Battery cells with lithium ion conducting tape-cast ceramic, glass and glass-ceramic membranes
US-2015340720-A1 · Nov 26, 2015 · US
US12482857B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12482857-B2 |
| Application number | US-202418671767-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 22, 2024 |
| Priority date | Aug 4, 2020 |
| Publication date | Nov 25, 2025 |
| Grant date | Nov 25, 2025 |
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Battery component structures and manufacturing methods for solid-state battery cells include a unitary Li ion conducting sulfide glass solid electrolyte structure that serves as the basic building block around which a solid-state battery cell can be fabricated. The unitary glass structure approach can leverage precision controlled high throughput processes from the semiconductor industry that have been inventively modified as disclosed herein for processing a sulfide glass solid electrolyte substrate into a unitary Li ion conducting glass structure, for example, by using etching and lithographic photoresist formulations and methods. The glass substrate may be precision engineered to effectuate a dense glass portion and a porous glass portion that can be characterized as sublayers having predetermined thicknesses. The porous glass sublayer includes a plurality of discrete substantially vertical closed-end holes or trenches that are precision engineered into one or both major substrate surfaces using microfabrication processes.
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What is claimed: 1 . A method of making a unitary Li ion conducting glass structure, the method comprising: i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces; ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and wherein the etching involves exposing the first major substrate surface to a liquid etching solution comprising water as etchant and acetonitrile as carrier solvent that is inert in direct contact with the glass substrate. 2 . A method of making a unitary Li ion conducting glass structure, the method comprising: i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces; ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and wherein the etching involves exposing the first substrate surface to a liquid etching solution comprising an organic carbonic acid as the etchant and a carrier solvent that is inert in direct contact with the glass substrate. 3 . The method of claim 2 wherein the carrier solvent is an aprotic solvent selected from the group consisting of glymes and organic carbonates. 4 . A method of making a unitary Li ion conducting glass structure, the method comprising: i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces; ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and wherein the etching media is a gaseous/vapor etching mixture comprising an organic carbonic acid as etchant and a carrier gas that is inert in direct contact with the glass substrate. 5 . A method of making a unitary Li ion conducting glass structure, the method comprising: i) providing a substantially dense and flat Li ion conducting sulfide glass substrate, the substrate having first and second opposing major surfaces; ii) etching a hole pattern into one or both major surfaces to produce a plurality of discrete spaced-apart closed end holes and/or trenches, wherein the etching involves contacting the substrate surface with an etching media; and wherein the etching media is a gaseous/vapor etching mixture comprising water as the etchant and a carrier gas that is inert in direct contact with the glass substrate. 6 . The method of claim 5 wherein the carrier gas is one or more of argon gas and nitrogen gas.
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