Head unit and liquid ejecting apparatus
US-2024375401-A1 · Nov 14, 2024 · US
US12496828B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12496828-B2 |
| Application number | US-202318523362-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 29, 2023 |
| Priority date | Nov 30, 2022 |
| Publication date | Dec 16, 2025 |
| Grant date | Dec 16, 2025 |
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A cleaning method is a method of cleaning a recording head that has an ink-ejecting surface and ejects ink from the ink-ejecting surface. The cleaning method includes supplying a cleaning liquid to the ink-ejecting surface of the recording head, and wiping the ink-ejecting surface of the recording head twice with a wipe blade after the supplying a cleaning liquid. A first wiping speed in the wiping is 5 mm/sec or more and 25 mm/sec or less. A second wiping speed in the wiping is 45 mm/sec or more and 100 mm/sec or less. The cleaning liquid contains water, a water-soluble organic solvent, an amphoteric surfactant having a betaine structure, and a silicone surfactant. The viscosity of the cleaning liquid is 1.0 mPa·s or more and 3.1 mPa·s or less. The static surface tension of the cleaning liquid is 10 mN/m or more and 25 mN/m or less.
Opening claim text (preview).
What is claimed is: 1 . A cleaning method for a recording head that includes an ink-ejecting surface and ejects ink from the ink-ejecting surface, comprising: supplying a cleaning liquid to the ink-ejecting surface of the recording head; and wiping the ink-ejecting surface of the recording head twice with a wipe blade after the supplying a cleaning liquid, wherein a first wiping speed in the wiping is 5 mm/sec or more and 25 mm/sec or less, a second wiping speed in the wiping is 45 mm/sec or more and 100 mm/sec or less, and the cleaning liquid contains water, a water-soluble organic solvent, an amphoteric surfactant having a betaine structure, and a silicone surfactant, viscosity of the cleaning liquid being 1.0 mPa·s or more and 3.1 mPa·s or less, static surface tension of the cleaning liquid being 10 mN/m or more and 25 mN/m or less. 2 . The cleaning method according to claim 1 , wherein a ratio of an amount of the water-soluble organic solvent to the cleaning liquid is 10.0% by mass or more and 35.0% by mass or less. 3 . The cleaning method according to claim 1 , wherein the water-soluble organic solvent contains a polyhydric alcohol. 4 . The cleaning method according to claim 3 , wherein the polyhydric alcohol contains glycerin, propylene glycol, or 1,3-propanediol. 5 . The cleaning method according to claim 1 , wherein the amphoteric surfactant has an amidoalkyl betaine structure. 6 . The cleaning method according to claim 1 , wherein a ratio of an amount of the amphoteric surfactant to the cleaning liquid is 0.3% by mass or more and 3.0% by mass or less. 7 . The cleaning method according to claim 1 , wherein a ratio of an amount of the silicone surfactant to the cleaning liquid is 0.05% by mass or more and 1.5% by mass or less. 8 . The cleaning method according to claim 1 , further comprising wiping the ink-ejecting surface of the recording head with the wipe blade before supplying the cleaning liquid, wherein a wiping speed in the wiping before supplying the cleaning liquid is 45 mm/sec or more and 100 mm/sec or less.
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