Coated glass element

Patent metadata

Field	Value
Publication number	US-12503389-B2
Application number	US-202217704297-A
Country	US
Kind code	B2
Filing date	Mar 25, 2022
Priority date	Mar 25, 2021
Publication date	Dec 23, 2025
Grant date	Dec 23, 2025

Abstract

A coated glass element includes: a glass surface and a coating that coats at least part of the glass surface. The coating has at least one layer. The at least one layer of the coating fulfills the following parameter: [Al + ] 80 /[Al + ] 20 ≥1.8. [Al + ] 20 are counts of [Al + ] ions, measured by a time-of-flight secondary ion mass spectrometry (TOF-SIMS), at 20% of a time a sputter gun beam needs to reach the glass surface and [Al + ] 80 are counts of [Al + ] ions, measured by a TOF-SIMS, at 80% of a time a sputter gun beam needs to reach the glass surface.

First claim

What is claimed is:

1 . A coated glass element, comprising:
a glass surface; and a coating that coats at least part of the glass surface, the coating comprising at least one layer, the at least one layer of the coating fulfills the following parameter:
[Al + ] 80 /[Al + ] 20 ≥1.8;

wherein [Al + ] 20 are counts of [Al + ] ions, measured by a time-of-flight secondary ion mass spectrometry (TOF-SIMS), at 20% of a time a sputter gun beam needs to reach the glass surface; and wherein [Al + ] 80 are counts of [Al + ] ions, measured by a TOF-SIMS, at 80% of the time the sputter gun beam needs to reach the glass surface, wherein the coating is formed from a precursor P1 that comprises at least one the following: hexamethyldisiloxane (HMDSO), hexamethyldisilazane (HMDS), tetramethylsilane (TMS), trimethylborazole (TMB), tri(dimethylaminosilyl)-amino-di(dimethylamino)borane (TDADB), tris(trimethylsilyl)borate (TMSB), hexamethylcyclotrisiloxane (HMCTSO), octamethylcyclotetrasiloxane (OMCTS), decamethylcyclopentasiloxane (DMCPS), dodecamethylcyclohexasiloxane (DMCHS) diacetoxy-di-t-butoxysilane (DADBS), tetraethoxysilane (TEOS), tris(trimethylsilyloxy)vinylsilane (TTMSVS), or vinyltriethoxysilane (VTES).

2 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills at least one of the following parameters:
[Al + ] 80 /[Al + ] 20 ≥x 1 [Al+] , wherein x 1 [Al+] is 2.0; or
[Al + ] 80 /[Al + ] 20 ≤x 2 [Al+] , wherein x 2 [Al+] is 500.

3 . The coated glass element of claim 2 , wherein at least one of the following is satisfied: x1 [Al+] is 20; or
x2 [Al+] is 100.

4 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills at least one of the following parameters:
y 1 [Al+] ≤[Al + ] 80 /[Al + ] 60 ≤y 2 [Al+] ;
y 1 [Al+] ≤[Al + ] 60 /[Al + ] 40 ≤y 2 [Al+] , or
y 1 [Al+] ≤[Al + ] 40 /[Al + ] 20 ≤y 2 [Al+] ;
wherein y1 [Al+] is 1.01; wherein y2 [Al+] is 500; wherein [Al + ] 40 are counts of [Al + ] ions, measured by a TOF-SIMS, at 40% of the time the sputter gun beam needs to reach the glass surface; and wherein [Al + ] 60 are counts of [Al + ] ions, measured by a TOF-SIMS, at 60% of the time the sputter gun beam needs to reach the glass surface.

5 . The coated glass element of claim 4 , wherein the counts of [Al + ] ions continuously increase towards the glass surface throughout the whole at least one layer.

6 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills at least one of the following parameters:
[SiCH 3 + ] 20 /[SiCH 3 + ] 80 ≥x 1 [SiCH3+] , wherein x 1 [SiCH3+] is 1.05; or
[SiCH 3 + ] 20 /[SiCH 3 + ] 80 ≤x 2 [SiCH3+] , wherein x 2 [SiCH3+] is 100; and
wherein [SiCH 3 + ] 20 are counts of [SiCH 3 + ] ions, measured by a TOF-SIMS, at 20% of the time the sputter gun beam needs to reach the glass surface; and wherein [SiCH 3 + ] 80 are counts of [SiCH 3 + ] ions, measured by a TOF-SIMS, at 80% of the time the sputter gun beam needs to reach the glass surface.

7 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills at least one of the following parameters:
y 1 [SiCH3+] ≤[SiCH 3 + ] 20 /[SiCH 3 + ] 40 ≤y 2 [SiCH3+] ;
y 1 [SiCH3+] ≤[SiCH 3 + ] 40 /[SiCH 3 + ] 60 ≤y 2 [SiCH3+] ; or
y 1 [SiCH3+] ≤[SiCH 3 + ] 60 /[SiCH 3 + ] 80 ≤y 2 [SiCH3+] ;
wherein y1 [SiCH3+] is 1.0; wherein y2 [SiCH3+] is 100; and wherein [SiCH 3 + ] 20 are counts of [SiCH 3 + ] ions, measured by a TOF-SIMS, at 20% of the time the sputter gun beam needs to reach the glass surface; wherein [SiCH 3 + ] 40 are counts of [SiCH 3 + ] ions, measured by a TOF-SIMS, at 40% of the time the sputter gun beam needs to reach the glass surface; wherein [SiCH 3 + ] 60 are counts of [SiCH 3 + ] ions, measured by a TOF-SIMS, at 60% of the time the sputter gun beam needs to reach the glass surface; and wherein [SiCH 3 + ] 80 are counts of [SiCH 3 + ] ions, measured by a TOF-SIMS, at 80% of the time the sputter gun beam needs to reach the glass surface.

8 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills at least one of the following parameters:
[Si 3 C 5 H 15 O 3 + ] 20 /[Si 3 C 5 H 15 O 3 + ] 80 ≥x 1 [Si3C5H15O3+] , wherein x 1 [Si3C5H15O3+] is 1.2; or
[Si 3 C 5 H 15 O 3 + ] 20 /[Si 3 C 5 H 15 O 3 + ] 80 ≥x 2 [Si3C5H15O3+] , wherein x 2 [Si3C5H15O3+] is 100; and
wherein [Si 3 C 5 H 15 O 3 + ] 20 are counts of [Si 3 C 5 H 15 O 3 + ] ions, measured by a TOF-SIMS, at 20% of the time the sputter gun beam needs to reach the glass surface; and wherein [Si 3 C 5 H 15 O 3 + ] 80 are counts of [Si 3 C 5 H 15 O 3 + ] ions, measured by a TOF-SIMS, at 80% of the time the sputter gun beam needs to reach the glass surface.

9 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills at least one of the following parameters:
y 1 [Si3C5H15O3+] ≤[Si 3 C 5 H 15 O 3 + ] 20 /[Si 3 C 5 H 15 O 3 + ] 40 ≤y 2 [Si3C5H15O3+] ;
y 1 [Si3C5H15O3+] ≤[Si 3 C 5 H 15 O 3 + ] 40 /[Si 3 C 5 H 15 O 3 + ] 60 ≤y 2 [Si3C5H15O3+] ; or
y 1 [Si3C5H15O3+] ≤[Si 3 C 5 H 15 O 3 + ] 60 /[Si 3 C 5 H 15 O 3 + ] 80 ≤y 2 [Si3C5H15O3+] ;
wherein y1 [Si3C5H15O3+] is 1.0; wherein y2 [Si3C5H15O3+] is 100; and wherein [Si 3 C 5 H 15 O 3 + ] 20 are counts of [Si 3 C 5 H 15 O 3 + ] ions, measured by a TOF-SIMS, at 20% of the time the sputter gun beam needs to reach the glass surface; wherein [Si 3 C 5 H 15 O 3 + ] 40 are counts of [Si 3 C 5 H 15 O 3 + ] ions, measured by a TOF-SIMS, at 40% of the time the sputter gun beam needs to reach the glass surface; wherein [Si 3 C 5 H 15 O 3 + ] 60 are counts of [Si 3 C 5 H 15 O 3 + ] ions, measured by a TOF-SIMS, at 60% of the time the sputter gun beam needs to reach the glass surface; and wherein [Si 3 C 5 H 15 O 3 + ] 80 are counts of [Si 3 C 5 H 15 O 3 + ] ions, measured by a TOF-SIMS, at 80% of the time the sputter gun beam needs to reach the glass surface.

10 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills the following parameter:
[Si 2 C 5 H 15 O 2 − ] 20 /[Si 2 C 5 H 15 O 2 − ] 80 ≥1.0;
wherein [Si 2 C 5 H 15 O 2 − ] 20 are counts of [Si 2 C 5 H 15 O 2 − ] ions, measured by a TOF-SIMS, at 20% of the time the sputter gun beam needs to reach the glass surface; and wherein [Si 2 C 5 H 15 O 2 − ] 80 are counts of [Si 2 C 5 H 15 O 2 − ] 80 ions, measured by a TOF-SIMS, at 80% of the time the sputter gun beam needs to reach the glass surface.

11 . The coated glass element of claim 1 , wherein the at least one layer of the coating fulfills at least one of the following parameters:
[Si 2 C 5 H 15 O 2 − ] 20 /[Si 2 C 5 H 15 O 2 − ] 80 ≥x 1 [Si2C5H15O2−] , wherein x 1 [Si2C5H15O2−] is 1.2; or
[Si 2 C 5 H 15 O 2 − ] 20 /[Si 2 C 5 H 15 O 2 − ] 80 ≤x 2 [Si2C5H15O2−] , wherein x 2 [Si2C5H15O2−] is 100.

12 . The coated glass element of claim 1 , wherein a thickness of the coating is 1 nm to 1 mm.

13 . The coated glass element of claim 1 , wherein at least one of the following parameters is fulfilled:
the coating is a single layer coating; the at least one layer is in direct contact with the glass surface of the glass element; the at least one layer is an outermost layer; or the coated glass element comprises a lumen and the coating faces to the lumen.

14 . The coated glass element of cl

Assignees

• Schott Ag

Inventors

• Woywod Tanja
• Rudigier-Voigt Eveline
• Djordjevic-Reiss Jovana
• Rothhaar Uwe
• Klause Michaela
• Biedenbender Sylvia
• Bauch Hartmut

Classifications

• C03C2218/32

  After-treatment · CPC title

• C03C2218/31

  Pre-treatment · CPC title

• C03C2218/153

  by plasma-enhanced cvd · CPC title

• C03C2217/78

  Coatings specially designed to be durable, e.g. scratch-resistant · CPC title

• C03C2217/252

  Al · CPC title