Process-scale synthesis of a plasma kallikrein inhibitor

US12503443B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12503443-B2
Application numberUS-202017632585-A
CountryUS
Kind codeB2
Filing dateAug 5, 2020
Priority dateAug 6, 2019
Publication dateDec 23, 2025
Grant dateDec 23, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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Disclosed are methods of preparing Compound I, and salts thereof. The methods of preparing Compound I are suitable for use on process scale.

First claim

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We claim: 1 . A method, comprising the step of: combining compound C, or a salt thereof, and compound F, or a salt thereof, under conditions sufficient to produce compound D, or a salt thereof, wherein: compound C is represented by: compound F is represented by: and compound D is represented by: wherein: the conditions sufficient to produce compound D comprise an amide-coupling reagent, and a base A; the amide-coupling reagent is propylphosphonic anhydride (T3P), N,N′-di (isopropyl) carbodiimide, N,N′-di (cyclohexyl) carbodiimide, 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide, or ethyl 2-cyano-2-(hydroxyimino) acetate; the base A is triethylamine, pyridine, diisopropylethylamine, diisopropylmethylamine, imidazole, pyrimidine, N-methylmorpholine, quinuclidine, or 1,4-diazabicyclo [2.2.2]octane (DABCO); and compound C is used in an amount of at least 1 kg. 2 . The method of claim 1 , wherein the amide-coupling reagent is propylphosphonic anhydride (T3P). 3 . The method of claim 1 , wherein the base A is pyridine. 4 . The method of claim 1 , wherein the conditions sufficient to produce compound D further comprise a solvent A. 5 . The method of claim 4 , wherein the solvent A is a polar aprotic solvent. 6 . The method of claim 5 , wherein the solvent A is dichloromethane, tetrahydrofuran, acetone, acetonitrile, or ethyl acetate. 7 . The method of claim 1 , wherein compound C is present as an acid salt; and the method further comprises the step of combining the acid salt of compound C with an aqueous base B, thereby forming the free base of compound C; wherein the step of combining the acid salt of compound C with the aqueous base B occurs before combining compound C and compound F. 8 . The method of claim 7 , wherein the acid salt of compound C is a hydrochloride salt, a hydrobromide salt, a hydroiodide salt, or an oxalic acid salt. 9 . The method of claim 1 , further comprising (a) combining compound B, or a salt thereof, and to form a reaction mixture A, then (b) combining the reaction mixture A with a reducing agent under conditions sufficient to form compound C, or a salt thereof, wherein: compound B is represented by: 10 . The method of claim 9 , wherein the reducing agent is LiAlH 4 or NaBH 4 . 11 . The method of claim 9 , further comprising contacting compound C with an acid A to form an acid salt of compound C. 12 . The method of claim 11 , wherein the acid A is hydrochloric acid, hydrobromic acid, hydroiodic acid, or oxalic acid; and the acid salt of compound Cis a hydrochloride salt, a hydrobromide salt, a hydroiodide salt, or an oxalic acid salt. 13 . The method of claim 9 , wherein compound B is present as an acid salt; and the method further comprises the step of combining the salt of compound B with an organic base C, thereby forming the free base of compound B; wherein the step of combining the salt of compound B with the organic base C occurs before combining compound B and 14 . The method of claim 9 , further comprising (a) combining compound A and an acid B under conditions sufficient to form compound B, or a salt thereof; wherein: compound A is represented by: 15 . The method of claim 14 , wherein the acid B is hydrochloric acid, hydrobromic acid, or hydroiodic acid. 16 . The method of claim 14 , wherein compound B is formed as an acid salt. 17 . The method of claim 1 , further comprising (e) combining compound D and a deprotecting reagent to form a reaction mixture B, then (d) exposing the reaction mixture B to conditions sufficient to form Compound I as a free base; wherein: Compound I is represented by: 18 . The method of claim 17 , further comprising: i) providing a first freebase mixture of Compound I as a free base in an organic solvent D, thereby forming a freebase mixture; ii) combining the freebase mixture with a reagent solution A comprising an acid D and an organic solvent E under conditions sufficient to form a reaction mixture C comprising a salt of Compound I; and iii) isolating a crystalline salt of Compound I from the reaction mixture C comprising the salt of Compound I. 19 . The method of claim 18 , wherein the crystalline salt is a hydrochloride salt. 20 . The method of claim 18 , wherein the crystalline salt is a bis (hydrochloride) salt. 21 . The method of claim 1 , wherein compound C is used in an amount of at least 5 kg, at least 10 kg, at least 15 kg, at least 20 kg, at least 25 kg, at least 30 kg, at least 35 kg, at least 40 kg, at least 45 kg, at least 50 kg, at least 55 kg, or at least 60 kg. 22 . The method of claim 1 , wherein compound C is used in an amount of at least 50 kg.

Assignees

Inventors

Classifications

  • the rings having only two atoms in common · CPC title

  • 1,2-Diazoles · CPC title

  • containing cyano groups and singly-bound nitrogen atoms, not being further bound to other hetero atoms, bound to the carbon skeleton · CPC title

  • C07C253/30Primary

    by reactions not involving the formation of cyano groups · CPC title

  • C07D231/14Primary

    with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms · CPC title

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What does patent US12503443B2 cover?
Disclosed are methods of preparing Compound I, and salts thereof. The methods of preparing Compound I are suitable for use on process scale.
Who is the assignee on this patent?
Biocryst Pharm Inc
What technology area does this patent fall under?
Primary CPC classification C07C253/30. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 23 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).