Etchant composition and method of manufacturing wiring substrate using the same
US-10941342-B2 · Mar 9, 2021 · US
US12492340B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12492340-B2 |
| Application number | US-202318179919-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 7, 2023 |
| Priority date | Mar 21, 2022 |
| Publication date | Dec 9, 2025 |
| Grant date | Dec 9, 2025 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
An etchant including: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; a first compound; and water, wherein the first compound is a compound containing: a sulfonic group, a sulfonic acid group, or a combination thereof; and an amine group, and an interfacial permeation inhibition index (Y) of the etchant is a value of at least about 0.10 and not more than about 0.35, the interfacial permeation inhibition index (Y) being a value calculated by Equation 1. The description of Equation 1 is as in the specification.
Opening claim text (preview).
What is claimed is: 1 . An etchant comprising: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; a first compound; and water, wherein the first compound is a compound comprising: a sulfonic group, a sulfonic acid group, or a combination thereof; and an amine group, and an interfacial permeation inhibition index (Y) of the etchant is a value of at least about 0.10 and not more than about 0.35, the interfacial permeation inhibition index (Y) being a value calculated by <Equation 1>: Y= 1.4×10 −4 ×M ( X 1)+1.3×10 −4 ×M ( X 2)+1.45×10 −3 ×M ( X 3)+1.5×10 −5 ×M ( X 1)× M ( X 2)+1.6×10 −3 ×M ( X 1)× M ( X 3)+6.5×10 −4 ×M ( X 2)× M ( X 3), Equation 1 wherein, in Equation 1, M(X1) indicates wt % of the first compound with respect to 100 wt % in total of the etchant, M(X2) indicates wt % of the chlorine-containing compound with respect to 100 wt % in total of the etchant, and M(X3) indicates wt % of the water with respect to 100 wt % in total of the etchant. 2 . The etchant of claim 1 , wherein the persulfate comprises ammonium persulfate, sodium persulfate, potassium persulfate, or one or more combinations thereof. 3 . The etchant of claim 1 , wherein the persulfate is ammonium persulfate. 4 . The etchant of claim 1 , wherein the fluorine-containing compound comprises aluminum fluoride, sodium fluoride, potassium fluoride, ammonium bifluoride, sodium bifluoride, potassium bifluoride, or one or more combinations thereof. 5 . The etchant of claim 1 , wherein the chlorine-containing compound comprises hydrochloric acid, sodium chloride, potassium chloride, ammonium chloride, iron (III) chloride, sodium perchlorate, potassium perchlorate, ethanesulfonyl chloride, methanesulfonyl chloride, or one or more combinations thereof. 6 . The etchant of claim 1 , wherein the cyclic amine compound comprises 5-aminotetrazole, imidazole, indole, purine, pyrazole, pyridine, pyrimidine, pyrrole, pyrrolidine, pyrroline, 5-methyltetrazole, 1-methyl-5-aminotetrazole, 1-ethyl-5-aminotetrazole, or one or more combinations thereof. 7 . The etchant of claim 1 , wherein the inorganic acid comprises nitric acid, sulfuric acid, phosphoric acid, phosphorous acid, or one or more combinations thereof. 8 . The etchant of claim 1 , wherein the first compound is a compound comprising a sulfonic group and an amine group, or is a compound comprising a sulfonic acid group and an amine group. 9 . The etchant of claim 1 , wherein the amine group is —NH 2 . 10 . The etchant of claim 1 , wherein the first compound is a compound represented by Formula 1: wherein, in Formula 1, L 1 and L 2 are each independently single bond, *—O—*′, *—S—*′, a C 1 -C 20 alkylene group unsubstituted or substituted with at least one R 10a , a C 2 -C 20 alkenylene group unsubstituted or substituted with at least one R 10a , a C 3 -C 60 carbocyclic group unsubstituted or substituted with at least one R 10a , or a C 1 -C 60 heterocyclic group unsubstituted or substituted with at least one R 10a , a1 and a2 are each independently one of an integer from 0 to 3, R 1 , Z 1 , and Z 2 are each independently hydrogen, deuterium, —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, a nitro group, a C 1 -C 60 alkyl group unsubstituted or substituted with at least one R 10a , a C 2 -C 60 alkenyl group unsubstituted or substituted with at least one R 10a , a C 2 -C 60 alkynyl group unsubstituted or substituted with at least one R 10a , a C 1 -C 60 alkoxy group unsubstituted or substituted with at least one R 10a , a C 3 -C 60 carbocyclic group unsubstituted or substituted with at least one R 10a , a C 1 -C 60 heterocyclic group unsubstituted or substituted with at least one R 10a , a C 6 -C 60 aryloxy group unsubstituted or substituted with at least one R 10a , a C 6 -C 60 arylthio group unsubstituted or substituted with at least one R 10a , —N(Q 1 )(Q 2 ), —B(Q 1 )(Q 2 ), —P(Q 1 )(Q 2 ), or —C(═O)(Q 1 ), but R 1 is not hydrogen, Z 1 and Z 2 are optionally linked to each other via a single bond, a C 1 -C 5 alkylene group unsubstituted or substituted with at least one R 10a , or a C 2 -C 5 alkenylene group unsubstituted or substituted with at least one R 10a , to form a C 8 -C 60 polycyclic group unsubstituted or substituted with at least one R 10a , and R 10a is deuterium (-D), —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, or a nitro group; a C 1 -C 60 alkyl group, a C 2 -C 60 alkenyl group, a C 2 -C 60 alkynyl group, or a C 1 -C 60 alkoxy group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, a nitro group, a C 3 -C 60 carbocyclic group, a C 1 -C 60 heterocyclic group, a C 6 -C 60 aryloxy group, a C 6 -Coo arylthio group, —Si(Q 11 )(Q 12 )(Q 13 ), —N(Q 11 )(Q 12 ), —B(Q 11 )(Q 12 ), —C(═O)(Q 11 ), —S(═O) 2 (Q 11 ), —P(═O)(Q 11 )(Q 12 ), or one or more combinations thereof; a C 3 -C 60 carbocyclic group, a C 1 -C 60 heterocyclic group, a C 6 -C 60 aryloxy group, or a C 6 -C 60 arylthio group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, a nitro group, a C 1 -C 60 alkyl group, a C 2 -C 60 alkenyl group, a C 2 -C 60 alkynyl group, a C 1 -C 60 alkoxy group, a C 3 -C 60 carbocyclic group, a C 1 -C 60 heterocyclic group, a C 6 -C 60 aryloxy group, a C 6 -C 60 arylthio group, —Si(Q 21 )(Q 22 )(Q 23 ), —N(Q 21 )(Q 22 ), —B(Q 21 )(Q 22 ), —C(═O)(Q 21 ), —S(═O) 2 (Q 21 ), —P(═O)(Q 21 )(Q 22 ), or one or more combinations thereof; or —Si(Q 31 )(Q 32 )(Q 33 ), —N(Q 31 )(Q 32 ), —B(Q 31 )(Q 32 ), —C(═O)(Q 31 ), —S(═O) 2 (Q 31 ), or —P(═O)(Q 31 )(Q 32 ), and wherein Q 1 to Q 3 , Q 11 to Q 13 , Q 21 to Q 23 , and Q 31 to Q 33 are each independently: hydrogen; deuterium; —F; —Cl; —Br; —I; a hydroxyl group; a cyano group; a nitro group; a C 1 -C 60 alkyl group; a C 2 -C 60 alkenyl group; a C 2 -C 60 alkynyl group; a C 1 -C 60 alkoxy group; or a C 3 -C 60 carbocyclic group or a C 1 -C 60 heterocyclic group, each being unsubstituted or substituted with deuterium, —F, a cyano group, a C 1 -C 60 alkyl group, a C 1 -C 60 alkoxy group, a phenyl group, a biphenyl group, or one or more combinations thereof. 11 . The etchant of claim 10 , wherein L 1 and L 2 are each independently a single bond, *—O—*′, or *—S—*′; a C 1 -C 20 alkylene group, a C 2 -C 20 alkenylene group, or a C 2 -C 20 alkynylene group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, —CD 3 , —CD 2 H, —CDH 2 , —CF 3 , —CF 2 H, —CFH 2 , a hydroxyl group, a cyano group, a nitro group, a cyclopentyl group, a cyclohexyl group, a phenyl group, a naphthyl group, a pyridinyl group, a pyrimidinyl group, or one or more combinations thereof; or a cyclopentylene group, a cyclohexylene group, a phenylene group, a naphthylene group, a pyridinylene group, or a pyrimidinylene group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, —CD 3 , —CD 2 H, —CDH 2 , —CF 3 , —CF 2 H, —CFH 2 , a hydroxyl group, a cyano group, a nitro group, a C 1 -C 20 alkyl group, a C 2 -C 20 alkenyl group, a C 2 -C 20 alkynyl group, a C 1 -C 20 alkoxy group, a cyclopentyl group, a cyclohexyl group, a phenyl group, a naphthyl group, a pyridinyl group, a pyrimidinyl group, or one or more combinations thereof. 12 . The etchant of claim 10 , wherein R 1 is: deuterium or a hydroxyl group; a C 1 -C 20 alkyl group, a C
Related publications grouped by family.
Answers are generated from the same data shown on this page.