Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-12498174-B2
Application number	US-202218147524-A
Country	US
Kind code	B2
Filing date	Dec 28, 2022
Priority date	Dec 31, 2021
Publication date	Dec 16, 2025
Grant date	Dec 16, 2025

Abstract

A substrate processing apparatus includes a bake chamber, a chamber door that opens and closes an opening of the bake chamber, a first support plate in the bake chamber, a first partition wall, which partitions a space provided on the first support plate into first heat treatment spaces spaced apart from each other in a first horizontal direction, and extends in a second horizontal direction and a vertical direction, first heat treatment modules arranged in the first heat treatment spaces, a first exhaust duct extending in the first horizontal direction across the first heat treatment spaces, a first sealing bracket coupled to the first exhaust duct, a first horizontal packing configured to seal a gap between the first sealing bracket and the chamber door, and a first vertical packing configured to seal a gap between the first partition wall and the chamber door.

First claim

What is claimed is:

1 . A substrate processing apparatus comprising:
a bake chamber; a chamber door that opens and closes an opening of the bake chamber; a first support plate provided in the bake chamber; a first partition wall, which partitions a space provided on the first support plate into first heat treatment spaces spaced apart from each other in a first horizontal direction, and extends on the first support plate in a second horizontal direction and a vertical direction, wherein the second horizontal direction is perpendicular to the first horizontal direction, and the vertical direction is perpendicular to the first horizontal direction and the second horizontal direction; first heat treatment modules, which are arranged in the first heat treatment spaces and comprise first heating stages on which substrates are mounted, respectively; a first exhaust duct extending in the first horizontal direction across the first heat treatment spaces and through which gas exhausted from the first heat treatment modules is introduced; a first sealing bracket, which is coupled to the first exhaust duct and extends in the first horizontal direction along the first exhaust duct; a first horizontal packing, which extends in the first horizontal direction along the first sealing bracket and is configured to seal a gap between the first sealing bracket and the chamber door; and a first vertical packing, which extends in the vertical direction along an edge of the first partition wall facing the chamber door and is configured to seal a gap between the first partition wall and the chamber door.

2 . The substrate processing apparatus of claim 1 , wherein the chamber door comprises:
a door frame; a first horizontal block, which is provided on an inner surface of the door frame and is in close contact with the first horizontal packing; and a first vertical block, which is provided on the inner surface of the door frame and is in close contact with the first vertical packing.

3 . The substrate processing apparatus of claim 1 , further comprising a second exhaust duct provided on one side of the first exhaust duct,
wherein the second exhaust duct comprises a plurality of communicating holes that communicate between a flow path provided in the second exhaust duct and the first heat treatment spaces.

4 . The substrate processing apparatus of claim 3 , further comprising
a hole opening/closing block provided on the second exhaust duct to open and close the plurality of communicating holes of the second exhaust duct.

5 . The substrate processing apparatus of claim 1 , further comprising:
a second support plate provided below the first support plate; a second partition wall, which partitions a space provided between the first support plate and the second support plate into second heat treatment spaces spaced apart from each other in the first horizontal direction, and extends in the second horizontal direction and the vertical direction; second heat treatment modules, which are arranged in the second heat treatment spaces and comprise second heating stages on which substrates are mounted, respectively; and a second vertical packing, which extends in the vertical direction along an edge of the second partition wall facing the chamber door and is configured to seal a gap between the second partition wall and the chamber door.

6 . The substrate processing apparatus of claim 5 , wherein the chamber door comprises:
a door frame; and a second vertical block, which is provided on an inner surface of the door frame and is in close contact with the second vertical packing.

7 . The substrate processing apparatus of claim 5 , further comprising a first separation plate, which is provided below the first exhaust duct and is configured to block an airflow between the first heat treatment spaces and the second heat treatment spaces.

8 . The substrate processing apparatus of claim 5 , further comprising:
a first supply pipe, which is configured to deliver processing gas to a first chamber in which the first heating stage is accommodated, and extends through an opening of the first support plate and an opening of the second support plate; and a second supply pipe, which is configured to deliver processing gas to a second chamber in which the second heating stage is accommodated, and extends through the opening of the second support plate.

9 . The substrate processing apparatus of claim 8 , further comprising:
a first sealing block, which is coupled to the first support plate to cover the opening of the first support plate, and comprises a pipe passage hole through which the first supply pipe passes; and a second sealing block, which is coupled to the second support plate to cover the opening of the second support plate, and comprises pipe passage holes through which the first supply pipe and the second supply pipe pass.

10 . The substrate processing apparatus of claim 8 , further comprising a pipe separation membrane, which extends in the vertical direction between the first support plate and the second support plate, and is arranged between the first supply pipe and the second supply pipe.

11 . The substrate processing apparatus of claim 5 , wherein each of the first heat treatment modules further comprises a first cooling stage on which a substrate is mounted, and
each of the second heat treatment modules further comprises a second cooling stage on which a substrate is mounted.

12 . A substrate processing apparatus comprising:
a bake chamber; a chamber door that opens and closes an opening of the bake chamber; a first support plate provided in the bake chamber; a heating unit, which is arranged in a first heat treatment space provided on the first support plate and comprises a first heating stage configured to heat a substrate and a first heating chamber accommodating the first heating stage; a first exhaust duct, which is connected to a first exhaust pipe connected to an upper side of the first heating chamber and discharges gas introduced through the first exhaust pipe to the outside; a second exhaust duct, which is provided on one side of the first exhaust duct and comprises a plurality of communicating holes that communicate between the first heat treatment space and an inner flow path provided in the second exhaust duct; a connection pipe, which extends between the second exhaust duct and the first heating chamber to communicate between the inner flow path of the second exhaust duct and a space in the first heating chamber; a sealing bracket, which is coupled to one side of the first exhaust duct facing the chamber door and extends in a direction in which the first exhaust duct extends; and a horizontal packing, which extends along the sealing bracket and is configured to seal a gap between the sealing bracket and the chamber door.

13 . The substrate processing apparatus of claim 12 , further comprising a first partition wall erected in the vertical direction on the first support plate to partition the first heat treatment space into a plurality of spaces,
wherein the first partition wall is connected to the first exhaust duct and the second exhaust duct, and a first vertical packing configured to seal a gap between the chamber door and the first partition wall is coupled to an edge of the first partition wall facing the chamber door.

14 . The substrate processing apparatus of claim 12 , further comprising a hole opening/closing block provided on the second exhaust duct to open and close the plurality of communicating holes of the second exhaust duct.

15 . The substrate

Assignees

• Semes Co Ltd

Inventors

• Cho Juyeon
• Lee Youngjun
• Kim Kwangsoo
• Eum Kisang
• Lee Wooram
• Kang Jongwha
• Jung Younghun
• Lee Junghyun
• Park Dongwoon
• Jung Sunwook

Classifications

• H10P72/0432 Primary

  mainly by conduction · CPC title

• H10P72/0462 Primary

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0458

  vertical arrangement · CPC title

• H10P72/0441

  Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title