Resist composition, method of forming resist pattern, and compound

Patent metadata

Field	Value
Publication number	US-12498635-B2
Application number	US-201916686925-A
Country	US
Kind code	B2
Filing date	Nov 18, 2019
Priority date	Dec 5, 2018
Publication date	Dec 16, 2025
Grant date	Dec 16, 2025

Abstract

A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, M m+ represents an m-valent organic cation, R d0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p≤(q×2)+5” is satisfied.

First claim

What is claimed is:

1 . A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition comprising:
a base material component (A) whose solubility in a developing solution is changed due to the action of an acid; and a compound (DO) formed of an anion moiety and a cation moiety, which is represented by Formula (d0), wherein the cation moiety of the compound (DO) has a Log P value of less than 7.7,

wherein M m+ represents an m-valent organic cation represented by Formula (ca-d0), m represents 1, R d0 represents a substituent, p represents an integer of 0 to 3, and in a case where p represents 2 or 3, a plurality of substituents as R d0 may be the same as or different from one another, q represents an integer of 0 to 3, n represents an integer of 2 or greater, where a relationship of “n+p≤(q×2)+5” is satisfied,

wherein R d1 represents an aryl group which may have a substituent; and R d2 and R d3 each independently represent an aryl group which may have a substituent or may be bonded to each other to form a ring with a sulfur atom in Formula (ca-d0); provided that when any of R d1 , R d2 and R d3 has a substituent represented by any of Formula (ca-r-1) to (ca-r-7), R′ 201 in Formula (ca-r-1) to (ca-r-7) is a hydrogen atom, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent,

2 . A method of forming a resist pattern, comprising:
forming a resist film on a support using the resist composition according to claim 1 ; exposing the resist film; and developing the exposed resist film to form a resist pattern.

3 . A compound formed of an anion moiety and a cation moiety, which is represented by Formula (d0),
wherein a Log P value of the cation moiety is less than 7.7,

wherein M m+ represents an m-valent organic cation represented by Formula (ca-d0), m represents 1, R d0 represents a substituent, p represents an integer of 0 to 3, and in a case where p represents 2 or 3, a plurality of substituents as R d0 may be the same as or different from one another, q represents an integer of 0 to 3, n represents an integer of 2 or greater, where a relationship of “n+p≤(q×2)+5” is satisfied,

wherein R d1 represents an aryl group which may have a substituent; and R d2 and R d3 each independently represent an aryl group which may have a substituent or may be bonded to each other to form a ring with a sulfur atom in Formula (ca-d0); provided that when any of R d1 , R d2 and R d3 has a substituent represented by any of Formula (ca-r-1) to (ca-r-7), R′ 201 in Formula (ca-r-1) to (ca-r-7) is a hydrogen atom, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent,

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Nguyen Khanhtin
• Murata Mari
• Arai Masatoshi
• Michibayashi Nobuhiro

Classifications

• C07C321/30

  Sulfides having the sulfur atom of at least one thio group bound to two carbon atoms of six-membered aromatic rings · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title

• G03F7/30

  Imagewise removal using liquid means · CPC title

• C07C65/05

  o-Hydroxy carboxylic acids · CPC title