Substrate treating apparatus

Patent metadata

Field	Value
Publication number	US-12512342-B2
Application number	US-202117182535-A
Country	US
Kind code	B2
Filing date	Feb 23, 2021
Priority date	Feb 26, 2020
Publication date	Dec 30, 2025
Grant date	Dec 30, 2025

Abstract

A substrate treating apparatus includes a treatment housing, a holder, and a liquid supplying unit. The holder is accommodated in the treatment housing. The holder holds a substrate. The liquid supplying unit is accommodated in the treatment housing. The liquid supplying unit supplies a treating liquid to the substrate held by the holder. The substrate treating apparatus further includes two exhaust pipes. The exhaust pipes are each located on a lateral side of the treatment housing. The exhaust pipes each exhaust gas. The substrate treating apparatus includes a switching mechanism. The switching mechanism is located at a level equal to that of the treatment housing. The switching mechanism switches an exhaust path of the treatment housing to one of the two exhaust pipes.

First claim

What is claimed is:

1 . A substrate treating apparatus, comprising:
a first treatment housing; a first holder arranged inside of the first treatment housing and configured to hold a substrate; a first liquid supplying unit arranged inside of the first treatment housing, the first liquid supplying unit including a first nozzle, the first nozzle including a distal end including an outlet and the first liquid supplying unit configured to supply a treating liquid to the substrate held by the first holder from the outlet of the first nozzle; a first exhaust pipe arranged laterally of the first treatment housing and configured to exhaust gas; a second exhaust pipe arranged laterally of the first treatment housing and configured to exhaust gas; a first switching mechanism positioned at a level equal to that of the first treatment housing and configured to switch an exhaust path of the first treatment housing to either the first exhaust pipe or the second exhaust pipe; a transportation space extending in a first horizontal direction and located adjacent to the first treatment housing; a transport mechanism arranged in the transportation space and configured to transport a substrate to the first holder; and a first piping space located adjacent to the first treatment housing and configured to accommodate the first exhaust pipe and the second exhaust pipe, wherein the first treatment housing and the first piping space align in the first direction, and the first exhaust pipe and the second exhaust pipe align in a second horizontal direction orthogonal to the first direction, wherein the first switching mechanism includes:
a first opening and closing portion that is movable between a position to communicate the first treatment housing with the first exhaust pipe and a position to block the first treatment housing from the first exhaust pipe;
a second opening and closing portion that is movable independently of the first opening and closing portion between a position to communicate the first treatment housing with the second exhaust pipe and a position to block the first treatment housing from the second exhaust pipe; and
a switch housing that is connected to the first treatment housing and accommodates the first opening and closing portion and the second opening and closing portion;
the first treatment housing and the switch housing are in contact with each other and are directly connected; and the first exhaust pipe and the second exhaust pipe are located nearby the first treatment housing, wherein the switch housing includes an introducing portion that is connected to the first treatment housing, and extends in the first direction, and a distributing portion that is connected to the introducing portion, extends in the second direction, is connected to both the first exhaust pipe and the second exhaust pipe, and accommodates both the first opening and closing portion and the second opening and closing portion.

2 . The substrate treating apparatus according to claim 1 , wherein
the switch housing is positioned at a level equal to or lower than an upper end of the first holder.

3 . The substrate treating apparatus according to claim 1 , wherein
the switch housing is positioned so as not to overlap the first holder in plan view.

4 . The substrate treating apparatus according to claim 1 , wherein
the first exhaust pipe extends in a vertical direction, and the second exhaust pipe extends in the vertical direction.

5 . The substrate treating apparatus according to claim 1 , wherein
at least part of the switch housing is arranged in the first piping space.

6 . The substrate treating apparatus according to claim 1 , wherein
a separation distance between the introducing portion and the transportation space is smaller than a separation distance between the first holder and the transportation space in plan view.

7 . The substrate treating apparatus according to claim 1 , further comprising:
a gas supply pipe configured to supply gas to the first treatment housing, and a second piping space adjacent to the first treatment housing and configured to accommodate the gas supply pipe, wherein the first piping space, the first treatment housing, and the second piping space align in this order in the first direction.

8 . The substrate treating apparatus according to claim 1 , further comprising:
a second treatment housing located below the first treatment housing; a second holder arranged inside of the second treatment housing and configured to hold a substrate; a second liquid supplying unit arranged inside of the second treatment housing, the second liquid supplying unit including a second nozzle, the second nozzle including a distal end including an outlet and the second liquid supplying unit configured to supply a treating liquid to the substrate held by the second holder from the outlet of the second nozzle; a second switching mechanism positioned at a level equal to that of the second treatment housing and configured to switch an exhaust path of the second treatment housing to either the first exhaust pipe or the second exhaust pipe; and wherein the second switching mechanism includes:
a third opening and closing portion that is movable between a position to communicate the second treatment housing with the first exhaust pipe and a position to block the second treatment housing from the first exhaust pipe;
a fourth opening and closing portion that is movable independently of the third opening and closing portion between a position to communicate the second treatment housing with the second exhaust pipe and a position to block the second treatment housing from the second exhaust pipe; and
a second switch housing that is connected to the second treatment housing and accommodates the third opening and closing portion and the fourth opening and closing portion.

9 . The substrate treating apparatus according to claim 8 , wherein
the second treatment housing is located at a position equal to that of the first treatment housing in plan view, the second switching mechanism is located at a position equal to that of the first switching mechanism in plan view, the first exhaust pipe extends in a vertical direction, the second exhaust pipe extends in the vertical direction, and the first exhaust pipe and the second exhaust pipe are located adjacent to the second treatment housing.

10 . The substrate treating apparatus according to claim 1 , further comprising:
a third treatment housing positioned at a level equal to that of the first treatment housing; a third holder arranged inside of the third treatment housing and configured to hold a substrate; a third liquid supplying unit arranged inside of the third treatment housing, the third liquid supplying unit including a third nozzle, the third nozzle including a distal end including an outlet and the third liquid supplying unit configured to supply a treating liquid to the substrate held by the third holder from the outlet of the third nozzle; a third exhaust pipe arranged laterally of the third treatment housing and configured to exhaust gas; a fourth exhaust pipe arranged laterally of the third treatment housing and configured to exhaust gas; a third switching mechanism positioned at a level equal to that of the third treatment housing and configured to switch an exhaust path of the third treatment housing to either the third exhaust pipe or the fourth exhaust pipe; and wherein the third switching mechanism includes:
a fifth opening and closing portion that is movable between a position to communicate the third treatment housing with the third exhaust pipe and a position to block the third treatment housing

Assignees

• Screen Holdings Co Ltd

Inventors

• Sawashima Jun
• Yamaguchi Takahiro
• Miyagawa Saki
• Kobayashi Kenji

Classifications

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0458

  vertical arrangement · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0448 Primary

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title