Photovoltaic devices and method of manufacturing

US12520599B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12520599-B2
Application numberUS-202318507816-A
CountryUS
Kind codeB2
Filing dateNov 13, 2023
Priority dateNov 3, 2014
Publication dateJan 6, 2026
Grant dateJan 6, 2026

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.

First claim

Opening claim text (preview).

What is claimed is: 1 . A photovoltaic device comprising: a transparent conductive oxide (TCO) layer; a back contact; and an absorber layer between the TCO layer and the back contact, wherein: the absorber layer comprises cadmium, selenium, and tellurium in a CdSe x Te 1-x compound, wherein x is less than or equal to 0.30 throughout the absorber layer; the absorber layer has a concentration gradient of Se therein; a concentration of Se proximate to the TCO layer is higher than a concentration of Se proximate to the back contact; a total thickness of the absorber layer is in a range from about 1500 nm to about 4500 nm; a value of x proximate to the TCO layer is in a range of about 0.05 to 0.30; and the value of x is less than 0.01 at a distance from about 800 nm to about 2000 nm away from the TCO layer. 2 . The photovoltaic device of claim 1 , comprising: a buffer layer between the TCO layer and the absorber layer. 3 . The photovoltaic device of claim 2 , wherein a peak concentration of Se is located at an interface between the buffer layer and the absorber layer. 4 . The photovoltaic device of claim 3 , wherein the buffer layer comprises magnesium. 5 . The photovoltaic device of claim 3 , wherein the buffer layer comprises tin oxide. 6 . The photovoltaic device of claim 3 , wherein the buffer layer has a thickness in a range of 20 nm-60 nm. 7 . The photovoltaic device of claim 1 , wherein the absorber layer comprises a dopant. 8 . The photovoltaic device of claim 1 , wherein the back contact comprises one of: ZnTe, CdZnTe, ZnTe:Cu, or a bi-layer including a layer of ZnTe and a layer of CdZnTe. 9 . The photovoltaic device of claim 1 , further comprising a back metal electrode formed on the back contact, wherein the back metal electrode comprises MoN x . 10 . The photovoltaic device of claim 1 , wherein the back contact comprises ZnTe. 11 . A photovoltaic device comprising: a transparent conductive oxide (TCO) layer; a back contact layer; and an absorber layer between the TCO layer and the back contact layer, wherein: the absorber comprises a surface proximate to the TCO layer and a surface proximate to the back contact; the absorber layer is p-type; the absorber layer comprises a CdSe x Te 1-x compound, wherein x is less than or equal to 0.30 throughout the absorber layer; the absorber layer has a concentration gradient of Se therein, wherein Se is present throughout the absorber layer; and a peak concentration of Se, of the concentration gradient of Se, is located within the absorber layer and between the surface proximate to the TCO layer and the surface proximate to the back contact; wherein: a total thickness of the absorber layer is in a range from about 1500 nm to about 4500 nm; a value of x proximate to the TCO layer is in a range of about 0.05 to 0.30; and the value of x is less than 0.01 at a distance from about 800 nm to about 2000 nm away from the TCO layer. 12 . The photovoltaic device of claim 11 , comprising: a buffer layer between the TCO layer and the absorber layer. 13 . The photovoltaic device of claim 12 , wherein the buffer layer comprises tin oxide, and the buffer layer has a thickness in a range of 20 nm-60 nm. 14 . The photovoltaic device of claim 11 , wherein the absorber layer comprises a dopant. 15 . The photovoltaic device of claim 11 , further comprising a back metal electrode formed on the back contact, wherein the back metal electrode comprises MoN x , and wherein the back contact comprises ZnTe. 16 . A method of forming a photovoltaic device comprising the steps of: depositing a transparent conductive oxide (TCO) layer over a substrate; depositing an absorber layer over the TCO layer, wherein the absorber layer comprises cadmium, selenium, and tellurium in a CdSe x Te 1-x compound, wherein x is less than or equal to 0.30 throughout the absorber layer; and wherein: a concentration of Se proximate to the TCO layer is higher than a concentration of Se proximate to the back contact; a total thickness of the absorber layer is in a range from about 1500 nm to about 4500 nm; a value of x proximate to the TCO layer is in a range of about 0.05 to 0.30; and the value of x is less than 0.01 at a distance from about 800 nm to about 2000 nm away from the TCO layer; and depositing a back contact over the absorber layer, whereby the absorber layer is between the TCO layer and the back contact. 17 . The method of claim 16 , further comprising: depositing a buffer layer on the TCO layer prior to the step of depositing the absorber layer, whereby the buffer layer is between the TCO layer and the absorber layer. 18 . The method of claim 16 , wherein the absorber layer comprises a dopant. 19 . The method of claim 16 , wherein the back contact comprises ZnTe. 20 . The method of claim 16 , wherein the buffer layer comprises tin oxide.

Assignees

Inventors

Classifications

  • the devices comprising amorphous semiconductor material · CPC title

  • having at least three elements, e.g. HgCdTe · CPC title

  • made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers · CPC title

  • Arrangements for electrodes of back-contact photovoltaic cells · CPC title

  • comprising only Group II-VI materials, e.g. CdS, ZnS or HgCdTe · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12520599B2 cover?
A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a th…
Who is the assignee on this patent?
First Solar Inc
What technology area does this patent fall under?
Primary CPC classification H10F77/1237. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 06 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).