Refractory organic pollutants with photo- excited holes as electron acceptors

US12497312B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12497312-B2
Application numberUS-202017798210-A
CountryUS
Kind codeB2
Filing dateDec 3, 2020
Priority dateJul 22, 2020
Publication dateDec 16, 2025
Grant dateDec 16, 2025

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Abstract

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The present invention relates to the technical field of wastewater treatment, and discloses a method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors. The method comprises the following steps: 1) placing a composite semiconductor-coated carrier material into a reactor, introducing wastewater into the reactor inoculated with anaerobic sludge, and allowing the composite semiconductor-coated carrier material to be immersed in the wastewater, wherein the composite semiconductor-coated carrier material comprises a conductive carrier and composite semiconductor materials loaded on the conductive carrier; 2) carrying out habituated culture on the anaerobic sludge for a period of time, and loading a biological membrane on the surface of the composite semiconductor materials, to construct a photo-excited hole enhanced bioreactor; and 3) treating the refractory pollutants in the wastewater by utilizing the reactor under irradiation.

First claim

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What is claimed is: 1 . A method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors, comprising the following steps: 1-1) placing a composite semiconductor-coated carrier material into a reactor, introducing wastewater into the reactor inoculated with anaerobic sludge, and allowing the composite semiconductor-coated carrier material to be immersed in the wastewater, wherein the composite semiconductor-coated carrier material comprises a conductive carrier and composite semiconductor materials loaded on the conductive carrier, wherein the composite semiconductor materials comprise BiVO 4 /FeOOH; 1-2) carrying out habituated culture on the anaerobic sludge for a period of time, and loading a biological membrane on a surface of the composite semiconductor-coated carrier material, to construct a photo-excited hole-enhanced bioreactor; and 1-3) treating the refractory pollutants in the wastewater by utilizing the reactor under irradiation, wherein the conductive carrier comprises carbon paper, and the reactor comprises a quartz reactor or a glass reactor, wherein the composite semiconductor-coated carrier material comprises BiVO 4 /FeOOH@CP, and wherein the BiVO 4 /FeOOH@CP is prepared through a method comprising: preparing BiOI@CP by electrodeposition, converting the BiOI@CP into BiVO 4 @CP, immersing the BiVO 4 @CP in a solution of FeCl 3 ·6H 2 O for a period of time, and rinsing with deionized water, to obtain the BiVO 4 /FeOOH@CP. 2 . The method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors according to claim 1 , wherein the anerobic sludge is inoculated at a concentration of about 3.0-6.0 g/L, and the anaerobic sludge is subjected to habituated culture for at least 30 days. 3 . The method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors according to claim 1 , wherein the electrodeposition comprises the following steps: 7-1) dissolving Bi(NO 3 ) 3 ·5H 2 O and KI in deionized water; adjusting the pH with nitric acid, and mixing the solution with a solution of p-benzoquinone in ethanol for a period of time, to obtain a mixture; and 7-2) adding the mixture to a three-electrode system, and electrodepositing at a cathodic potential for a period of time, to deposit BiOI onto carbon paper, so as to form the BiOI@CP. 4 . The method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors according to claim 3 , wherein the BiOI@CP is converted into the BiVO 4 @CP through steps comprising: 8-1) coating a VO(acac) 2 /DMSO solution onto the BiOI@CP, heating to a certain temperature at a certain heating rate and holding for a period of time; and 8-2) treating with NaOH to remove excess V 2 O 5 , to obtain the BiVO 4 @CP. 5 . The method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors according to claim 1 , wherein the wastewater comprises refractory organic pollutants, Na 2 HPO 4 ·12H 2 O, KH 2 PO 4 , MgSO 4 ·7H 2 O, CaCl 2 , and a mixed solution of trace elements. 6 . The method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors according to claim 5 , wherein the refractory organic pollutants comprise nitrogen-containing heterocyclic organic compounds, chlorinated organic compounds and antibiotic organic compounds. 7 . The method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors according to claim 2 , wherein the electrodeposition comprises the following steps: 7-1) dissolving Bi(NO 3 ) 3 ·5H 2 O and KI in deionized water; adjusting the pH with nitric acid, and mixing the solution with a solution of p-benzoquinone in ethanol for a period of time, to obtain a mixture; and 7-2) adding the mixture to a three-electrode system, and electrodepositing at a cathodic potential for a period of time, to deposit BiOI onto carbon paper, so as to form the BiOI@CP.

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What does patent US12497312B2 cover?
The present invention relates to the technical field of wastewater treatment, and discloses a method for enhanced bio-treatment of refractory organic pollutants with photo-excited holes as electron acceptors. The method comprises the following steps: 1) placing a composite semiconductor-coated carrier material into a reactor, introducing wastewater into the reactor inoculated with anaerobic slu…
Who is the assignee on this patent?
Univ Nanjing Sci & Tech
What technology area does this patent fall under?
Primary CPC classification C25D9/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).