Copolymer comprising units of type a deriving from carboxylic acid monomers and units of type b deriving from sulfonic acid monomers
US-2016340617-A1 · Nov 24, 2016 · US
Carboxylic acid-modified nitrile-based copolymer latex composition, latex composition for dip molding including the same, and molded article therefrom
US12497501B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12497501-B2 |
| Application number | US-201916976279-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 1, 2019 |
| Priority date | Dec 19, 2018 |
| Publication date | Dec 16, 2025 |
| Grant date | Dec 16, 2025 |
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Abstract
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Provided is a carboxylic acid-modified nitrile-based copolymer latex composition, and more particularly, a carboxylic acid-modified nitrile-based copolymer latex composition including a carboxylic acid-modified nitrile-based copolymer. The carboxylic acid-modified nitrile-based copolymer includes a carboxyalkyl (meth)acrylate monomer-derived repeating unit and a repeating unit derived from an ethylenic unsaturated sulfonic acid monomer including a sulfonate salt or a sulfonate ester. A latex composition for dip molding including the same, and a molded article therefrom are also provided.
First claim
Opening claim text (preview).
The invention claimed is: 1 . A carboxylic acid-modified nitrile-based copolymer latex composition comprising a carboxylic acid-modified nitrile-based copolymer, wherein the carboxylic acid-modified nitrile-based copolymer comprises: 60 wt % to 62 wt % of a conjugated diene-based monomer-derived repeating unit, wherein the conjugated diene-based monomer derived repeating unit is butadiene; 27 wt % to 30 wt % of an ethylenic unsaturated nitrile-based monomer-derived repeating unit, wherein the ethylenic unsaturated nitrile-based monomer-derived repeating unit is acrylonitrile; 2 wt % to 4 wt % of an ethylenic unsaturated acid monomer-derived repeating unit, wherein the ethylenic unsaturated acid monomer-derived repeating unit is methacrylic acid; 2 wt % to 4 wt % of a carboxyalkyl (meth)acrylate monomer-derived repeating unit, wherein the carboxyalkyl (meth)acrylate monomer-derived repeating unit is β-carboxyethyl acrylate; and 2 wt % to 5 wt % of an ethylenic unsaturated sulfonic acid monomer-derived repeating unit, wherein the ethylenic unsaturated sulfonic acid monomer-derived repeating unit is sodium 1-allyloxy-2-hydroxypropyl sulfonate; based on the total content of the carboxylic acid-modified nitrile-based copolymer; and wherein the ethylenic unsaturated sulfonic acid monomer-derived repeating unit and the carboxyalkyl (meth)acrylate monomer-derived repeating unit are included in a weight ratio of 1:1 to 3. 2 . A latex composition for dip molding, the composition comprising: the carboxylic acid-modified nitrile-based copolymer according to claim 1 ; and a crosslinker composition. 3 . The latex composition of claim 2 , wherein the crosslinker composition includes zinc oxide, a vulcanizer, and a vulcanizing accelerator. 4 . A molded article comprising a layer derived from the latex composition for dip molding of claim 2 .
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Classifications
of zinc · CPC title
Crosslinking or vulcanising agents; including accelerators · CPC title
of metals · CPC title
Sulfur · CPC title
by a bond to sulfur · CPC title
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- What does patent US12497501B2 cover?
- Provided is a carboxylic acid-modified nitrile-based copolymer latex composition, and more particularly, a carboxylic acid-modified nitrile-based copolymer latex composition including a carboxylic acid-modified nitrile-based copolymer. The carboxylic acid-modified nitrile-based copolymer includes a carboxyalkyl (meth)acrylate monomer-derived repeating unit and a repeating unit derived from an e…
- Who is the assignee on this patent?
- Lg Chemical Ltd
- What technology area does this patent fall under?
- Primary CPC classification B29C41/14. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Dec 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).