Length-selective dielectrophoretic manipulation of single-walled carbon nanotubes

US12522503B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12522503-B2
Application numberUS-202418913675-A
CountryUS
Kind codeB2
Filing dateOct 11, 2024
Priority dateApr 15, 2021
Publication dateJan 13, 2026
Grant dateJan 13, 2026

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Abstract

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Systems & methods for sorting single-walled carbon nanotubes (SWNTs) using an iDEP-based sorting device. The device includes an inlet channel with a constriction and the inlet channel splits into multiple different channels after the constriction—the multiple channels includes a center channel and at least one side channel. A sample is introduced into the iDEP sorting device containing a plurality of SWNTs of different lengths suspended in a fluid. An electrical field is applied to the sample between a first electrode in the center channel and a second electrodes at a proximal end of the inlet channel. The applied electrical field causes longer SWNTs to move towards the side channels while the shorter SWNTs move towards the center channel. Accordingly, a first plurality of shorter SWNTs is then collected from the center channel and a second plurality of longer SWNTs is collected from the at least one side channel.

First claim

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What is claimed is: 1 . A method of manufacturing a microfluidic device for sorting particles, the method comprising: generating a chrome photomask; applying the photomask to a silicon master wafer; mixing polydimethylsiloxane (PDMS) elastomer base with a curing agent to form a mixture; pouring the mixture over the master wafer; curing the master wafer to form a PDMS cast; removing the PDMS cast from the master wafer; irreversibly bonding the PDMS cast with a glass slide to form the microfluidic device, the microfluidic device comprising: an inlet channel including a constriction, wherein a cross-sectional area of the inlet channel reduces at the constriction; a center channel; at least one side channel, wherein the inlet channel splits into multiple channels after the constriction, the multiple channels including the center channel and the at least one side channel; wherein the inlet channel diverges from the constriction into the center channel and the at least one side channel; and positioning an electrode in the center channel where an electrical field source is configured to apply an electrical field between the electrode and a proximal end of the inlet channel. 2 . The method of manufacturing of claim 1 , wherein the particles are single-walled carbon nanotubes. 3 . The method of manufacturing of claim 1 , further comprising generating a plurality of reservoirs in the PDMS cast. 4 . The method of manufacturing of claim 3 , wherein a first set of the plurality of reservoirs includes a diameter of about 1.5 mm, and wherein a second set of the plurality of reservoirs includes a diameter of about 3.0 mm. 5 . The method of manufacturing of claim 1 , further comprising treating the PDMS cast with oxygen plasma in a plasma cleaner oven. 6 . The method of manufacturing of claim 1 , wherein applying the photomask to a silicon master wafer includes using SU-8 negative photoresist. 7 . The method of manufacturing of claim 1 , wherein the PDMS elastomer base is mixed with the curing agent at a 10:1 ratio (w/w) to form the mixture. 8 . The method of manufacturing of claim 1 , further comprising degassing the master wafer after pouring the mixture over the master wafer, and wherein the master wafer was degassed for about 30 minutes. 9 . The method of manufacturing of claim 1 , wherein the master wafer was cured for about four hours at about 80° C. to form the PDMS cast. 10 . The method of manufacturing of claim 1 , further comprising cleaning the PDMS cast. 11 . The method of manufacturing of claim 10 , wherein the PDMS cast is cleaned with 2-propanol and distilled water in an ultrasonic bath for about two minutes, dried with nitrogen, and baked on a hot plate for about 30 seconds at 90° C. 12 . The method of manufacturing of claim 1 , further comprising treating the PDMS cast with oxygen plasma in a plasma cleaner oven for about 30 seconds. 13 . The method of manufacturing of claim 1 , wherein the inlet channel is about 100 μm in width. 14 . The method of manufacturing of claim 1 , wherein the at least one side channel is about 20 μm in width. 15 . The method of manufacturing of claim 1 , wherein the inlet channel and the at least one side channel are about 20 μm in height.

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What does patent US12522503B2 cover?
Systems & methods for sorting single-walled carbon nanotubes (SWNTs) using an iDEP-based sorting device. The device includes an inlet channel with a constriction and the inlet channel splits into multiple different channels after the constriction—the multiple channels includes a center channel and at least one side channel. A sample is introduced into the iDEP sorting device containing a plural…
Who is the assignee on this patent?
Univ Arizona State, Schmidt Christoph
What technology area does this patent fall under?
Primary CPC classification C01B32/172. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 13 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).