a thickness of at least 100 μm.

16 . The charged particle beam assembly of claim 14 , wherein the at least one electrically insulating substrate ( 306 ) has a thickness of at least 500 μm.

17 . The charged particle beam assembly of claim 14 , wherein the at least one electrically insulating substrate ( 306 ) has a thickness of at least 1000 μm.

18 . The charged particle beam assembly of claim 1 , the beam neighboring section of each electrode including a beam facing surface having a maximum surface roughness of RA 0.04 μm.

19 . The charged particle beam assembly of claim 1 , the beam neighboring section of each electrode including a beam facing surface having a maximum surface roughness of Ra 0.025 μm.

20 . The charged particle beam assembly of claim 1 , the beam neighboring section of each electrode including a beam facing surface having a maximum surface roughness of Ra 0.005 μm.

Assignees

• Fei Co

Inventors

• Mohammadi-Gheidari Ali
• Henstra Alexander
• Mele Luigi

Classifications

• H01J2237/2802

  Transmission microscopes · CPC title

• H01J2237/1534

  Aberrations · CPC title

• H01J2237/1516

  Multipoles · CPC title

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/1472

  Deflecting along given lines · CPC title