Etchant

US12492340B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12492340-B2
Application numberUS-202318179919-A
CountryUS
Kind codeB2
Filing dateMar 7, 2023
Priority dateMar 21, 2022
Publication dateDec 9, 2025
Grant dateDec 9, 2025

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An etchant including: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; a first compound; and water, wherein the first compound is a compound containing: a sulfonic group, a sulfonic acid group, or a combination thereof; and an amine group, and an interfacial permeation inhibition index (Y) of the etchant is a value of at least about 0.10 and not more than about 0.35, the interfacial permeation inhibition index (Y) being a value calculated by Equation 1. The description of Equation 1 is as in the specification.

First claim

Opening claim text (preview).

What is claimed is: 1 . An etchant comprising: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; a first compound; and water, wherein the first compound is a compound comprising: a sulfonic group, a sulfonic acid group, or a combination thereof; and an amine group, and an interfacial permeation inhibition index (Y) of the etchant is a value of at least about 0.10 and not more than about 0.35, the interfacial permeation inhibition index (Y) being a value calculated by <Equation 1>: Y= 1.4×10 −4 ×M ( X 1)+1.3×10 −4 ×M ( X 2)+1.45×10 −3 ×M ( X 3)+1.5×10 −5 ×M ( X 1)× M ( X 2)+1.6×10 −3 ×M ( X 1)× M ( X 3)+6.5×10 −4 ×M ( X 2)× M ( X 3),  Equation 1 wherein, in Equation 1, M(X1) indicates wt % of the first compound with respect to 100 wt % in total of the etchant, M(X2) indicates wt % of the chlorine-containing compound with respect to 100 wt % in total of the etchant, and M(X3) indicates wt % of the water with respect to 100 wt % in total of the etchant. 2 . The etchant of claim 1 , wherein the persulfate comprises ammonium persulfate, sodium persulfate, potassium persulfate, or one or more combinations thereof. 3 . The etchant of claim 1 , wherein the persulfate is ammonium persulfate. 4 . The etchant of claim 1 , wherein the fluorine-containing compound comprises aluminum fluoride, sodium fluoride, potassium fluoride, ammonium bifluoride, sodium bifluoride, potassium bifluoride, or one or more combinations thereof. 5 . The etchant of claim 1 , wherein the chlorine-containing compound comprises hydrochloric acid, sodium chloride, potassium chloride, ammonium chloride, iron (III) chloride, sodium perchlorate, potassium perchlorate, ethanesulfonyl chloride, methanesulfonyl chloride, or one or more combinations thereof. 6 . The etchant of claim 1 , wherein the cyclic amine compound comprises 5-aminotetrazole, imidazole, indole, purine, pyrazole, pyridine, pyrimidine, pyrrole, pyrrolidine, pyrroline, 5-methyltetrazole, 1-methyl-5-aminotetrazole, 1-ethyl-5-aminotetrazole, or one or more combinations thereof. 7 . The etchant of claim 1 , wherein the inorganic acid comprises nitric acid, sulfuric acid, phosphoric acid, phosphorous acid, or one or more combinations thereof. 8 . The etchant of claim 1 , wherein the first compound is a compound comprising a sulfonic group and an amine group, or is a compound comprising a sulfonic acid group and an amine group. 9 . The etchant of claim 1 , wherein the amine group is —NH 2 . 10 . The etchant of claim 1 , wherein the first compound is a compound represented by Formula 1: wherein, in Formula 1, L 1 and L 2 are each independently single bond, *—O—*′, *—S—*′, a C 1 -C 20 alkylene group unsubstituted or substituted with at least one R 10a , a C 2 -C 20 alkenylene group unsubstituted or substituted with at least one R 10a , a C 3 -C 60 carbocyclic group unsubstituted or substituted with at least one R 10a , or a C 1 -C 60 heterocyclic group unsubstituted or substituted with at least one R 10a , a1 and a2 are each independently one of an integer from 0 to 3, R 1 , Z 1 , and Z 2 are each independently hydrogen, deuterium, —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, a nitro group, a C 1 -C 60 alkyl group unsubstituted or substituted with at least one R 10a , a C 2 -C 60 alkenyl group unsubstituted or substituted with at least one R 10a , a C 2 -C 60 alkynyl group unsubstituted or substituted with at least one R 10a , a C 1 -C 60 alkoxy group unsubstituted or substituted with at least one R 10a , a C 3 -C 60 carbocyclic group unsubstituted or substituted with at least one R 10a , a C 1 -C 60 heterocyclic group unsubstituted or substituted with at least one R 10a , a C 6 -C 60 aryloxy group unsubstituted or substituted with at least one R 10a , a C 6 -C 60 arylthio group unsubstituted or substituted with at least one R 10a , —N(Q 1 )(Q 2 ), —B(Q 1 )(Q 2 ), —P(Q 1 )(Q 2 ), or —C(═O)(Q 1 ), but R 1 is not hydrogen, Z 1 and Z 2 are optionally linked to each other via a single bond, a C 1 -C 5 alkylene group unsubstituted or substituted with at least one R 10a , or a C 2 -C 5 alkenylene group unsubstituted or substituted with at least one R 10a , to form a C 8 -C 60 polycyclic group unsubstituted or substituted with at least one R 10a , and R 10a is deuterium (-D), —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, or a nitro group; a C 1 -C 60 alkyl group, a C 2 -C 60 alkenyl group, a C 2 -C 60 alkynyl group, or a C 1 -C 60 alkoxy group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, a nitro group, a C 3 -C 60 carbocyclic group, a C 1 -C 60 heterocyclic group, a C 6 -C 60 aryloxy group, a C 6 -Coo arylthio group, —Si(Q 11 )(Q 12 )(Q 13 ), —N(Q 11 )(Q 12 ), —B(Q 11 )(Q 12 ), —C(═O)(Q 11 ), —S(═O) 2 (Q 11 ), —P(═O)(Q 11 )(Q 12 ), or one or more combinations thereof; a C 3 -C 60 carbocyclic group, a C 1 -C 60 heterocyclic group, a C 6 -C 60 aryloxy group, or a C 6 -C 60 arylthio group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, a hydroxyl group, a cyano group, a nitro group, a C 1 -C 60 alkyl group, a C 2 -C 60 alkenyl group, a C 2 -C 60 alkynyl group, a C 1 -C 60 alkoxy group, a C 3 -C 60 carbocyclic group, a C 1 -C 60 heterocyclic group, a C 6 -C 60 aryloxy group, a C 6 -C 60 arylthio group, —Si(Q 21 )(Q 22 )(Q 23 ), —N(Q 21 )(Q 22 ), —B(Q 21 )(Q 22 ), —C(═O)(Q 21 ), —S(═O) 2 (Q 21 ), —P(═O)(Q 21 )(Q 22 ), or one or more combinations thereof; or —Si(Q 31 )(Q 32 )(Q 33 ), —N(Q 31 )(Q 32 ), —B(Q 31 )(Q 32 ), —C(═O)(Q 31 ), —S(═O) 2 (Q 31 ), or —P(═O)(Q 31 )(Q 32 ), and wherein Q 1 to Q 3 , Q 11 to Q 13 , Q 21 to Q 23 , and Q 31 to Q 33 are each independently: hydrogen; deuterium; —F; —Cl; —Br; —I; a hydroxyl group; a cyano group; a nitro group; a C 1 -C 60 alkyl group; a C 2 -C 60 alkenyl group; a C 2 -C 60 alkynyl group; a C 1 -C 60 alkoxy group; or a C 3 -C 60 carbocyclic group or a C 1 -C 60 heterocyclic group, each being unsubstituted or substituted with deuterium, —F, a cyano group, a C 1 -C 60 alkyl group, a C 1 -C 60 alkoxy group, a phenyl group, a biphenyl group, or one or more combinations thereof. 11 . The etchant of claim 10 , wherein L 1 and L 2 are each independently a single bond, *—O—*′, or *—S—*′; a C 1 -C 20 alkylene group, a C 2 -C 20 alkenylene group, or a C 2 -C 20 alkynylene group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, —CD 3 , —CD 2 H, —CDH 2 , —CF 3 , —CF 2 H, —CFH 2 , a hydroxyl group, a cyano group, a nitro group, a cyclopentyl group, a cyclohexyl group, a phenyl group, a naphthyl group, a pyridinyl group, a pyrimidinyl group, or one or more combinations thereof; or a cyclopentylene group, a cyclohexylene group, a phenylene group, a naphthylene group, a pyridinylene group, or a pyrimidinylene group, each being unsubstituted or substituted with deuterium, —F, —Cl, —Br, —I, —CD 3 , —CD 2 H, —CDH 2 , —CF 3 , —CF 2 H, —CFH 2 , a hydroxyl group, a cyano group, a nitro group, a C 1 -C 20 alkyl group, a C 2 -C 20 alkenyl group, a C 2 -C 20 alkynyl group, a C 1 -C 20 alkoxy group, a cyclopentyl group, a cyclohexyl group, a phenyl group, a naphthyl group, a pyridinyl group, a pyrimidinyl group, or one or more combinations thereof. 12 . The etchant of claim 10 , wherein R 1 is: deuterium or a hydroxyl group; a C 1 -C 20 alkyl group, a C

Assignees

Inventors

Classifications

  • with organic material · CPC title

  • C09K13/08Primary

    containing a fluorine compound · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12492340B2 cover?
An etchant including: persulfate; a fluorine-containing compound; a chlorine-containing compound; a cyclic amine compound; an inorganic acid; a first compound; and water, wherein the first compound is a compound containing: a sulfonic group, a sulfonic acid group, or a combination thereof; and an amine group, and an interfacial permeation inhibition index (Y) of the etchant is a value of at lea…
Who is the assignee on this patent?
Samsung Display Co Ltd, Dongwoo Fine Chem Co Ltd
What technology area does this patent fall under?
Primary CPC classification C09K13/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 09 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).