Strain gauge
US-2023358623-A1 · Nov 9, 2023 · US
Strain gauge
US12523461B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12523461-B2 |
| Application number | US-202117995504-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 1, 2021 |
| Priority date | Apr 8, 2020 |
| Publication date | Jan 13, 2026 |
| Grant date | Jan 13, 2026 |
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Abstract
Official abstract text for this publication.
A strain gauge includes a flexible substrate, at least one resistor formed on or above the substrate, and a pair of electrodes formed on or above the substrate, electrodes being electrically coupled to the resistor via lines, respectively. Each of the lines electrically connects an end of the resistor and a given electrode, the end being situated in a width direction of a grid. Each of the lines includes a first metallic layer and a second metallic layer that is formed of a material having a lower resistance than a material of the first metallic layer, the second metallic layer being situated on the first metallic layer.
First claim
Opening claim text (preview).
The invention claimed is: 1 . A strain gauge comprising: a flexible substrate; at least one resistor formed on or above the substrate; and a pair of electrodes formed on or above the substrate, electrodes in the pair being electrically coupled to the resistor via lines, respectively, wherein each of the lines electrically connects an end of the resistor and a given electrode among the pair of electrodes, the end being situated in a width direction of a grid, wherein each of the lines includes a first metallic layer, and a second metallic layer that is formed of a material having a lower resistance than a material of the first metallic layer, the second metallic layer being situated on the first metallic layer, wherein the first metallic layer has a width in a range of greater than or equal to 10 μm and less than or equal to 100 μm, and wherein a strain limit of the strain gauge increases linearly as the width of the first metallic layer decreases within the range. 2 . The strain gauge according to claim 1 , wherein the at least one resistor includes a plurality of resistors that are formed on or above the substrate, and wherein each of the lines serves as a portion that connects given resistors among the plurality of resistors. 3 . The strain gauge according to claim 1 , wherein the first metallic layer is integrally formed of a same material as the resistor. 4 . The strain gauge according to claim 1 , wherein each of the electrodes includes the first metallic layer, and the second metallic layer that is formed of the material having the lower resistance than the material of the first metallic layer, the second metallic layer being situated on the first metallic layer. 5 . The strain gauge according to claim 1 , wherein the second metallic layer is formed of a material that is more stretchable than the material of the first metallic layer. 6 . The strain gauge according to claim 1 , wherein the resistor is formed of a film that includes a mixture of Cr, CrN, and Cr 2 N. 7 . The strain gauge according to claim 6 , wherein a gauge factor is 10 or more. 8 . The strain gauge according to claim 6 , wherein CrN and Cr 2 N included in the resistor are at 20% by weight or less. 9 . The strain gauge according to claim 8 , wherein a percentage of Cr 2 N in the CrN and Cr 2 N is greater than or equal to 80% by weight and less than 90% by weight.
Assignees
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Classifications
- G01B7/18Primary
using change in resistance · CPC title
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Frequently asked questions
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- What does patent US12523461B2 cover?
- A strain gauge includes a flexible substrate, at least one resistor formed on or above the substrate, and a pair of electrodes formed on or above the substrate, electrodes being electrically coupled to the resistor via lines, respectively. Each of the lines electrically connects an end of the resistor and a given electrode, the end being situated in a width direction of a grid. Each of the line…
- Who is the assignee on this patent?
- Minebea Mitsumi Inc
- What technology area does this patent fall under?
- Primary CPC classification G01B7/18. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 13 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).